DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    显示装置及其制造方法

    公开(公告)号:US20150001487A1

    公开(公告)日:2015-01-01

    申请号:US14103354

    申请日:2013-12-11

    CPC classification number: H01L27/1259 H01L27/1248 H01L27/3258 H01L51/5246

    Abstract: A display device includes a substrate, an active layer, a gate insulation layer, a gate electrode, an interlayer insulation layer, a clad layer, a source electrode, and a drain electrode. The active layer is disposed on the substrate. The gate insulation layer is disposed on the active layer. The gate electrode is disposed on the gate insulation layer. The interlayer insulation layer is disposed on the gate electrode. A dielectric constant of the interlayer insulation layer is less than a dielectric constant of the gate insulation layer. The clad layer is disposed on the interlayer insulation layer. The source and drain electrodes are disposed on the clad layer.

    Abstract translation: 显示装置包括基板,有源层,栅极绝缘层,栅极电极,层间绝缘层,覆盖层,源极电极和漏极电极。 有源层设置在基板上。 栅极绝缘层设置在有源层上。 栅电极设置在栅绝缘层上。 层间绝缘层设置在栅电极上。 层间绝缘层的介电常数小于栅极绝缘层的介电常数。 包覆层设置在层间绝缘层上。 源极和漏极设置在覆盖层上。

    Display device and method of manufacturing the same
    5.
    发明授权
    Display device and method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US09190426B2

    公开(公告)日:2015-11-17

    申请号:US14103354

    申请日:2013-12-11

    CPC classification number: H01L27/1259 H01L27/1248 H01L27/3258 H01L51/5246

    Abstract: A display device includes a substrate, an active layer, a gate insulation layer, a gate electrode, an interlayer insulation layer, a clad layer, a source electrode, and a drain electrode. The active layer is disposed on the substrate. The gate insulation layer is disposed on the active layer. The gate electrode is disposed on the gate insulation layer. The interlayer insulation layer is disposed on the gate electrode. A dielectric constant of the interlayer insulation layer is less than a dielectric constant of the gate insulation layer. The clad layer is disposed on the interlayer insulation layer. The source and drain electrodes are disposed on the clad layer.

    Abstract translation: 显示装置包括基板,有源层,栅极绝缘层,栅极电极,层间绝缘层,覆盖层,源极电极和漏极电极。 有源层设置在基板上。 栅极绝缘层设置在有源层上。 栅电极设置在栅绝缘层上。 层间绝缘层设置在栅电极上。 层间绝缘层的介电常数小于栅极绝缘层的介电常数。 包覆层设置在层间绝缘层上。 源极和漏极设置在覆盖层上。

    Thin film transistor substrate, display device having the same and method of manufacturing the same
    6.
    发明授权
    Thin film transistor substrate, display device having the same and method of manufacturing the same 有权
    薄膜晶体管基板,具有该薄膜晶体管基板的显示装置及其制造方法

    公开(公告)号:US09437661B2

    公开(公告)日:2016-09-06

    申请号:US14877044

    申请日:2015-10-07

    CPC classification number: H01L27/3262 H01L29/42384 H01L29/4908 H01L2227/323

    Abstract: A thin film transistor substrate includes a semiconductor pattern on a base substrate, a first insulation member disposed on the semiconductor pattern, a second insulation pattern disposed on the first insulation member, and a gate electrode disposed on the first insulation member and the second insulation pattern. The second insulation pattern overlaps a first end portion of the semiconductor pattern, and exposes a second end portion of the semiconductor pattern opposite to the first end portion. The gate electrode overlaps both the first insulation member and the second insulation pattern.

    Abstract translation: 薄膜晶体管基板包括在基底基板上的半导体图形,设置在半导体图案上的第一绝缘构件,设置在第一绝缘构件上的第二绝缘图案,以及设置在第一绝缘构件和第二绝缘图案上的栅电极 。 第二绝缘图案与半导体图案的第一端部重叠,并且暴露出与第一端部部分相反的半导体图案的第二端部。 栅电极与第一绝缘构件和第二绝缘图案重叠。

    Thin film transistor and manufacturing method thereof
    7.
    发明授权
    Thin film transistor and manufacturing method thereof 有权
    薄膜晶体管及其制造方法

    公开(公告)号:US09263590B2

    公开(公告)日:2016-02-16

    申请号:US14558937

    申请日:2014-12-03

    Abstract: A thin film transistor (TFT) includes a semiconductor active layer, a gate electrode, a source electrode, and a drain electrode. The semiconductor active layer includes a first doped region as a source region, a second doped region as a drain region, an undoped region between the first and second doped regions. A third doped region is disposed between the second doped region and the undoped region. The gate electrode is insulated from the semiconductor active layer and overlaps the third doped region and the undoped region. The source electrode and the drain electrode are connected to the first and second doped regions.

    Abstract translation: 薄膜晶体管(TFT)包括半导体有源层,栅电极,源电极和漏电极。 半导体有源层包括作为源极区域的第一掺杂区域,作为漏极区域的第二掺杂区域,第一和第二掺杂区域之间的未掺杂区域。 第三掺杂区域设置在第二掺杂区域与未掺杂区域之间。 栅电极与半导体有源层绝缘,并与第三掺杂区和未掺杂区重叠。 源电极和漏电极连接到第一和第二掺杂区域。

    Thin film transistor substrate and display device having the same
    8.
    发明授权
    Thin film transistor substrate and display device having the same 有权
    薄膜晶体管基板及其显示装置

    公开(公告)号:US09184253B2

    公开(公告)日:2015-11-10

    申请号:US14156624

    申请日:2014-01-16

    CPC classification number: H01L27/3262 H01L29/42384 H01L29/4908 H01L2227/323

    Abstract: A thin film transistor substrate includes a semiconductor pattern on a base substrate, a first insulation member disposed on the semiconductor pattern, a second insulation pattern disposed on the first insulation member, and a gate electrode disposed on the first insulation member and the second insulation pattern. The second insulation pattern overlaps a first end portion of the semiconductor pattern, and exposes a second end portion of the semiconductor pattern opposite to the first end portion. The gate electrode overlaps both the first insulation member and the second insulation pattern.

    Abstract translation: 薄膜晶体管基板包括在基底基板上的半导体图形,设置在半导体图案上的第一绝缘构件,设置在第一绝缘构件上的第二绝缘图案,以及设置在第一绝缘构件和第二绝缘图案上的栅电极 。 第二绝缘图案与半导体图案的第一端部重叠,并且暴露出与第一端部部分相反的半导体图案的第二端部。 栅电极与第一绝缘构件和第二绝缘图案重叠。

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