公开(公告)号：US20220411696A1

公开(公告)日：2022-12-29

申请号：US17896073

申请日：2022-08-26

申请人： Samsung Display Co., Ltd.

发明人： Bong-Kyun Kim ,  JinSeuk Kim ,  SeungBo Shim ,  ShinHyuk Choi ,  Seung-Hee Kim ,  Donghee Lee

IPC分类号： C09K13/08 ,  H01L29/45 ,  H01L21/3213 ,  H01L27/12 ,  C23F1/10 ,  C23F1/16 ,  C09K13/00 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  G03F7/20 ,  H01L21/306 ,  H01L21/311 ,  C09K13/06

摘要： A method for manufacturing a metal pattern, the method including forming a photosensitive layer pattern on a multilayer metal substrate including titanium and copper; providing an etchant composition on the multilayer metal substrate on which the photosensitive layer pattern is formed to form the source electrode and the drain electrode; and removing the photosensitive layer pattern, wherein the etchant composition includes a persulfate, a four-nitrogen ring compound, a two-chlorine compound, a fluorine compound, and water, and a weight ratio of the four-nitrogen ring compound and the two-chlorine compound is from about 1:0.5 to about 1:4.

公开(公告)号：US11441071B2

公开(公告)日：2022-09-13

申请号：US16702773

申请日：2019-12-04

申请人： Samsung Display Co., Ltd.

发明人： Bong-Kyun Kim ,  JinSeuk Kim ,  SeungBo Shim ,  ShinHyuk Choi ,  Seung-Hee Kim ,  Donghee Lee

IPC分类号： C09K13/08 ,  H01L29/45 ,  H01L21/3213 ,  H01L27/12 ,  C23F1/10 ,  C23F1/16 ,  C09K13/00 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  G03F7/20 ,  H01L21/306 ,  H01L21/311 ,  C09K13/06 ,  G02F1/1368

摘要： An etchant composition of an embodiment includes a persulfate, a four-nitrogen ring compound, a two-chlorine compound, a fluorine compound and water, and has a weight ratio of the four-nitrogen ring compound and the two-chlorine compound of about 1:0.5 to about 1:4. The etchant composition may etch a multilayer metal substrate of titanium/copper and may be used for manufacturing a multilayer metal pattern and an array substrate having excellent properties of etched patterns.