公开(公告)号：US4061871A

公开(公告)日：1977-12-06

申请号：US681634

申请日：1976-04-29

申请人： Peter Sommerkamp ,  Walter Heil

发明人： Peter Sommerkamp ,  Walter Heil

IPC分类号： H01J3/02 ,  C23C14/30 ,  H01J37/06 ,  H01J37/063 ,  H01J37/30 ,  H01J37/305 ,  H05B7/18

CPC分类号： H01J37/305 ,  H01J37/063

摘要： Electron gun for heating, melting and vaporizing purposes having an electron-emitting cathode, at least one beam-forming electrode associated with the cathode, an accelerating anode, an electromagnetic lens and a beam guiding-tube extending in the direction of the beam path and surrounded by an electromagnetic deflection system for the x-axis deflection and one for the y-axis deflection. An envelope tube is disposed outside of the deflection systems and is joined at its extremity to the end of the beam guiding tube by an end plate through which the pole shoes of the x-axis deflection system are brought. The end plate is inclined towards the cathode beginning from the pole shoes of the x-axis deflection system.

摘要翻译： 用于加热，熔化和汽化目的的电子枪具有电子发射阴极，至少一个与阴极相关的光束形成电极，加速阳极，电磁透镜和沿光束路径的方向延伸的光束引导管，以及 由用于x轴偏转的电磁偏转系统和用于y轴偏转的电磁偏转系统包围。 信封管设置在偏转系统的外部，并通过端板连接到梁引导管的端部，通过该端板使x轴偏转系统的极靴穿过。 端板从x轴偏转系统的极靴开始向阴极倾斜。

公开(公告)号：US4328763A

公开(公告)日：1982-05-11

申请号：US145632

申请日：1980-05-01

申请人： Peter Sommerkamp ,  Walter Heil

发明人： Peter Sommerkamp ,  Walter Heil

IPC分类号： C23C14/24 ,  C23C14/30 ,  C23C13/12

CPC分类号： C23C14/24 ,  C23C14/30

摘要： A vaporizer for vacuum deposition installations has at least one crucible and a plurality of crucible-receiving recesses movable into a vaporizing position, a vapor-conducting device and a shutter for interrupting the flow of vapor. The vaporizer is capable of enabling a plurality of different substances to be vaporized in succession without mutual contamination by providing the vapor-conducting device wherein the device has a plurality of vapor screens which can be individually set down at the edges of the crucible-receiving recesses by relative movement between the vapor-conducting device and the crucible. The shutters have a plurality of lobes which can be individually moved over the particular vapor screen located in the vaporizing position. The drives associated with the vapor-conducting device and shutter are interconnected such that the same vapor screen and the same shutter lobe are always associated with a particular crucible-receiving recess.

摘要翻译： 用于真空沉积装置的蒸发器具有至少一个坩埚和可移动到蒸发位置的多个坩埚接收凹部，用于中断蒸汽流动的蒸气传导装置和快门。 蒸发器能够通过提供蒸汽传导装置使多个不同物质相继蒸发而不会相互污染，其中该装置具有多个蒸气筛，该蒸气屏可在坩埚接收凹槽的边缘处分别放下 通过蒸气传导装置和坩埚之间的相对运动。 百叶窗具有多个叶片，其可以单独地移动到位于蒸发位置的特定蒸气筛上。 与蒸汽传导装置和快门相关联的驱动器互连，使得相同的蒸气屏幕和相同的快门叶片总是与特定的坩埚容纳凹槽相关联。

公开(公告)号：US4034256A

公开(公告)日：1977-07-05

申请号：US691041

申请日：1976-05-27

申请人： Peter Sommerkamp ,  Walter Heil

发明人： Peter Sommerkamp ,  Walter Heil

IPC分类号： H01J37/06 ,  H01J37/067 ,  H01J37/30 ,  H01J37/301 ,  H01J37/305 ,  H01J37/315 ,  H01J7/24 ,  H01J29/76

CPC分类号： H01J37/301 ,  H01J37/067 ,  H01J37/305 ,  H01J37/315

摘要： An electron gun for heating, fusing and vaporizing having a high voltage portion, an electron emitting cathode and at least one beam forming electrode associated with the cathode. An accelerating anode, a beam guiding tube extending in the direction of the beam path and surrounded by a jacket tube and an electromatic lens are also provided. One or more deflection systems are positioned in the space formed between the beam guiding tube and the jacket tube. The beam guiding tube, the jacket tube, the electromatic lens and the deflection systems are contained in a single, replaceable unit which is joined by a plurality of hollow posts parallel to the gun axis to the high-voltage portion of the gun. The space for the electromagnetic lens and the deflection systems communicates with the atmosphere through at least one of the hollow posts.

摘要翻译： 一种用于加热，熔化和汽化具有高电压部分的电子枪，电子发射阴极和与阴极相关的至少一个光束形成电极。 还提供加速阳极，沿着光束路径的方向延伸并被套管和电子透镜包围的光束引导管。 一个或多个偏转系统定位在形成在光束引导管和护套管之间的空间中。 光束引导管，护套管，电子透镜和偏转系统被包含在单个可更换单元中，其通过平行于枪轴线的多个中空柱连接到枪的高压部分。 用于电磁透镜和偏转系统的空间通过至少一个空心柱与大气连通。

公开(公告)号：US4230739A

公开(公告)日：1980-10-28

申请号：US963236

申请日：1978-11-22

申请人： Hans Aichert ,  Walter Dietrich ,  Alfred Hauff ,  Peter Sommerkamp ,  Herbert Stephan

发明人： Hans Aichert ,  Walter Dietrich ,  Alfred Hauff ,  Peter Sommerkamp ,  Herbert Stephan

IPC分类号： C23C14/30 ,  B05D3/06

CPC分类号： C23C14/30

摘要： Method for evaporating melts of alloys of metals of different vapor pressures from continuously fed, large-area evaporating crucibles by direct bombardment of the bath surface with focused electron beams which are periodically deflected according to a pattern. The alloy material is deposited on a plurality of substrates such as turbine blades which are positioned in a field above the evaporating crucible with local adaptation of the energy density to the thermal economy of the melt bath. At least one electron beam is deflected onto at least two substantially rectangular beam fields and is guided in each of these fields through a line raster at a frequency of at least 100 Hz while shifting periodically from one to the other field with a shift frequency of at most 5 Hz.

摘要翻译： 通过直接轰击浴表面的聚焦电子束，根据图案周期性地偏转，蒸发来自连续供给的大面积蒸发坩埚的不同蒸汽压的金属的熔体熔融的方法。 合金材料沉积在诸如涡轮叶片的多个基底上，涡轮叶片定位在蒸发坩埚上方的场中，其局部适应能量密度与熔融浴的热经济性。 至少一个电子束被偏转到至少两个基本上矩形的光束场上，并且在这些场中的每一个中通过线性光栅以至少100Hz的频率被引导，同时以一个移位频率从一个周期性地移位到另一个场 最多5 Hz。

公开(公告)号：US3984088A

公开(公告)日：1976-10-05

申请号：US620073

申请日：1975-10-06

申请人： Peter Sommerkamp

发明人： Peter Sommerkamp

IPC分类号： C23C14/24 ,  C23C13/12

CPC分类号： C23C14/243

摘要： A vaporizing crucible for vapor depositing systems, especially for electron beam heating, includes a plurality of side-by-side segments held in contact with one another by an adjustable compression device. The individual segments have between them layers of a resilient, electrically conductive material which forms a joint between adjacent segments. The segments are surrounded by a frame in which the adjustable compression device is positioned for the transfer of current and compressing the segments. A layer of resilient conductive material can also be positioned between the compression device and the lateral surfaces of the segments, extending perpendicular to the joints. The frame can also include a hollow base on which the segments rest. A layer of resilient, electrically conductive material can be positioned between the segments and the hollow base.

摘要翻译： 用于气相沉积系统的气化坩埚，特别是用于电子束加热的蒸发坩埚包括通过可调整的压缩装置相互保持接触的多个并列部分。 单个节段之间具有形成相邻节段之间的关节的弹性导电材料之间的层。 这些段被框架包围，其中可调压缩装置定位用于传递电流并压缩段。 弹性导电材料层也可以定位在压缩装置和节段的侧表面之间，垂直于接头延伸。 框架还可以包括中空基座，节段搁置在其上。 一层弹性的导电材料可以位于片段和中空基底之间。

公开(公告)号：US5656141A

公开(公告)日：1997-08-12

申请号：US607273

申请日：1996-02-20

申请人： Hans-Georg Betz ,  Gregor A. Campbell ,  Robert W. Conn ,  Karl Matl ,  Peter Sommerkamp ,  Alfons Zoeller ,  Dan M. Goebel

发明人： Hans-Georg Betz ,  Gregor A. Campbell ,  Robert W. Conn ,  Karl Matl ,  Peter Sommerkamp ,  Alfons Zoeller ,  Dan M. Goebel

IPC分类号： C23C14/32 ,  C23C14/50 ,  H01J37/32 ,  C23C16/50

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/50 ,  C23C14/505 ,  H01J37/32027 ,  H01J37/3266 ,  H01J2237/3137

摘要： Apparatus for coating substrates 31, 31", . . . in a vacuum chamber 2 including a substrate carrier 30 disposed therein and a device 29 for generating a first plasma cloud 28 and, further, including magnets 26, 27 directing the plasma cloud 28 onto the surface of the substrates 31, 31" . . . wherein this device for generating the plasma cloud 28 has an election emitter 11 and a downstream tubular anode 38, the anode has an inlet 10 for the process gas to ignite the plasma and, further, the device is provided with magnets 4, 7 for directing and guiding the plasma through the anode tube 38 into the process chamber 43 and including a device for generating atoms, molecules or clusters of the materials for producing a layer on the substrates 31, 31", . . . , preferably an electron beam evaporator 37 from which the evaporated or sputtered material 33 can be directly applied onto the substrates 31, 31" . . . . A second plasma 60 is generated between the crucible 45 of the electron beam evaporator 37 and the anode tube 38 of the plasma source 29 by applying a potential difference between the plasma source 29 and the vacuum chamber 2.

摘要翻译： 用于涂覆基底31,31“的装置。 。 。 在包括设置在其中的基板载体30的真空室2和用于产生第一等离子体云28的装置29中，还包括将等离子体云28引导到基板31,31“的表面上的磁体26,27。 。 。 其中用于产生等离子体云28的装置具有选择发射器11和下游管状阳极38，阳极具有用于工艺气体点燃等离子体的入口10，此外，该装置设置有用于引导的磁体4,7 并且将等离子体通过阳极管38引导到处理室43中，并且包括用于产生用于在基板31,31“上产生层的材料的原子，分子或簇的装置。 。 。 ，优选电子束蒸发器37，可以将蒸发的或溅射的材料33直接施加到基板31,31“上。 。 。 。 通过施加等离子体源29和真空室2之间的电位差，在电子束蒸发器37的坩埚45和等离子体源29的阳极管38之间产生第二等离子体60。