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公开(公告)号：US20200157058A1
公开(公告)日：2020-05-21
申请号：US16571332
申请日：2019-09-16
发明人： Myungjin LEE , Victor ROEV , Hongsoo CHOI , Dongmin IM , Yoonhyun KWAK , Sangbok MA , Minsik PARK , Sungjun PARK
IPC分类号： C07D249/08 , H01M4/1397 , H01M4/40 , H01M10/0525 , H01M10/0568 , H01M10/0569 , C07D403/04 , C07D403/14 , C07D249/18
摘要： A metallic salt including at least one anion having a heterocyclic aromatic structure represented by one of Formulae 1 to 3; and a metallic cation: wherein, in Formulae 1 to 3, each X is independently N, P, or As, one of A1 and A2 is an electron-donating group, and the other one is an electron-withdrawing group, ring, Ar1 and ring Ar2 are as defined herein, L is a linker group as defined herein, m is an integer from 1 to 5, and n is an integer from 0 to 5.
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2.发明申请公开(公告)号：US20150325807A1
公开(公告)日：2015-11-12
申请号：US14602337
申请日：2015-01-22
发明人： Whail CHOI , Yoonhyun KWAK , Soyeon KIM , Bumwoo PARK , Sunyoung LEE , Jiyoun LEE , Jongwon CHOI
CPC分类号： C07F15/0026 , C07F15/0053 , C09K11/06 , C09K2211/185 , H01L51/0086 , H01L51/0088 , H01L51/5016 , H01L51/5028
摘要： An organometallic compound represented by Formula 1: wherein in Formula 1, CY1, M, L, R1, R2, R3, R4, a1, a2, n1, and n2 are described in the specification.
摘要翻译： 由式1表示的有机金属化合物：其中在式1中，说明书中描述了CY1，M，L，R1，R2，R3，R4，a1，a2，n1和n2。
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公开(公告)号：US20150336937A1
公开(公告)日：2015-11-26
申请号：US14598896
申请日：2015-01-16
发明人： Kumhee LEE , Jiyoun LEE , Yoonhyun KWAK , Youngjae PARK , Seokhwan HONG
IPC分类号： C07D405/14 , H01L51/00
CPC分类号： C07D405/14 , C07D409/14 , C07D413/14 , C07D417/14 , C07D471/04 , C07D495/04 , H01L51/0067 , H01L51/0072 , H01L51/0073 , H01L51/5012 , H01L51/5016 , H01L2251/5384
摘要： A carbazole compound represented by Formula 1 wherein, in Formula 1, X1, L1 to L5, R1 to R4, R11, R12, a1 to a5, b1 to b4, b11, b12, and c1 are described in the specification.
摘要翻译： 由式1表示的咔唑化合物，其中式1中的X1，L1〜L5，R1〜R4，R11，R12，a1〜a5，b1〜b4，b11，b12，和c1在本说明书中进行了说明。
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4.发明申请CONDENSED CYCLIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE SAME 有权浓缩环化合物和有机发光装置，包括它们公开(公告)号：US20150333273A1
公开(公告)日：2015-11-19
申请号：US14599724
申请日：2015-01-19
发明人： Sunyoung LEE , Soyeon KIM , Yoonhyun KWAK , Sangdong KIM , Sangyeob LEE
IPC分类号： H01L51/00 , C07D519/00 , C07D487/06
CPC分类号： C07D487/06 , C07D519/00 , H01L51/0067 , H01L51/0072 , H01L51/0085 , H01L51/0087 , H01L51/5012 , H01L51/5016 , H01L51/5024 , H01L51/5072 , H01L2251/5384
摘要： A condensed cyclic compound represented by one of Formulae 1A to 1C, wherein Formulae 1A to 1C are disclosed in the detailed description.
摘要翻译： 由式1A至1C之一表示的缩合的环状化合物，其中式1A至1C在详细描述中公开。
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5.发明公开公开(公告)号：US20240255847A1
公开(公告)日：2024-08-01
申请号：US18404865
申请日：2024-01-04
发明人： Hana KIM , Yoonhyun KWAK , Hyeran KIM , Beomseok KIM , Hoyoon PARK , Sunyoung LEE , Minyoung HA
CPC分类号： G03F7/0045 , G03F7/0048 , G03F7/039
摘要： Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:
For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.-
公开(公告)号：US20240231222A1
公开(公告)日：2024-07-11
申请号：US18212913
申请日：2023-06-22
发明人： Kyungoh KIM , Sunghyun HAN , SukKoo HONG , Moo Hyun KOH , Haeng Deog KOH , Yoonhyun KWAK , Jaemyoung KIM
IPC分类号： G03F7/004 , C07F7/22 , H01L21/027
CPC分类号： G03F7/0042 , C07F7/2224 , H01L21/0275 , H01L21/0276
摘要： Provided is a photoresist composition including an organometallic compound including: a central metal; a first ligand compound; and a second ligand compound, wherein the first ligand compound bonds with the central metal, the second ligand compound does not bond with the central metal, and the first or second ligand compound includes a halogen element. The photoresist composition may improve photosensitivity while securing stability.
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7.发明公开公开(公告)号：US20240201588A1
公开(公告)日：2024-06-20
申请号：US18192316
申请日：2023-03-29
发明人： Hana KIM , Beomseok KIM , Kyuhyun IM , Yoonhyun KWAK , Hyeran KIM
IPC分类号： G03F7/004 , C07C65/10 , C07C309/12 , C07C311/09 , C07C391/02 , C07C395/00 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0045 , C07C65/10 , C07C309/12 , C07C311/09 , C07C391/02 , C07C395/00 , G03F7/0382 , G03F7/0397 , C07C2603/74
摘要： Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:
wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.-
8.发明公开公开(公告)号：US20240199540A1
公开(公告)日：2024-06-20
申请号：US18312825
申请日：2023-05-05
发明人： Hoyoon PARK , Hana KIM , Kyuhyun IM , Haengdeog KOH , Yoonhyun KWAK , Hyeran KIM , Changheon LEE
IPC分类号： C07C323/09 , G03F7/004 , G03F7/20
CPC分类号： C07C323/09 , G03F7/0042 , G03F7/2004 , G03F7/2059 , C07C2601/16
摘要： Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:
wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.-
9.发明公开公开(公告)号：US20230324791A1
公开(公告)日：2023-10-12
申请号：US18313555
申请日：2023-05-08
发明人： Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C309/12 , C07D333/76 , C07C381/12
CPC分类号： G03F7/0045 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039 , C07C2603/74
摘要： Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.-
10.发明公开公开(公告)号：US20230161245A1
公开(公告)日：2023-05-25
申请号：US18047030
申请日：2022-10-17
发明人： Minsang KIM , Haengdeog KOH , Hana KIM , Yoonhyun KWAK , Hyeran KIM , Eunkyung LEE , Aram JEON
IPC分类号： G03F7/004 , G03F7/039 , C08F220/18
CPC分类号： G03F7/0045 , G03F7/0392 , C08F220/1807
摘要： Provided are a photoacid generator, a photoresist composition including the same, and a method of forming a pattern by using the photoacid generator. The photoacid generator includes a copolymer of a monomer that generates an acid upon exposure to light and an acid-labile monomer of which solubility with respect to a developing solvent is changed by decomposition by an acid, wherein the copolymer is represented by Formula 1:
wherein, in Formula 1, x, y, L, A−, B+, R1, R2, and R3 are each the same as described in the detailed description.
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