公开(公告)号：US20190019648A1

公开(公告)日：2019-01-17

申请号：US16128441

申请日：2018-09-11

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/10 ,  H01J37/317 ,  H01J37/12 ,  H01J37/06 ,  G02B5/00 ,  H01J37/073

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

公开(公告)号：US20250073989A1

公开(公告)日：2025-03-06

申请号：US18818417

申请日：2024-08-28

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu ,  Bryan W. Boudouris

IPC: B29C64/129 ,  B29C64/268 ,  B29C64/277 ,  B33Y10/00 ,  B33Y30/00 ,  B82Y40/00

Abstract: A method of additive manufacturing includes directing a first photon beam onto a resin and directing a second photon beam onto the resin to generate a reactive species from the initiator molecule to thereby polymerize a portion of the resin. The resin includes an initiator molecule and a sensitizer molecule. The first photon beam simultaneously excites each of the initiator molecule and the sensitizer molecule, transitions each of the initiator molecule and the sensitizer molecule into their respective singlet excited states; and transfers, at least one of energy or electrons, from the singlet excited state of the sensitizer molecule to the initiator molecule.

公开(公告)号：US11305482B2

公开(公告)日：2022-04-19

申请号：US15652105

申请日：2017-07-17

Applicant: Purdue Research Foundation

Inventor： Xianfan Xu ,  Bryan William Boudouris ,  Liang Pan

IPC: B29C64/129 ,  B29C64/135 ,  B29C64/245 ,  B29C64/268 ,  B33Y10/00 ,  B33Y30/00

Abstract: A rapidly printing 3D nanostructures arrangement, comprising a first photonic source configured to provide photoinitiation energy to a polymer medium via a dynamic light spatial modulator to an excited state to initiate polymerization, a second photonic source configured to selectively provide inhibition energy to the polymerized medium to a depleted state to inhibit polymerization thereby generating a dead zone below a growth zone, the dead zone allows continuous 3D polymerization.

公开(公告)号：US10861668B2

公开(公告)日：2020-12-08

申请号：US16128441

申请日：2018-09-11

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/10 ,  H01J37/06 ,  H01J37/12 ,  H01J37/317 ,  G02B5/00 ,  H01J37/073

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

公开(公告)号：US20220234282A1

公开(公告)日：2022-07-28

申请号：US17724237

申请日：2022-04-19

Applicant: Purdue Research Foundation

Inventor： Xianfan Xu ,  Bryan William Boudouris ,  Liang Pan

IPC: B29C64/129 ,  B29C64/135 ,  B29C64/268 ,  B29C64/245 ,  B33Y10/00 ,  B33Y30/00

Abstract: A rapidly printing 3D nanostructures arrangement, comprising a first photonic source configured to provide photoinitiation energy to a polymer medium via a dynamic light spatial modulator to an excited state to initiate polymerization, a second photonic source configured to selectively provide inhibition energy to the polymerized medium to a depleted state to inhibit polymerization thereby generating a dead zone below a growth zone, the dead zone allows continuous 3D polymerization.

公开(公告)号：US20180015661A1

公开(公告)日：2018-01-18

申请号：US15652105

申请日：2017-07-17

Applicant: Purdue Research Foundation

Inventor： Xianfan Xu ,  Bryan William Boudouris ,  Liang Pan

IPC: B29C67/00

CPC classification number: B29C64/129 ,  B29C64/135 ,  B29C64/245 ,  B29C64/268 ,  B33Y10/00 ,  B33Y30/00

Abstract: A rapidly printing 3D nanostructures arrangement, comprising a first photonic source configured to provide photoinitiation energy to a polymer medium via a dynamic light spatial modulator to an excited state to initiate polymerization, a second photonic source configured to selectively provide inhibition energy to the polymerized medium to a depleted state to inhibit polymerization thereby generating a dead zone below a growth zone, the dead zone allows continuous 3D polymerization.

公开(公告)号：US20160358743A1

公开(公告)日：2016-12-08

申请号：US15176147

申请日：2016-06-07

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/10 ,  H01J37/12 ,  H01J37/317 ,  H01J37/06

CPC classification number: H01J37/10 ,  G02B5/008 ,  H01J37/06 ,  H01J37/073 ,  H01J37/12 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2201/342 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/202 ,  H01J2237/20221

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

Abstract translation: 一种用于产生电子束阵列的系统，包括光源，具有安装在其上的多个等离子体透镜的第一基板，所述等离子体激元被配置为接收来自光源的光并产生电子发射，以及多个静电微透镜配置 将电子发射聚焦到用于聚焦在晶片衬底上的光束。 可以包括光源调制器和数字微反射镜，其捕获来自光源的光并将等离子体透镜上的光束投射。

公开(公告)号：US20240191004A1

公开(公告)日：2024-06-13

申请号：US18539218

申请日：2023-12-13

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu ,  Bryan William Boudouris

IPC: C08F2/50 ,  B29C64/135 ,  B29C64/20 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y70/00 ,  C08F222/10

CPC classification number: C08F2/50 ,  B29C64/135 ,  B29C64/20 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y70/00 ,  C08F222/102 ,  C08F222/103 ,  C08F222/105 ,  B29K2105/0005

Abstract: A three-dimensional nanolithography system includes forming a photocurable resin including one or more organic monomers, a photoinitiator, and an inhibitor, defining a lithographical patterning region, directing a light beam toward the lithographical patterning region to initiate polymerization, and controlling an initiator depletion technique to reduce an undesired portion of the polymerization.

公开(公告)号：US10074509B2

公开(公告)日：2018-09-11

申请号：US15176147

申请日：2016-06-07

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/317 ,  H01J37/06 ,  H01J37/10 ,  H01J37/12

CPC classification number: H01J37/10 ,  G02B5/008 ,  H01J37/06 ,  H01J37/073 ,  H01J37/12 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2201/342 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/202 ,  H01J2237/20221

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.