Semiconductor devices having through electrodes and methods of manufacturing the same

    公开(公告)号:US10109545B2

    公开(公告)日:2018-10-23

    申请号:US15459592

    申请日:2017-03-15

    Applicant: SK hynix Inc.

    Abstract: Semiconductor devices are provided. The semiconductor device includes a semiconductor layer having a first surface and a second surface that are opposite each other, a through electrode penetrating the semiconductor layer and having a protrusion that protrudes over the second surface of the semiconductor layer, a front-side bump disposed over the first surface of the semiconductor layer and electrically coupled to the through electrode, a polymer pattern disposed over the second surface of the semiconductor layer to enclose a part of the protrusion of the through electrode, and a back-side bump covering an upper surface and a sidewall of a remaining part of the protrusion of the through electrode and extending over a portion of the polymer pattern.

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