公开(公告)号：US20220261976A1

公开(公告)日：2022-08-18

申请号：US17661830

申请日：2022-05-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： KANG WON LEE ,  CHEOL KI MIN ,  JONG JU PARK ,  HYON SEOK SONG

IPC: G06T7/00 ,  G06T7/33 ,  G06V10/56 ,  G06V10/75

Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.

公开(公告)号：US20200294219A1

公开(公告)日：2020-09-17

申请号：US16886591

申请日：2020-05-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： KANG WON LEE ,  Cheol ki Min ,  Jong Ju Park ,  Hyon Seok Song

IPC: G06T7/00 ,  G06K9/62 ,  G06K9/46 ,  G06T7/33

Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.