公开(公告)号：US20240153902A1

公开(公告)日：2024-05-09

申请号：US18367609

申请日：2023-09-13

Applicant: NANYA TECHNOLOGY CORPORATION

Inventor： SHENG-FU HUANG ,  SHING-YIH SHIH

IPC: H01L23/00

CPC classification number: H01L24/08 ,  H01L24/05 ,  H01L24/80 ,  H01L2224/0215 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/05663 ,  H01L2224/05673 ,  H01L2224/05676 ,  H01L2224/05678 ,  H01L2224/0568 ,  H01L2224/05684 ,  H01L2224/08145 ,  H01L2224/80379 ,  H01L2224/80895 ,  H01L2224/80896

Abstract: A semiconductor device structure and method for manufacturing the same are provided. The semiconductor device structure includes a substrate, a dielectric structure, a pad, a conductive structure, and a buffer structure. The dielectric structure is disposed on the substrate. The pad is embedded in the dielectric structure. The conductive structure is disposed on the pad. The buffer structure is disposed on the pad and separates the conductive structure from the dielectric structure. A coefficient of thermal expansion (CTE) of the buffer structure ranges between a CTE of the dielectric structure and a CTE of the conductive structure.

公开(公告)号：US20240153900A1

公开(公告)日：2024-05-09

申请号：US18053290

申请日：2022-11-07

Applicant: NANYA TECHNOLOGY CORPORATION

Inventor： SHENG-FU HUANG ,  SHING-YIH SHIH

IPC: H01L23/00

CPC classification number: H01L24/08 ,  H01L24/05 ,  H01L24/80 ,  H01L2224/0215 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/05663 ,  H01L2224/05673 ,  H01L2224/05676 ,  H01L2224/05678 ,  H01L2224/0568 ,  H01L2224/05684 ,  H01L2224/08145 ,  H01L2224/80379 ,  H01L2224/80895 ,  H01L2224/80896

Abstract: A semiconductor device structure and method for manufacturing the same are provided. The semiconductor device structure includes a substrate, a dielectric structure, a pad, a conductive structure, and a buffer structure. The dielectric structure is disposed on the substrate. The pad is embedded in the dielectric structure. The conductive structure is disposed on the pad. The buffer structure is disposed on the pad and separates the conductive structure from the dielectric structure. A coefficient of thermal expansion (CTE) of the buffer structure ranges between a CTE of the dielectric structure and a CTE of the conductive structure.