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公开(公告)号：US20190032201A1
公开(公告)日：2019-01-31
申请号：US15683399
申请日：2017-08-22
申请人： SILCOTEK CORP.
CPC分类号： C23C16/325 , B05D1/60 , B05D2202/15 , C23C8/10 , C23C16/56 , Y10T428/24802
摘要： The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.
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公开(公告)号：US20220136110A1
公开(公告)日：2022-05-05
申请号：US17511953
申请日：2021-10-27
申请人： SILCOTEK CORP.
摘要： De-icing processes and products with coatings enabling de-icing are disclosed. The de-icing process includes mechanically removing ice from a coated article having a chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic after the mechanically removing of the ice. The product is a coated article having a chemical vapor deposition coating and ice on the chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic in response to mechanically removing of the ice on the chemical vapor deposition coating.
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公开(公告)号：US20210381105A1
公开(公告)日：2021-12-09
申请号：US17411545
申请日：2021-08-25
申请人： SILCOTEK CORP.
发明人： Gary A. BARONE
IPC分类号： C23C16/455 , C23C16/24
摘要： Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.
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公开(公告)号：US20210261790A1
公开(公告)日：2021-08-26
申请号：US17306586
申请日：2021-05-03
申请人： SILCOTEK CORP.
发明人： Geoffrey K. WHITE , Nikolis Austin SNYDER , Nicholas Peter DESKEVICH , Gary A. BARONE , David A. SMITH , Lucas D. PATTERSON , Martin E. HIGGINS
IPC分类号： C09D5/08 , C23C16/34 , C23C16/40 , C23C16/32 , C23C16/54 , C23C16/46 , C09D1/00 , C09D183/04 , C09D183/16
摘要： A coated system for containing or conveying a hydrogen-containing fluid including a hydrogen susceptible metallic substrate and a coating on the hydrogen susceptible metallic substrate. The hydrogen-containing fluid is in contact with the coating and the coating reduces or eliminates the effect of hydrogen on the hydrogen susceptible metallic substrate. A coating process for coating a hydrogen susceptible metallic substrate is also disclosed.
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公开(公告)号：US20180258529A1
公开(公告)日：2018-09-13
申请号：US15755962
申请日：2016-08-31
申请人： SILCOTEK CORP.
IPC分类号： C23C16/455 , C23C16/24
CPC分类号： C23C16/45523 , C23C16/045 , C23C16/24
摘要： Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.
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公开(公告)号：US20240327981A1
公开(公告)日：2024-10-03
申请号：US18743370
申请日：2024-06-14
申请人： SILCOTEK CORP.
发明人： Gary A. BARONE
IPC分类号： C23C16/455 , C23C16/04 , C23C16/24
CPC分类号： C23C16/45523 , C23C16/24 , C23C16/045
摘要： Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.
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公开(公告)号：US20230258418A1
公开(公告)日：2023-08-17
申请号：US18018416
申请日：2021-06-16
申请人： SILCOTEK CORP.
发明人： Gary A. BARONE
IPC分类号： F28F19/02
CPC分类号： F28F19/02 , F28F2265/20
摘要： Heat exchanger processes are disclosed. A heat exchanger process uses a heat exchanger. The heat exchanger has a surface positioned to be contacted by a fluid. The heat exchanger process includes contacting the surface with the fluid by transporting the fluid through the heat exchanger and transferring heat between the surface and the fluid. The transporting is at a rate of less than 2 meters per second, the surface includes a fouling-resistant coating, the fluid includes particles known to cause fouling, or a combination thereof.
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公开(公告)号：US20240117495A1
公开(公告)日：2024-04-11
申请号：US17768249
申请日：2020-10-13
申请人： SILCOTEK CORP.
发明人： Geoffrey K. WHITE , Nicholas P. DESKEVICH , James B. MATTZELA , Gary A. BARONE , David A. SMITH , Pierre A. LECLAIR , Min YUAN , Jesse BISCHOF
IPC分类号： C23C16/52 , C23C16/44 , C23C16/455 , C23C16/46
CPC分类号： C23C16/52 , C23C16/4404 , C23C16/45523 , C23C16/46
摘要： Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.
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公开(公告)号：US20230383126A1
公开(公告)日：2023-11-30
申请号：US18331647
申请日：2023-06-08
申请人： SILCOTEK CORP.
CPC分类号： C09D5/00 , C23C16/30 , C23C16/56 , C23C16/401 , Y10T428/31612 , C23C16/0272 , C23C16/18 , Y10T428/265 , Y10T428/31663 , C23C30/00
摘要： Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.
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公开(公告)号：US20200263296A1
公开(公告)日：2020-08-20
申请号：US16870034
申请日：2020-05-08
申请人： SILCOTEK CORP.
发明人： Gary A. BARONE
IPC分类号： C23C16/455 , C23C16/24
摘要： Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.
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