公开(公告)号：US11569239B2

公开(公告)日：2023-01-31

申请号：US17126195

申请日：2020-12-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kiseok Lee ,  Bong-Soo Kim ,  Jiyoung Kim ,  Hui-Jung Kim ,  Seokhan Park ,  Hunkook Lee ,  Yoosang Hwang

IPC: H01L27/108 ,  H01L23/528 ,  H01L29/08 ,  H01L29/165 ,  H01L29/10 ,  H01L23/522 ,  H01L49/02

Abstract: Semiconductor memory devices may include first and second stacks on a substrate and first and second interconnection lines on the first and second stacks. Each of the first and second stacks may include semiconductor patterns vertically stacked on the substrate, conductive lines connected to the semiconductor patterns, respectively, and a gate electrode that is adjacent to the semiconductor patterns and extends in a vertical direction. The first stack may include a first conductive line and a first gate electrode, and the second stack may include a second conductive line and a second gate electrode. Lower surfaces of the first and second conductive lines may be coplanar. The first interconnection line may be electrically connected to at least one of the first and second conductive lines. The second interconnection line may be electrically connected to at least one of the first and second gate electrodes.

公开(公告)号：US10910378B2

公开(公告)日：2021-02-02

申请号：US16268748

申请日：2019-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kiseok Lee ,  Bong-Soo Kim ,  Jiyoung Kim ,  Hui-Jung Kim ,  Seokhan Park ,  Hunkook Lee ,  Yoosang Hwang

IPC: H01L27/108 ,  H01L23/528 ,  H01L29/08 ,  H01L29/165 ,  H01L29/10 ,  H01L23/522 ,  H01L49/02

Abstract: Semiconductor memory devices may include first and second stacks on a substrate and first and second interconnection lines on the first and second stacks. Each of the first and second stacks may include semiconductor patterns vertically stacked on the substrate, conductive lines connected to the semiconductor patterns, respectively, and a gate electrode that is adjacent to the semiconductor patterns and extends in a vertical direction. The first stack may include a first conductive line and a first gate electrode, and the second stack may include a second conductive line and a second gate electrode. Lower surfaces of the first and second conductive lines may be coplanar. The first interconnection line may be electrically connected to at least one of the first and second conductive lines. The second interconnection line may be electrically connected to at least one of the first and second gate electrodes.

公开(公告)号：US11100958B2

公开(公告)日：2021-08-24

申请号：US16522958

申请日：2019-07-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hui-Jung Kim ,  Keunnam Kim ,  Hunkook Lee ,  Yoosang Hwang

IPC: H01L27/105 ,  G11C5/06 ,  G11C8/14 ,  G11C7/18

Abstract: A semiconductor memory device comprising a substrate including a cell region, first and second contact regions, and a bit peripheral circuit region disposed between the first and second contact regions. A first stack structure is disposed on the cell region and the first contact region. A second stack structure is disposed on the cell region and the second contact region. A peripheral transistor is disposed on the bit peripheral circuit region and is electrically connected to the first and second stack structures. Each of the first and second stack structures comprises semiconductor patterns vertically stacked on the cell region, and conductive lines having connection with the semiconductor patterns and extending along a first direction from the cell region onto corresponding first and second contact regions. The conductive lines have stepwise structures on the first and second contact regions.