公开(公告)号：US20180258529A1

公开(公告)日：2018-09-13

申请号：US15755962

申请日：2016-08-31

申请人： SILCOTEK CORP.

发明人： Thomas F. VEZZA ,  James B. MATTZELA ,  Gary A. BARONE ,  William David GROVE ,  Paul H. SILVIS

IPC分类号： C23C16/455 ,  C23C16/24

CPC分类号： C23C16/45523 ,  C23C16/045 ,  C23C16/24

摘要： Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.

公开(公告)号：US20220186040A1

公开(公告)日：2022-06-16

申请号：US17684860

申请日：2022-03-02

申请人： SILCOTEK CORP.

发明人： David A. SMITH ,  Min YUAN ,  James B. MATTZELA ,  Paul H. SILVIS

IPC分类号： C09D5/16 ,  C23C16/44 ,  C23C16/56 ,  C23C16/02 ,  C23C16/30

摘要： Industrial equipment articles and thermal chemical vapor coated articles are disclosed. The articles include a coating on a substrate of the industrial equipment article, the coating including silicon, carbon, and hydrogen. The industrial equipment article requires resistance to protein adsorption. The industrial equipment article was heated during application of the coating to a temperature of between 300 degrees C. and 600 degrees C. The thermal chemical vapor coated article includes a coating on the thermal chemical vapor coated article, the coating formed by thermal decomposition, oxidation, then functionalization. The thermal chemical vapor coated article is industrial equipment requiring resistance to protein adsorption. The coating is resistant to the protein adsorption and is on a substrate heated during the thermal decomposition.

公开(公告)号：US20190032201A1

公开(公告)日：2019-01-31

申请号：US15683399

申请日：2017-08-22

申请人： SILCOTEK CORP.

发明人： David A. SMITH ,  James B. MATTZELA ,  Paul H. SILVIS ,  Gary A. BARONE

IPC分类号： C23C16/32 ,  C23C16/56 ,  C23C8/10 ,  B05D1/00

CPC分类号： C23C16/325 ,  B05D1/60 ,  B05D2202/15 ,  C23C8/10 ,  C23C16/56 ,  Y10T428/24802

摘要： The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.

公开(公告)号：US20150283307A1

公开(公告)日：2015-10-08

申请号：US14680669

申请日：2015-04-07

申请人： SILCOTEK CORP.

发明人： David A. SMITH ,  Min YUAN ,  James B. MATTZELA ,  Paul H. SILVIS

IPC分类号： A61L31/08 ,  C09D5/16 ,  C23C16/44

CPC分类号： C09D5/1625 ,  A61L2420/02 ,  C09D5/16 ,  C23C16/0227 ,  C23C16/30 ,  C23C16/44 ,  C23C16/56 ,  Y10T428/13 ,  Y10T428/263 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features.

摘要翻译： 公开了涂覆制品。 该制品包括通过热分解，氧化然后官能化形成的涂层。 该物品配置为海洋环境，海洋环境包括污垢特征。 涂层耐污垢特征。 另外或替代地，制品是配置用于含蛋白质的环境的医疗装置，含蛋白质的环境包括蛋白质吸附特征。 该涂层耐蛋白质吸附特征。

公开(公告)号：US20190003044A1

公开(公告)日：2019-01-03

申请号：US16121994

申请日：2018-09-05

申请人： SILCOTEK CORP.

发明人： Min YUAN ,  James B. MATTZELA ,  David A. SMITH

IPC分类号： C23C16/34 ,  C23C16/455 ,  C23C16/04 ,  C23C16/30 ,  C23C16/56

摘要： Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.

公开(公告)号：US20170211180A1

公开(公告)日：2017-07-27

申请号：US15004455

申请日：2016-01-22

申请人： SILCOTEK CORP.

发明人： Thomas F. VEZZA ,  Steven A. CONDO ,  Nicholas Peter DESKEVICH ,  James B. MATTZELA ,  Paul H. SILVIS

IPC分类号： C23C16/455 ,  C23C16/46

CPC分类号： C23C16/455 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/46

摘要： Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

公开(公告)号：US20160289585A1

公开(公告)日：2016-10-06

申请号：US14675823

申请日：2015-04-01

申请人： SILCOTEK CORP.

发明人： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC分类号： C10M105/76 ,  C23C16/44 ,  C23C16/30

CPC分类号： C10M105/76 ,  C10M2227/045 ,  C10N2230/06 ,  C10N2250/14 ,  C10N2260/04 ,  C23C16/325 ,  C23C16/56

摘要： Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material.

摘要翻译： 公开了热化学气相沉积涂覆产品和这些产品的用途。 热化学气相沉积涂覆产品包括螺纹基底和在螺纹基底上的润滑涂层，该润滑涂层的摩擦系数在0.05和0.58之间，并且是热化学气相沉积。 一种方法包括使热化学气相沉积涂覆的产品与具有配合螺纹的材料接合，并在与材料接合的同时向热化学气相沉积涂覆的产品施加压力。

公开(公告)号：US20160060763A1

公开(公告)日：2016-03-03

申请号：US14821949

申请日：2015-08-10

申请人： SILCOTEK CORP.

发明人： Min YUAN ,  David A. SMITH ,  Paul H. SILVIS ,  James B. MATTZELA

IPC分类号： C23C16/52 ,  C23C16/22

CPC分类号： C23C16/52 ,  C23C16/22 ,  C23C16/30 ,  C23C16/46 ,  C23C16/56

摘要： A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

摘要翻译： 公开了一种化学气相沉积工艺和涂覆制品。 化学气相沉积工艺包括将物品定位在化学气相沉积室中，然后将沉积气体以低于沉积气体的热分解温度的分解温度引入化学气相沉积室，然后加热室 达到等于或高于沉积气体的热分解温度的超分解温度，从沉积气体的引入导致在制品的至少一个表面上沉积的涂层。 化学气相沉积工艺保持在0.01psia和200psia的压力范围内和/或沉积气体是二甲基硅烷。 涂覆制品包括经受腐蚀的基材和在基材上沉积的涂层，沉积的涂层具有硅，并具有耐腐蚀性。

公开(公告)号：US20170167015A1

公开(公告)日：2017-06-15

申请号：US14970015

申请日：2015-12-15

申请人： SILCOTEK CORP.

发明人： Min YUAN ,  James B. MATTZELA ,  David A. SMITH

IPC分类号： C23C16/34 ,  C23C16/455 ,  C23C16/56 ,  C23C16/30

CPC分类号： C23C16/345 ,  C23C16/045 ,  C23C16/308 ,  C23C16/45523 ,  C23C16/45557 ,  C23C16/56

摘要： Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.

公开(公告)号：US20160289824A1

公开(公告)日：2016-10-06

申请号：US14675795

申请日：2015-04-01

申请人： SILCOTEK CORP.

发明人： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC分类号： C23C16/44 ,  C22C21/08 ,  C23C16/02

CPC分类号： C23C16/44 ,  C22C21/08 ,  C23C16/0209

摘要： An article including a coating and a process including an article with a coating are disclosed. The article includes an aluminum-containing substrate including, by weight, at least 95% aluminum, and a coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C. The process includes transporting fluid along a coated and stabilized surface positioned on an aluminum-containing substrate.

摘要翻译： 公开了一种包括涂层和包括具有涂层的制品的工艺的制品。 该制品包括含铝基材，其包含至少95重量％的铝，以及在含铝基材上的涂层和稳定化表面，涂覆和稳定的表面通过热化学气相沉积在小于 600℃。该方法包括沿着位于含铝基底上的涂覆和稳定的表面输送流体。