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公开(公告)号：US20250065360A1
公开(公告)日：2025-02-27
申请号：US18768956
申请日：2024-07-10
Applicant: SEMES CO., LTD. , Samsung Electronics Co., Ltd.
Inventor： Jin Yeong Sung , Ki Hoon Choi , Seung Un Oh , Young Ho Park , Sang Hyeon Ryu , Jang Jin Lee , Hyun Yoon , Sang Gun Lee , Yu Jin Cho , Ho Jong Hwang , Jong Ju Park , Jong Keun Oh , Yong Woo Kim
IPC: B05C13/00 , G05B19/401 , G05B19/404 , G06T7/73
Abstract: A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.
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公开(公告)号：US11354798B2
公开(公告)日：2022-06-07
申请号：US16886591
申请日：2020-05-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kang Won Lee , Cheol Ki Min , Jong Ju Park , Hyon Seok Song
Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
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公开(公告)号：US20220283489A1
公开(公告)日：2022-09-08
申请号：US17501085
申请日：2021-10-14
Applicant: SAMSUNG ELECTRONICS CO.,LTD.
Inventor： SANG UK PARK , Jong Ju Park , Jong Keun Oh
Abstract: A reflective photomask includes a pattern area, a non-pattern area at least partially surrounding the pattern area, and a black border area interposed between the pattern area and the non-pattern area. The reflective photomask includes a mask substrate, a reflector layer stacked on the mask substrate, and an absorber layer stacked on the reflector layer. The black border area includes a plurality of first anneal patterns which are arranged along an edge of the pattern area and each have an island shape, and a second anneal pattern which fills inside of the black border area and has a line shape.
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Patent Agency Ranking
公开(公告)号：US20200294219A1
公开(公告)日：2020-09-17
申请号：US16886591
申请日：2020-05-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： KANG WON LEE , Cheol ki Min , Jong Ju Park , Hyon Seok Song
Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
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公开(公告)号：US10726541B2
公开(公告)日：2020-07-28
申请号：US16013417
申请日：2018-06-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kang Won Lee , Cheol Ki Min , Jong Ju Park , Hyon Seok Song
Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
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公开(公告)号：US11829063B2
公开(公告)日：2023-11-28
申请号：US17501085
申请日：2021-10-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang Uk Park , Jong Ju Park , Jong Keun Oh
IPC: G03F1/24
CPC classification number: G03F1/24
Abstract: A reflective photomask includes a pattern area, a non-pattern area at least partially surrounding the pattern area, and a black border area interposed between the pattern area and the non-pattern area. The reflective photomask includes a mask substrate, a reflector layer stacked on the mask substrate, and an absorber layer stacked on the reflector layer. The black border area includes a plurality of first anneal patterns which are arranged along an edge of the pattern area and each have an island shape, and a second anneal pattern which fills inside of the black border area and has a line shape.
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公开(公告)号：US11727557B2
公开(公告)日：2023-08-15
申请号：US17661830
申请日：2022-05-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kang Won Lee , Cheol Ki Min , Jong Ju Park , Hyon Seok Song
CPC classification number: G06T7/001 , G06T7/337 , G06T7/97 , G06T2207/30148
Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
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公开(公告)号：US20190139209A1
公开(公告)日：2019-05-09
申请号：US16013417
申请日：2018-06-20
Applicant: SAMSUNG ELECTRONICS CO., LTD
Inventor： Kang Won Lee , Cheol Ki Min , Jong Ju Park , Hyon Seok Song
Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
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