Abstract:
A bio-chip adapted for separating and concentrating particles in a solution includes a chip body defining a receiving space therein for receiving the solution, an inner electrode disposed in the receiving space, an outer electrode unit disposed in the receiving space of the chip body and including a first outer electrode that is spaced apart from and surrounds the inner electrode, and a second outer electrode that is spaced apart from and surrounds the first outer electrode, and a power source electrically connected to the inner electrode, the first outer electrode, and the second outer electrode. A method for using the bio-chip to separating and concentrating the particles in the solution is also disclosed in the present invention.
Abstract:
A bio-chip adapted for separating and concentrating particles in a solution includes a chip body defining a receiving space therein for receiving the solution, an inner electrode disposed in the receiving space, an outer electrode unit disposed in the receiving space of the chip body and including a first outer electrode that is spaced apart from and surrounds the inner electrode, and a second outer electrode that is spaced apart from and surrounds the first outer electrode, and a power source electrically connected to the inner electrode, the first outer electrode, and the second outer electrode. A method for using the bio-chip to separating and concentrating the particles in the solution is also disclosed in the present invention.
Abstract:
A method for fabricating a patterned layer is disclosed. Firstly, a semiconductor substrate is provided. Then, a precursory gas on the semiconductor substrate is formed. Finally, a patterned layer on the semiconductor substrate is deposited by reacting the precursory gas with at least one electron beam or at least one ion beam. The present invention not only fabricates a patterned layer on the substrate in a single step but also achieves a high lithographic resolution and avoids remains of contaminations by using the properties of the electron beam or the ion beam and the precursory gas.