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公开(公告)号：US09766551B2
公开(公告)日：2017-09-19
申请号：US14439252
申请日：2013-10-15
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucker , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.
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公开(公告)号：US20180059550A1
公开(公告)日：2018-03-01
申请号：US15693942
申请日：2017-09-01
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucke , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a tip array can include an elastomeric tip substrate layer comprising a first surface and an oppositely disposed second surface, the tip substrate layer being formed from an elastomeric material; a plurality of tips fixed to the first surface, the tips each comprising a tip end disposed opposite the first surface, the tips having a radius of curvature of less than about 1 micron; and an array of heaters disposed on the second surface of the tip substrate layer and configured such that when the tip substrate layer is heated by a heater, a tip disposed in a location of a heated portion of tip substrate layer is lowered relative to a tip disposed in a location of an unheated portion of the tip substrate layer.
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公开(公告)号：US20150210868A1
公开(公告)日：2015-07-30
申请号：US14419360
申请日：2013-09-06
CPC分类号： C09D11/10 , B05D1/005 , B05D1/02 , B05D1/18 , B05D1/28 , B05D3/007 , B22F1/00 , B22F1/0018 , B22F9/20 , B81C1/00111 , B81C2201/0149 , B82Y40/00 , C08K3/22 , C09D11/037 , C09D11/52 , C23C18/06 , C23C18/08
摘要： A method of forming a nanostructure on a substrate surface can include heating a substrate comprising a composition comprising a block copolymer and a nanostructure precursor to a temperature above the glass transition temperature of the block copolymer and below the decomposition temperature of the block copolymer to aggregate the nanostructure precursor to form a nanostructure precursor aggregated composition. The method can further include heating the nanostructure precursor aggregated composition to a temperature above the decomposition temperature of the nanostructure precursor to decompose the polymer and form the nanostructure.
摘要翻译： 在衬底表面上形成纳米结构的方法可以包括将包含嵌段共聚物和纳米结构前体的组合物的衬底加热至高于嵌段共聚物的玻璃化转变温度的温度并且低于嵌段共聚物的分解温度以聚集 纳米结构前体形成纳米结构前体聚集组合物。 该方法还可以包括将纳米结构前体凝集组合物加热至高于纳米结构前体分解温度的温度以分解聚合物并形成纳米结构。
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公开(公告)号：US20150286148A1
公开(公告)日：2015-10-08
申请号：US14439252
申请日：2013-10-15
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucker , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.
摘要翻译： 根据本公开的实施例，图案化方法可以包括将图像划分成一组帧部分; 在所述一组框架部分的每个框架部分中确定要由所述尖端阵列的每个尖端构图的图像的相应部分的尖端图案; 将所述尖端阵列布置在所述基板的第一位置中的图案化位置，所述第一位置对应于所述基板的位置，所述框架部分组中的第一框架部分将被构图; 将第一辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列中的一个或多个尖端并对所述衬底进行图案化，其中所述第一辐射图案对应于所述第一框架部分的尖端图案; 将所述末端阵列布置在所述基板的第二位置中的对应于所述基板的位置的图案化位置中，在所述基板的位置中所述框架部分组中的第二框架部分将被图案化; 将第二辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列的尖端并对所述衬底进行图案化，其中所述第二辐射图案对应于所述第二框架部分的尖端图案; 并且重复对所述一组帧部分中的每个帧部分的布置和投影以对图像进行图案化。
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