公开(公告)号：US06824610B2

公开(公告)日：2004-11-30

申请号：US10106693

申请日：2002-03-26

Applicant: Masatomo Shibata ,  Naotaka Kuroda

Inventor： Masatomo Shibata ,  Naotaka Kuroda

IPC: C30B2504

CPC classification number: H01L21/02491 ,  C30B25/02 ,  C30B25/18 ,  C30B29/40 ,  C30B29/406 ,  H01L21/02381 ,  H01L21/02389 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02502 ,  H01L21/0254 ,  H01L21/02636 ,  Y10S117/915

Abstract: A metal film is deposited on a starting substrate, which is any one of a single crystal sapphire substrate, a substrate comprising a single crystal gallium nitride film grown on a sapphire substrate, and a single crystal semiconductor substrate, and a gallium nitride film is deposited on the metal film to form a laminate substrate. By virtue of the above construction, after the growth of the gallium nitride film, the gallium nitride film can be easily separated from the starting substrate, and a gallium nitride crystal substrate, which has low defect density and has not been significantly contaminated with impurities, can be produced in a simple manner.

Abstract translation: 金属膜沉积在起始衬底上，该起始衬底是单晶蓝宝石衬底，包括在蓝宝石衬底上生长的单晶氮化镓膜的衬底和单晶半导体衬底中的任何一个，并且沉积氮化镓膜 在金属膜上形成层叠基板。 通过上述结构，在氮化镓膜生长之后，氮化镓膜可以容易地与起始衬底分离，并且具有低缺陷密度且未被杂质显着污染的氮化镓晶体衬底， 可以简单地生产。

公开(公告)号：US07847313B2

公开(公告)日：2010-12-07

申请号：US11716918

申请日：2007-03-12

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L33/30

CPC classification number: C30B29/403 ,  C30B25/02 ,  H01L33/0075

Abstract: A group III-V nitride-based semiconductor substrate is formed of a group III-V nitride-based semiconductor single crystal containing an n-type impurity. The single crystal has a periodical change in concentration of the n-type impurity in a thickness direction of the substrate. The periodical change has a minimum value in concentration of the n-type impurity not less than 5×1017 cm−3 at an arbitrary point in plane of the substrate.

Abstract translation: III-V族氮化物基半导体衬底由含有n型杂质的III-V族氮化物基半导体单晶形成。 单晶在衬底的厚度方向上具有n型杂质的浓度的周期性变化。 周期性变化在衬底的任意点处具有不小于5×1017cm-3的n型杂质的浓度的最小值。

公开(公告)号：US07829913B2

公开(公告)日：2010-11-09

申请号：US10519152

申请日：2003-06-26

Applicant: Masatomo Shibata ,  Yuichi Oshima ,  Takeshi Eri ,  Akira Usui ,  Haruo Sunagawa

Inventor： Masatomo Shibata ,  Yuichi Oshima ,  Takeshi Eri ,  Akira Usui ,  Haruo Sunagawa

IPC: H01L27/01

CPC classification number: C30B29/406 ,  C30B25/02 ,  C30B25/18 ,  C30B29/403 ,  H01L21/0242 ,  H01L21/02439 ,  H01L21/02458 ,  H01L21/02491 ,  H01L21/02502 ,  H01L21/02513 ,  H01L21/0254 ,  H01L21/0262

Abstract: A structure of a substrate used for growing a crystal layer of a semiconductor, particularly a group-III nitride semiconductor and its manufacturing method. The substrate comprises two porous layers on a base. The mean opening diameter of the pores of the first porous laser, the outermost layer, is smaller than the means diameter of the pores in the second porous layer nearer to the base than the first porous layer. The first and second porous layers have volume porosities of 10 to 90%. More then 50% of the pores of the first porous layer extend from the surface of the first porous layer and reach the interface between the first and second porous layers. Even by a conventional crystal growing method, an epitaxial crystal of low defect density can be easily grown on the porous substrate.

Abstract translation: 用于生长半导体的晶体层的衬底的结构，特别是III族氮化物半导体及其制造方法。 基底在基底上包括两个多孔层。 第一多孔激光器（最外层）的孔的平均开口直径小于第二多孔层中比第一多孔层更靠近基底的孔的平均直径。 第一和第二多孔层的体积孔隙率为10〜90％。 多于50％的第一多孔层的孔从第一多孔层的表面延伸并到达第一和第二多孔层之间的界面。 即使通过常规的晶体生长方法，可以容易地在多孔基材上生长低缺陷密度的外延晶体。

公开(公告)号：US07674699B2

公开(公告)日：2010-03-09

申请号：US11431106

申请日：2006-05-10

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L21/28 ,  H01L21/20

CPC classification number: C30B25/04 ,  C30B29/406 ,  H01L21/0237 ,  H01L21/0242 ,  H01L21/02491 ,  H01L21/02513 ,  H01L21/0254 ,  H01L21/0262 ,  H01L33/007 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A III group nitride semiconductor substrate according to the present invention is fabricated by forming a metal film or metal nitride film 2′ with mesh structure in which micro voids are provided on a starting substrate 1, and growing a III group nitride semiconductor crystal layer 3 via the metal film or metal nitride film 2′.

Abstract translation: 根据本发明的III族氮化物半导体衬底通过在起始衬底1上形成具有微孔的网状结构的金属膜或金属氮化物膜2'制造，并且通过以下方式生长III族氮化物半导体晶体层3： 金属膜或金属氮化物膜2'。

公开(公告)号：US07622791B2

公开(公告)日：2009-11-24

申请号：US11892382

申请日：2007-08-22

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L29/04 ,  H01L29/20 ,  H01L21/20

CPC classification number: C30B29/403 ,  C30B25/18 ,  H01L21/02389 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02507 ,  H01L21/0254 ,  H01L21/0262 ,  H01L29/045 ,  H01L29/2003 ,  H01L33/0075 ,  H01S5/0211 ,  H01S5/3202 ,  H01S5/32341 ,  Y10S438/977

Abstract: A III-V group nitride system semiconductor substrate is of a III-V group nitride system single crystal. The III-V group nitride system semiconductor substrate has a flat surface, and a vector made by projecting on a surface of the substrate a normal vector of a low index surface closest to the substrate surface at an arbitrary point in a plane of the substrate is converged on a specific point or a specific region inside or outside the plane of the substrate.

Abstract translation: III-V族氮化物系半导体衬底是III-V族氮化物系单晶。 III-V族氮化物系半导体衬底具有平坦表面，并且通过在衬底的表面上突出在衬底的平面中的任意点处最接近衬底表面的低折射率表面的法向矢量制成的矢量是 会聚在基板的平面内部或外部的特定区域或特定区域。

公开(公告)号：US07435608B2

公开(公告)日：2008-10-14

申请号：US11589771

申请日：2006-10-31

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L21/00

CPC classification number: C30B25/18 ,  C30B25/02 ,  C30B29/40 ,  C30B29/64 ,  Y10S438/977

Abstract: A III-V group nitride system semiconductor self-standing substrate is made of III-V group nitride system semiconductor single crystal with a hexagonal crystal system crystalline structure. The substrate is provided with a surface that is off-oriented 0.09 degrees or more and 24 degrees or less in the a-axis or m-axis direction from C-face of the substrate.

Abstract translation: III-V族氮化物系半导体自立式衬底由具有六方晶系晶体结构的III-V族氮化物系半导体单晶制成。 该基板具有从基板的C面向a轴或m轴方向偏离取向为0.09度以上且24度以下的表面。

公开(公告)号：US07230282B2

公开(公告)日：2007-06-12

申请号：US11052764

申请日：2005-02-09

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L33/00

CPC classification number: C30B29/403 ,  C30B25/02 ,  C30B25/18 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02491 ,  H01L21/02502 ,  H01L21/02513 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/02647

Abstract: A III–V group nitride system semiconductor self-standing substrate has: a first III–V group nitride system semiconductor crystal layer that has a region with dislocation lines gathered densely, the dislocation lines being gathered substantially perpendicular to a surface of the substrate, and a region with dislocation lines gathered thinly; and a second III–V group nitride system semiconductor crystal layer that is formed up to 10 μm from the surface of the substrate on the first III–V group nitride system semiconductor crystal layer and that has a dislocation density distribution that is substantially uniform.

公开(公告)号：US20070051969A1

公开(公告)日：2007-03-08

申请号：US11312634

申请日：2005-12-21

Applicant: Yuichi Oshima ,  Masatomo Shibata

Inventor： Yuichi Oshima ,  Masatomo Shibata

IPC: H01L33/00 ,  H01L21/00

CPC classification number: H01L21/02576 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02502 ,  H01L21/0251 ,  H01L21/0254 ,  H01L21/02573 ,  H01L33/0075 ,  H01L33/0079

Abstract: A group III-V nitride-based semiconductor substrate having a group III-V nitride-based semiconductor thick film with a same composition in the entire film. The thick film has a first region with a predetermined impurity concentration and a second region with an impurity concentration lower than the first region.

公开(公告)号：US07057204B2

公开(公告)日：2006-06-06

申请号：US10752092

申请日：2004-01-07

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L29/06 ,  H01L29/12

CPC classification number: H01L29/267 ,  C30B23/02 ,  C30B25/02 ,  C30B29/40 ,  H01L21/0242 ,  H01L21/02433 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/02576 ,  H01L21/0262 ,  H01L29/045 ,  H01L29/2003 ,  H01L33/16

Abstract: A III–V group nitride system semiconductor substrate has III–V group nitride system single crystal grown on a hetero-substrate. The III–V group nitride system semiconductor substrate has a flat surface and satisfies the relationship of θ>α, where θ [deg ] is given as an average in angles of the substrate surface to low index surfaces closest to the substrate surface measured at a plurality of arbitrary points in plane of the substrate, and a variation range of the measured angles to θ is represented by ±α [deg ].

Abstract translation: III-V族氮化物系半导体衬底具有在异质衬底上生长的III-V族氮化物系单晶。 III-V族氮化物系半导体衬底具有平坦表面，并且满足θ>α的关系，其中θ[deg]被给定为在基底表面与最靠近衬底表面的低折射率表面的平均角度 基板的平面中的多个任意点，并且与θ的测量角度的变化范围由±α[deg]表示。

公开(公告)号：US07045808B2

公开(公告)日：2006-05-16

申请号：US10799889

申请日：2004-03-15

Applicant: Masatomo Shibata

Inventor： Masatomo Shibata

IPC: H01L29/06

CPC classification number: C30B29/40 ,  C30B25/02 ,  H01L21/0237 ,  H01L21/02389 ,  H01L21/0242 ,  H01L21/0243 ,  H01L21/02491 ,  H01L21/02513 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02661 ,  H01L21/02664 ,  H01L21/3245 ,  H01L29/2003

Abstract: A III–V nitride semiconductor substrate comprising a III–V nitride semiconductor single crystal at least in a surface portion thereof, the product of [H] and [D] being 1×1025 or less, wherein [H] represents the concentration of hydrogen atoms (the number of hydrogen atoms per cm3) in a surface portion of the single crystal, and [D] represents a dislocation density (the number of dislocations per cm2) on a single crystal surface.

Abstract translation: 至少在其表面部分包含III-V族氮化物半导体单晶的III-V族氮化物半导体衬底，[H]和[D]的乘积为1×10 25或更小，其中[H ]表示单晶表面部分中氢原子的浓度（每cm 3的氢原子数），[D]表示位错密度（每厘米的位错数 ^{2 ）。}