公开(公告)号：US09875876B2

公开(公告)日：2018-01-23

申请号：US15384897

申请日：2016-12-20

Applicant: NuFlare Technology, Inc.

Inventor： Jun Yashima

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30416 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A charged particle beam writing apparatus according to an embodiment starts a wiring operation when the sum of the amount of shot data stored in a buffer memory of a transfer control calculator, the amount of shot data being transferred by a transfer unit, and the amount of shot data stored in a buffer memory of a deflection control circuit reaches the amount of data for one stripe region.

公开(公告)号：US09548183B2

公开(公告)日：2017-01-17

申请号：US14459470

申请日：2014-08-14

Applicant: NuFlare Technology, Inc.

Inventor： Jun Yashima

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3174 ,  H01J2237/3175 ,  H01J2237/31776

Abstract: Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type.

Abstract translation: 带电粒子束写入装置包括：第一产生单元，用于在三个或更多个偏转区域层中产生最小的偏转区域层，每个偏转区域层具有与其它偏转区域层的尺寸不同的偏转区域，对于可变形的多个图形类型 使用第一和第二成形孔，分配单元，将多个照片图案中的每一个分配给多个图形类型中的相应一个图形类型的最小偏转区域层的偏转区域;校正单元，通过移位位置 根据每个图形类型的可变整形位置的每个最小偏转区域层，以及写入单元，用于在每个最小偏转区域层的位置具有的状态下将多个拍摄图案图案中的每一个写在目标对象上 已经针对每个图形类型进行了更正。

公开(公告)号：US09141750B2

公开(公告)日：2015-09-22

申请号：US13932392

申请日：2013-07-01

Applicant: NuFlare Technology, Inc.

Inventor： Jun Yashima ,  Akihito Anpo ,  Yasuo Kato

IPC: G06F17/50 ,  H01J37/317 ,  H01J37/302 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G06F17/5081 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766

Abstract: A beam writing apparatus includes a unit to obtain a specific value by calculating an integer by dividing a total irradiation time by a multiplied value of a region number and a repeating times number, and by multiplying the integer by the repeating times number, to add the repeating times number to the specific value when a region is in the multiple writing unit regions and is not a specific region and when a region number of the multiple writing unit region, defined excluding the specific region, is below or equal to a value obtained by dividing the total irradiation time by the multiplied value of the region number and the repeating times number, to obtain a first remainder, and dividing the first remainder by the repeating times number, and to treat an added value of the repeating times number and the specific value, as a total irradiation time.

Abstract translation: 波束写入装置包括通过将总照射时间除以区域编号和重复次数的相乘值而计算整数，并通过将整数乘以重复次数来获得特定值的单元， 当区域在多个写入单元区域中并且不是特定区域时，当除了特定区域之外的多个写入单位区域的区域编号低于或等于由 将总照射时间除以乘积值和重复次数，得到第一余数，并将第一余数除以重复次数，并处理重复次数和附加值的附加值 值，作为总照射时间。

公开(公告)号：US20140237196A1

公开(公告)日：2014-08-21

申请号：US14177489

申请日：2014-02-11

Applicant: Nuflare Technology, Inc.

Inventor： Jun Yashima ,  Yasuo Kato

IPC: G06F3/06

CPC classification number: H01J37/3174 ,  G06F3/0631 ,  G06F3/0644 ,  H01J2237/30416

Abstract: A charged particle beam writing apparatus includes a buffer memory including a memory region capable of contemporarily storing writing data for data processing regions, wherein writing data including data files is temporarily stored for each of the data processing regions, a dividing unit to divide the memory region of the buffer memory into a first region being large and a second region being small, a specifying unit to specify the memory region such that a data file being large is preferentially stored in the first region and a data file being small is stored at least in the second region, concerning the data files for each of the data processing regions included in the writing data, and a data processing unit to read data files corresponding to each of the data processing regions from the buffer memory, and to perform data processing using the read data files.

Abstract translation: 一种带电粒子束写入装置，包括：缓冲存储器，包括能够同时存储用于数据处理区域的写入数据的存储区域，其中为每个数据处理区域临时存储包括数据文件的数据;划分单元，用于将存储区域 所述缓冲存储器的第一区域较大，第二区域较小;指定单元，用于指定所述存储区域，使得较大数据文件被优先存储在所述第一区域中，并且数据文件小于至少 第二区域，涉及包括在写入数据中的每个数据处理区域的数据文件，以及数据处理单元，用于从缓冲存储器读取与每个数据处理区域相对应的数据文件，并且使用 读取数据文件。

公开(公告)号：US20130256519A1

公开(公告)日：2013-10-03

申请号：US13765140

申请日：2013-02-12

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Yasuo KATO ,  Jun Yashima ,  Akihito Anpo

IPC: H01J37/302

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31769 ,  H01J2237/31776

Abstract: A apparatus according to an embodiment includes a unit to generate first blocks in a writing region in which at least one of writing groups respectively using different base doses is to be written, a unit to generate second blocks for proximity effect correction, in the each of the regions of the groups, a unit to calculate an area density in each of the first blocks, a unit to perform a weighting calculation on the area density for each of the first blocks by using a base dose of a corresponding group, a unit to calculate a dose coefficient for proximity effect correction, for each of the second blocks, by using a corresponding weighted area density, and a unit to calculate a dose by using the base dose of the each of the groups and the dose coefficient of the each of the second blocks.

Abstract translation: 根据实施例的装置包括：在写入区域中产生分别使用不同基准剂量的写入组中的至少一个被写入的单元的单元，用于生成用于邻近效应校正的第二块的单元 所述组的区域是计算每个第一块中的面积密度的单元，通过使用相应组的基本剂量对每个第一块执行对区域密度的加权计算的单元，单元 通过使用相应的加权面积密度计算每个第二块的邻近效应校正的剂量系数，以及通过使用每个组的基础剂量和每个组的剂量系数来计算剂量的单位 第二块。

公开(公告)号：US09934935B2

公开(公告)日：2018-04-03

申请号：US15225969

申请日：2016-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue ,  Hayato Kimura ,  Yasuo Kato ,  Jun Yashima

IPC: H01J37/20 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

公开(公告)号：US20130099139A1

公开(公告)日：2013-04-25

申请号：US13647665

申请日：2012-10-09

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato ,  Jun Yashima

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/304 ,  H01J2237/31769

Abstract: A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function, a unit to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient, a unit to calculate a proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient, a unit to calculate a dose by using the proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient, and a unit to write a figure pattern concerned on a target object, based on the dose.

Abstract translation: 带电粒子束写入装置包括：计算从区域密度和分布函数之间的卷积运算计算的卷积量的梯度的单位，计算校正尺寸变化的小影响半径现象剂量校正系数的单位 由于通过使用卷积量和梯度，其影响半径在微米级以下的现象，通过使用第一方法来计算校正由于邻近效应引起的尺寸变化的邻近效应剂量校正系数的单位 功能取决于小影响半径现象剂量校正系数，单位通过使用邻近效应剂量校正系数和小影响半径现象剂量校正系数计算剂量，并且单位在目标对象上写入图形模式， 基于剂量。

公开(公告)号：US09153420B2

公开(公告)日：2015-10-06

申请号：US14324530

申请日：2014-07-07

Applicant: NuFlare Technology, Inc.

Inventor： Jun Yashima

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3174 ,  H01J37/3026 ,  H01J2237/31762

Abstract: A charged particle beam writing apparatus includes first and second transmission units to perform first and second transmission processing, where, in the first transmission processing, while one of the units performs data transmission processing, the other unit inputs processing data for N processing regions more than pre-set, data-converted, n processing regions, and while one of the units performs data input processing, the other transmits processing data for (N-n) processing regions in order, and in the second transmission processing, processing data for remaining n processing regions are transmitted in order after the first transmission processing, where one of the units starts inputting the processing data while the other performs the first transmission processing, and does not input processing data for a new processing region after starting the second transmission processing.

Abstract translation: 带电粒子束写入装置包括执行第一和第二传输处理的第一和第二传输单元，其中在第一传输处理中，当其中一个单元执行数据传输处理时，另一个单元输入超过N个处理区域的处理数据 预处理，数据转换，n个处理区域，并且当其中一个单元执行数据输入处理时，另一个依次发送（Nn）个处理区域的处理数据，并且在第二发送处理中，用于剩余的n个处理的处理数据 区域在第一发送处理之后依次发送，其中一个单元开始输入处理数据，而另一个单元执行第一发送处理，并且在开始第二发送处理之后不输入新处理区域的处理数据。

公开(公告)号：US08552405B2

公开(公告)日：2013-10-08

申请号：US13647665

申请日：2012-10-09

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato ,  Jun Yashima

IPC: H01J3/14 ,  G21K5/10 ,  G03C5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/304 ,  H01J2237/31769

Abstract: A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function, a unit to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient, a unit to calculate a proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient, a unit to calculate a dose by using the proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient, and a unit to write a figure pattern concerned on a target object, based on the dose.

Abstract translation: 带电粒子束写入装置包括：计算从区域密度和分布函数之间的卷积运算计算的卷积量的梯度的单位，计算校正尺寸变化的小影响半径现象剂量校正系数的单位 由于通过使用卷积量和梯度，其影响半径在微米级以下的现象，通过使用第一方法来计算校正由于邻近效应引起的尺寸变化的邻近效应剂量校正系数的单位 功能取决于小影响半径现象剂量校正系数，单位通过使用邻近效应剂量校正系数和小影响半径现象剂量校正系数计算剂量，并且单位在目标对象上写入图形模式， 基于剂量。

公开(公告)号：US10937629B2

公开(公告)日：2021-03-02

申请号：US16594130

申请日：2019-10-07

Applicant: NuFlare Technology, Inc.

Inventor： Hironori Teguri ,  Jun Yashima ,  Yasuo Kato ,  Masafumi Ise

IPC: H01J37/317 ,  H01J37/302 ,  H01J37/04

Abstract: In one embodiment, a first storage storing writing data, a second storage storing correction data for correcting an error in a writing position due to factors including bending of the substrate, a cell data allocator virtually dividing a writing region of the substrate into blocks, and allocating a cell to the blocks in consideration of the correction data, a plurality of bitmap data generators virtually dividing the blocks into meshes, calculating an irradiation amount per mesh region, and generating bitmap data which assigns the irradiation amount to each mesh region, and a shot data generator generating shot data that defines an irradiation time for each beam. The cell data allocator virtually divides the writing region by division lines in a direction different from a writing forward direction to generate a plurality of division regions. The plurality of bitmap data generators generate pieces of bitmap data of the different division regions.