Abstract:
A method of manufacturing a flexible display includes: forming a first barrier layer on a flexible substrate; forming a second barrier layer including silicon nitride on the first barrier layer; releasing stress of the second barrier layer; forming a first buffer layer including silicon nitride on the second barrier layer; forming a second buffer layer on the first buffer layer; and forming a thin film transistor on the second buffer layer.
Abstract:
A flexible display includes: a first flexible substrate; an intermediate barrier layer positioned on the first flexible substrate and comprising silicon oxide; an adhesive layer positioned on the intermediate barrier layer and comprising at least one of amorphous silicon on which a P-type or N-type conductive impurity is doped, or hydrogenated amorphous silicon; a second flexible substrate positioned on the adhesive layer; a first barrier layer positioned on the second flexible substrate and comprising silicon oxide; a second barrier layer positioned on the first barrier layer and comprising silicon nitride; a buffer layer positioned on the second barrier layer and comprising silicon oxide; a thin film transistor positioned on the buffer layer; and an organic light emitting element connected to the thin film transistor.
Abstract:
A flexible display includes: a first flexible substrate; an intermediate barrier layer positioned on the first flexible substrate and comprising silicon oxide; an adhesive layer positioned on the intermediate barrier layer and comprising at least one of amorphous silicon on which a P-type or N-type conductive impurity is doped, or hydrogenated amorphous silicon; a second flexible substrate positioned on the adhesive layer; a first barrier layer positioned on the second flexible substrate and comprising silicon oxide; a second barrier layer positioned on the first barrier layer and comprising silicon nitride; a buffer layer positioned on the second barrier layer and comprising silicon oxide; a thin film transistor positioned on the buffer layer; and an organic light emitting element connected to the thin film transistor.
Abstract:
A method of manufacturing a substrate for a display device includes forming a first organic layer on a base substrate; forming an inorganic layer on the first organic layer; and forming a second organic layer on the inorganic layer, where the second organic layer includes transition metal particles.
Abstract:
A method of manufacturing a flexible display includes: forming a first barrier layer on a flexible substrate; forming a second barrier layer including silicon nitride on the first barrier layer; releasing stress of the second barrier layer; forming a first buffer layer including silicon nitride on the second barrier layer; forming a second buffer layer on the first buffer layer; and forming a thin film transistor on the second buffer layer.