公开(公告)号：US20250065360A1

公开(公告)日：2025-02-27

申请号：US18768956

申请日：2024-07-10

Applicant: SEMES CO., LTD. ,  Samsung Electronics Co., Ltd.

Inventor： Jin Yeong Sung ,  Ki Hoon Choi ,  Seung Un Oh ,  Young Ho Park ,  Sang Hyeon Ryu ,  Jang Jin Lee ,  Hyun Yoon ,  Sang Gun Lee ,  Yu Jin Cho ,  Ho Jong Hwang ,  Jong Ju Park ,  Jong Keun Oh ,  Yong Woo Kim

IPC: B05C13/00 ,  G05B19/401 ,  G05B19/404 ,  G06T7/73

Abstract: A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.

公开(公告)号：US20220059309A1

公开(公告)日：2022-02-24

申请号：US17409840

申请日：2021-08-24

Applicant: SEMES CO., LTD.

Inventor： DOYEON KIM ,  HYUN YOON ,  Ho Jong Hwang

IPC: H01J37/02 ,  H01J37/317 ,  H01J37/20 ,  H01L21/687

Abstract: An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.

公开(公告)号：US11887883B2

公开(公告)日：2024-01-30

申请号：US17341696

申请日：2021-06-08

Applicant: SEMES CO., LTD.

Inventor： Do Yeon Kim ,  Pil Kyun Heo ,  Ho Jong Hwang ,  Hyun Yoon ,  Jong Min Lee ,  Chul Gyun Baik

IPC: B32B3/00 ,  H01L21/687 ,  B29C45/00 ,  B29C45/16 ,  B29K507/04 ,  B29K27/18

CPC classification number: H01L21/68757 ,  B29C45/0001 ,  B29C45/0055 ,  B29C45/16 ,  H01L21/68721 ,  B29K2027/18 ,  B29K2507/04

Abstract: A heterogeneous composite material and a method for manufacturing the heterogeneous composite material are provided. The heterogeneous composite material includes a first compression structure formed by compressing a first material, and a second compression structure formed by compressing a second material different from the first material, and disposed in close contact with the first compression structure, wherein at least a portion of the first compression structure and at least a portion of the second compression structure are disposed on both sides of a boundary surface existing in a circular shape with a predetermined radius with respect to a central axis in a state in contact with each other at the boundary surface.

公开(公告)号：US12237181B2

公开(公告)日：2025-02-25

申请号：US17703255

申请日：2022-03-24

Applicant: SEMES CO., LTD.

Inventor： Ho Jong Hwang ,  Do Yeon Kim ,  Hyun Yoon

IPC: H01L21/67 ,  B08B3/02 ,  B08B3/04 ,  B08B3/08 ,  H01L21/687

Abstract: The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a cup having a treatment space therein; a support unit configured to support a substrate within the treatment space, and including a rotatable support plate; and a liquid discharge unit configured to discharge a chemical liquid to the substrate supported by the support unit, in which the support unit includes: a plurality of pin members provided to the support plate to support the substrate placed on the support plate; and a discharge member coupled to the pin member to discharge charges to the air according to a rotation of the support plate, and the discharge member is provided as a conductive member.

公开(公告)号：US11961695B2

公开(公告)日：2024-04-16

申请号：US17409840

申请日：2021-08-24

Applicant: SEMES CO., LTD.

Inventor： Doyeon Kim ,  Hyun Yoon ,  Ho Jong Hwang

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/317 ,  H01L21/687

CPC classification number: H01J37/026 ,  H01J37/20 ,  H01J37/3171 ,  H01L21/6875 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.

公开(公告)号：US11806767B2

公开(公告)日：2023-11-07

申请号：US17825049

申请日：2022-05-26

Applicant: SEMES CO., LTD.

Inventor： Ho Jong Hwang

IPC: B08B9/093

CPC classification number: B08B9/093

Abstract: A substrate processing apparatus includes a spraying unit installed in an inner space of a chamber member in which a substrate is processed, spraying a cleaning liquid into the inner space of the chamber member so as to clean devices for discharging a chemical liquid to the substrate and then collecting the chemical liquid, and spraying a drying gas for drying the remaining cleaning liquid into the inner space of the chamber member, a management unit removing a residue remaining on the spraying unit after the spraying unit sprays the cleaning liquid, and a controller controlling the spraying unit and the management unit.

公开(公告)号：US11804371B2

公开(公告)日：2023-10-31

申请号：US16920418

申请日：2020-07-02

Applicant: SEMES CO., LTD.

Inventor： Do Yeon Kim ,  Se Hoon Oh ,  Won Geun Kim ,  Ju Mi Lee ,  Ho Jong Hwang ,  Pil Kyun Heo ,  Hyun Yoon ,  Choong Hyun Lee ,  Hyun Goo Park

IPC: H01L21/02 ,  H01L21/67 ,  B05C11/08 ,  G03F7/16

CPC classification number: H01L21/02057 ,  H01L21/6715 ,  B05C11/08 ,  G03F7/162 ,  H01L21/02282 ,  H01L21/67051

Abstract: Provided is a substrate treatment apparatus including a treatment container equipped with a conductive member. The conductive member is made of a material having a lower resistivity than that of the treatment container. The conductive member prevents a rise of an electric potential of the treatment container, which is caused by charging during treatment of a substrate, thereby preventing the substrate from being contaminated and damaged by particles and electrostatic arcing.

公开(公告)号：US20210384064A1

公开(公告)日：2021-12-09

申请号：US17341696

申请日：2021-06-08

Applicant: SEMES CO., LTD.

Inventor： Do Yeon Kim ,  Pil Kyun Heo ,  Ho Jong Hwang ,  Hyun Yoon ,  Jong Min Lee ,  Chul Gyun Baik

IPC: H01L21/687 ,  B29C45/00 ,  B29C45/16

Abstract: A heterogeneous composite material and a method for manufacturing the heterogeneous composite material are provided. The heterogeneous composite material includes a first compression structure formed by compressing a first material, and a second compression structure formed by compressing a second material different from the first material, and disposed in close contact with the first compression structure, wherein at least a portion of the first compression structure and at least a portion of the second compression structure are disposed on both sides of a boundary surface existing in a circular shape with a predetermined radius with respect to a central axis in a state in contact with each other at the boundary surface.