公开(公告)号：US09664966B2

公开(公告)日：2017-05-30

申请号：US14683698

申请日：2015-04-10

Applicant: Samsung Display Co., Ltd.

Inventor： SeungBo Shim ,  Jeong Won Kim ,  Kwangwoo Park ,  Jinho Ju

IPC: H01L27/12 ,  G02F1/1362 ,  H01L29/66 ,  H01L29/786

CPC classification number: G02F1/136209 ,  G02F1/136227 ,  G02F2001/136222 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78669

Abstract: A method of manufacturing a display device, the method including: forming, on a first surface of a substrate, a gate line and a gate electrode; forming a first dielectric layer on the gate line and the gate electrode; forming a data line, a source electrode and a drain electrode on the first dielectric layer; forming a black matrix layer on the first dielectric layer, the data line, the source electrode, and the drain electrode; radiating ultraviolet light on a second surface of the substrate opposing the first surface, the ultraviolet light developing exposed parts of the black matrix layer to form a black matrix pattern; and etching the first dielectric layer using the black matrix pattern as an etching mask to respectively form a first dielectric pattern on the gate line and a gate dielectric pattern on the gate electrode.

公开(公告)号：US20160048067A1

公开(公告)日：2016-02-18

申请号：US14683698

申请日：2015-04-10

Applicant: Samsung Display Co., Ltd.

Inventor： SeungBo Shim ,  Jeong Won Kim ,  Kwangwoo Park ,  Jinho Ju

IPC: G02F1/1362 ,  G02F1/1368 ,  H01L29/786 ,  H01L27/12 ,  H01L29/66

CPC classification number: G02F1/136209 ,  G02F1/136227 ,  G02F2001/136222 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78669

Abstract: A method of manufacturing a display device, the method including: forming, on a first surface of a substrate, a gate line and a gate electrode; forming a first dielectric layer on the gate line and the gate electrode; forming a data line, a source electrode and a drain electrode on the first dielectric layer; forming a black matrix layer on the first dielectric layer, the data line, the source electrode, and the drain electrode; radiating ultraviolet light on a second surface of the substrate opposing the first surface, the ultraviolet light developing exposed parts of the black matrix layer to form a black matrix pattern; and etching the first dielectric layer using the black matrix pattern as an etching mask to respectively form a first dielectric pattern on the gate line and a gate dielectric pattern on the gate electrode.

Abstract translation: 一种制造显示装置的方法，所述方法包括：在基板的第一表面上形成栅极线和栅电极; 在栅极线和栅电极上形成第一电介质层; 在第一介电层上形成数据线，源电极和漏电极; 在第一介电层，数据线，源电极和漏电极上形成黑矩阵层; 在与所述第一表面相对的所述基板的第二表面上辐射紫外光，所述黑色矩阵层的紫外线显影曝光部分形成黑矩阵图案; 并且使用黑矩阵图案蚀刻第一介电层作为蚀刻掩模，以在栅极线上分别形成第一电介质图案和栅电极上的栅极电介质图案。

公开(公告)号：US20220411696A1

公开(公告)日：2022-12-29

申请号：US17896073

申请日：2022-08-26

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun Kim ,  JinSeuk Kim ,  SeungBo Shim ,  ShinHyuk Choi ,  Seung-Hee Kim ,  Donghee Lee

IPC: C09K13/08 ,  H01L29/45 ,  H01L21/3213 ,  H01L27/12 ,  C23F1/10 ,  C23F1/16 ,  C09K13/00 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  G03F7/20 ,  H01L21/306 ,  H01L21/311 ,  C09K13/06

Abstract: A method for manufacturing a metal pattern, the method including forming a photosensitive layer pattern on a multilayer metal substrate including titanium and copper; providing an etchant composition on the multilayer metal substrate on which the photosensitive layer pattern is formed to form the source electrode and the drain electrode; and removing the photosensitive layer pattern, wherein the etchant composition includes a persulfate, a four-nitrogen ring compound, a two-chlorine compound, a fluorine compound, and water, and a weight ratio of the four-nitrogen ring compound and the two-chlorine compound is from about 1:0.5 to about 1:4.

公开(公告)号：US11573468B2

公开(公告)日：2023-02-07

申请号：US16897191

申请日：2020-06-09

Applicant: Samsung Display Co., Ltd.

Inventor： SeungBo Shim ,  Hongmin Yoon ,  Dasom Kang

IPC: G02F1/1362 ,  G02F1/133 ,  G02F1/1337 ,  G02F1/1339 ,  G02F1/1343 ,  G02F1/1345 ,  G02F1/1368

Abstract: A display substrate includes a base substrate and a plurality of insulating layers disposed on a surface of the base substrate. A groove is defined in the insulating layers in a non-display area of the display substrate. An end portion of an alignment layer is disposed in the groove. The groove is capable of controlling a flow of a liquid alignment material to prevent the liquid alignment material from overflowing to an edge of the base substrate. The groove is formed simultaneously in a process of forming contact holes in a display area of the display substrate. Accordingly, a structure corresponding to the end portion of the alignment layer to control the flow of the liquid alignment material is formed without increasing the number of masks.

公开(公告)号：US11441071B2

公开(公告)日：2022-09-13

申请号：US16702773

申请日：2019-12-04

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun Kim ,  JinSeuk Kim ,  SeungBo Shim ,  ShinHyuk Choi ,  Seung-Hee Kim ,  Donghee Lee

IPC: C09K13/08 ,  H01L29/45 ,  H01L21/3213 ,  H01L27/12 ,  C23F1/10 ,  C23F1/16 ,  C09K13/00 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  G03F7/20 ,  H01L21/306 ,  H01L21/311 ,  C09K13/06 ,  G02F1/1368

Abstract: An etchant composition of an embodiment includes a persulfate, a four-nitrogen ring compound, a two-chlorine compound, a fluorine compound and water, and has a weight ratio of the four-nitrogen ring compound and the two-chlorine compound of about 1:0.5 to about 1:4. The etchant composition may etch a multilayer metal substrate of titanium/copper and may be used for manufacturing a multilayer metal pattern and an array substrate having excellent properties of etched patterns.

公开(公告)号：US09431437B2

公开(公告)日：2016-08-30

申请号：US14188959

申请日：2014-02-25

Applicant: Samsung Display Co., Ltd.

Inventor： Yang-Ho Jung ,  SeungBo Shim ,  Jinho Ju ,  Junhong Park

IPC: H01L21/00 ,  H01L27/12

CPC classification number: H01L27/1288

Abstract: A display panel includes a gate electrode and a gate line on a substrate, a gate insulating layer and an active layer sequentially on the gate electrode and the gate line, a planarization layer which is on the substrate and compensates for a step difference between the substrate, and the gate electrode and the gate line, respectively, source and drain electrodes on the active layer overlapping the gate electrode and spaced apart from each other, a data line on the active layer and crossing the gate line, a protective layer which covers the planarization layer, the source and drain electrodes, and the data line, a contact hole defined in the planarization layer and partially exposing the drain electrode, and a pixel electrode on the protective layer and electrically connected to the drain electrode through the contact hole.

Abstract translation: 显示面板包括在基板上的栅极电极和栅极线，栅极绝缘层和有源层，顺序地在栅极电极和栅极线上，平坦化层，其位于基板上，并补偿基板之间的台阶差 ，栅极电极和栅极线分别与有源层上的源电极和漏电极重叠在栅电极上并彼此间隔开，有源层上的数据线并与栅极线交叉，保护层覆盖 平坦化层，源极和漏极以及数据线，界定在平坦化层中并部分地暴露漏电极的接触孔以及保护层上的像素电极，并通过接触孔电连接到漏电极。