公开(公告)号：US20170335451A1

公开(公告)日：2017-11-23

申请号：US15599019

申请日：2017-05-18

申请人： SILCOTEK CORP.

发明人： Nicholas P. DESKEVICH ,  Pierre A. LECLAIR ,  David A. SMITH

IPC分类号： C23C16/448 ,  C23C16/32 ,  C23C16/42 ,  C23C16/455

CPC分类号： C23C16/4485 ,  C22C19/00 ,  C22C19/03 ,  C22C19/055 ,  C22C19/056 ,  C22C21/00 ,  C22C21/02 ,  C22C21/04 ,  C22C21/12 ,  C22C21/14 ,  C22C21/16 ,  C22C38/00 ,  C23C16/30 ,  C23C16/4408 ,  C23C16/4481 ,  C23C16/45561

摘要： Static thermal chemical vapor deposition treatment processes and static thermal chemical vapor deposition treatment systems are disclosed. The process includes providing an enclosed chamber configured to produce a material on a surface of an article within the enclosed chamber in response thermal energy being applied to a gaseous precursor, providing a liquid handling system in selective fluid communication with the enclosed chamber, flowing a liquid precursor through the liquid handling system, converting the liquid precursor to the gaseous precursor, and producing the material on the surface of the article in response to the thermal energy being applied to the gaseous precursor within the enclosed chamber. The system includes the enclosed chamber and the liquid handling system.

公开(公告)号：US20240117495A1

公开(公告)日：2024-04-11

申请号：US17768249

申请日：2020-10-13

申请人： SILCOTEK CORP.

发明人： Geoffrey K. WHITE ,  Nicholas P. DESKEVICH ,  James B. MATTZELA ,  Gary A. BARONE ,  David A. SMITH ,  Pierre A. LECLAIR ,  Min YUAN ,  Jesse BISCHOF

IPC分类号： C23C16/52 ,  C23C16/44 ,  C23C16/455 ,  C23C16/46

CPC分类号： C23C16/52 ,  C23C16/4404 ,  C23C16/45523 ,  C23C16/46

摘要： Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.