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公开(公告)号：US10087521B2
公开(公告)日：2018-10-02
申请号：US14970015
申请日：2015-12-15
申请人： SILCOTEK CORP.
发明人： Min Yuan , James B. Mattzela , David A. Smith
摘要： Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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公开(公告)号：US10881986B2
公开(公告)日：2021-01-05
申请号：US16282626
申请日：2019-02-22
申请人： SILCOTEK CORP.
发明人： Jesse Bischof , Lucas D. Patterson , Gary Barone , Min Yuan , David A. Smith
IPC分类号： B01D15/22 , G01N30/56 , B01D15/16 , G01N30/30 , G01N30/60 , B01D15/38 , G01N30/36 , B01J20/32
摘要： Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.
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公开(公告)号：US11807777B2
公开(公告)日：2023-11-07
申请号：US16801230
申请日：2020-02-26
申请人： SILCOTEK CORP.
CPC分类号： C09D5/00 , C23C16/0272 , C23C16/18 , C23C16/30 , C23C16/401 , C23C16/56 , C23C30/00 , Y10T428/265 , Y10T428/31612 , Y10T428/31663
摘要： Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.
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公开(公告)号：US10316408B2
公开(公告)日：2019-06-11
申请号：US14946115
申请日：2015-11-19
申请人： SILCOTEK CORP. , AIXTRON SE
发明人： David A. Smith , Min Yuan , James B. Mattzela , Olaf Martin Wurzinger , Dietmar Keiper , Anna Katharina Haab
摘要： A delivery device, manufacturing system, and process of manufacturing are disclosed. The delivery device includes a feed tube and a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from decomposition of dimethylsilane. The manufacturing system includes the delivery device and a chamber in selective fluid communication with the delivery device. The process of manufacturing uses the manufacturing system to produce an article.
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公开(公告)号：US11959894B2
公开(公告)日：2024-04-16
申请号：US16971216
申请日：2019-02-22
申请人： SILCOTEK CORP.
发明人： Jesse Bischof , Lucas D. Patterson , Gary Barone , Min Yuan , David A. Smith
IPC分类号： G01N30/56 , B01D15/16 , B01D15/20 , B01D15/22 , B01D15/38 , G01N30/30 , G01N30/36 , B01J20/32 , G01N30/02 , G01N30/60
CPC分类号： G01N30/56 , B01D15/161 , B01D15/163 , B01D15/166 , B01D15/206 , B01D15/22 , B01D15/3828 , G01N30/30 , G01N30/36 , B01J20/3265 , G01N2030/027 , G01N2030/567 , G01N30/60
摘要： LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.
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公开(公告)号：US10731247B2
公开(公告)日：2020-08-04
申请号：US15683399
申请日：2017-08-22
申请人： SILCOTEK CORP.
摘要： The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.
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公开(公告)号：US11292924B2
公开(公告)日：2022-04-05
申请号：US14680669
申请日：2015-04-07
申请人： SILCOTEK CORP.
发明人： David A. Smith , Min Yuan , James B. Mattzela , Paul H. Silvis
摘要： A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features.
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公开(公告)号：US11261524B2
公开(公告)日：2022-03-01
申请号：US16379236
申请日：2019-04-09
申请人： SILCOTEK CORP.
摘要： Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.
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公开(公告)号：US10851455B2
公开(公告)日：2020-12-01
申请号：US16121994
申请日：2018-09-05
申请人： SILCOTEK CORP.
发明人： Min Yuan , James B. Mattzela , David A. Smith
摘要： Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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公开(公告)号：US09975143B2
公开(公告)日：2018-05-22
申请号：US14784731
申请日：2014-05-14
申请人： SILCOTEK CORP.
发明人： David A. Smith , Paul H. Silvis
摘要： Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.
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