SEMICONDUCTOR DEVICES
    3.
    发明申请

    公开(公告)号:US20210184038A1

    公开(公告)日:2021-06-17

    申请号:US16893549

    申请日:2020-06-05

    IPC分类号: H01L29/78 H01L23/522

    摘要: A semiconductor device includes first and second active patterns, a first gate structure, first and second channels, and first and second source/drain layers. The first and second active patterns extend in a first direction, and are spaced apart in a second direction. The first gate structure extends in the second direction on the first and second active patterns. The first channels are spaced apart in a third direction on the first active pattern. The second channels are spaced apart in the third direction on the second active pattern. The first source/drain layer having a first conductivity type is formed at a side of the first gate structure to contact the first channels. The second source/drain layer having a second conductivity type is formed at a side of the first gate structure to contact the second channels. Widths in the second direction of the first and second channels are different.