摘要:
A numerical controller capable of obviating the waste of a workpiece by machining such that a position deviation by learning control is converged and automatically performing storage of correction data and actual machining. A tool and the workpiece are moved to noninterfering positions. In a learning control interval from the issuance of a learning control start command to the issuance of a learning control end command, the input and output are turned on so that the learning control is performed to input the position deviation and create and output the correction data. Processing in the learning control interval that involves the learning control is repeatedly executed a set number of times by idling operations. The obtained data is automatically stored in the numerical controller, the tool and the workpiece are moved to interfering positions, and the position deviation is corrected based on the correction data, whereby actual machining is performed. The correction data is automatically stored and the actual machining is performed using the correction data without wasting the workpiece, so that the cycle time can be shortened.
摘要:
A numerical controller capable of obviating the waste of a workpiece by machining such that a position deviation by learning control is converged and automatically performing storage of correction data and actual machining. A tool and the workpiece are moved to noninterfering positions. In a learning control interval from the issuance of a learning control start command to the issuance of a learning control end command, the input and output are turned on so that the learning control is performed to input the position deviation and create and output the correction data. Processing in the learning control interval that involves the learning control is repeatedly executed a set number of times by idling operations. The obtained data is automatically stored in the numerical controller, the tool and the workpiece are moved to interfering positions, and the position deviation is corrected based on the correction data, whereby actual machining is performed. The correction data is automatically stored and the actual machining is performed using the correction data without wasting the workpiece, so that the cycle time can be shortened.
摘要:
A numerical controller capable of checking a learning control execution interval for the entry of a command or signal that varies an operation pattern. The numerical controller reads machining programs in succession and sets a flag F to 1 until a learning control end command is read after a learning control start command is read. In a learning control interval during which the flag F is set to 1, it is determined whether or not an inappropriate command or signal is inputted during a learning process such that the operation pattern is varied. If it is concluded that such a command or signal is inputted, an alarm stop or feed hold stop is performed, the cause of stopping is displayed, and learning control is nullified. If any inappropriate command or signal is inputted during the learning process, the operation is stopped and the cause is displayed, so that the machining programs can be corrected with ease. Thus, wrong cutting or the like can be prevented from being caused by the learning control.
摘要:
A numerical controller capable of checking a learning control execution interval for the entry of a command or signal that varies an operation pattern. The numerical controller reads machining programs in succession and sets a flag F to 1 until a learning control end command is read after a learning control start command is read. In a learning control interval during which the flag F is set to 1, it is determined whether or not an inappropriate command or signal is inputted during a learning process such that the operation pattern is varied. If it is concluded that such a command or signal is inputted, an alarm stop or feed hold stop is performed, the cause of stopping is displayed, and learning control is nullified. If any inappropriate command or signal is inputted during the learning process, the operation is stopped and the cause is displayed, so that the machining programs can be corrected with ease. Thus, wrong cutting or the like can be prevented from being caused by the learning control.
摘要:
A specified-data saving means saves a data specified by a data name from a battery-backed-up volatile memory to a nonvolatile memory not requiring battery backup. At the same time, a generation management means stores the data name and time information in the nonvolatile memory, together with the saved data. An individual-data restoring means selects data from among the data stored in the nonvolatile memory based on a specified data name and time information and restores the selected data to the volatile memory.
摘要:
A driving circuit of a display element includes a current source circuit having a first transistor and a holding circuit for holding a gate voltage of the first transistor during a first period at an electric potential corresponding to a constant current to be supplied to the display element, and a control circuit including a second transistor connected in series to the current source circuit and connected in parallel to the display element and the capacitor element whose one terminal is connected to a gate of the second transistor and the other terminal is connected to a line, and controlling the light emission time of the display element by controlling the second transistor during a third period. A constant voltage is applied from the line during the first period. The gray-scale voltage is applied from the line during a second period, and the gate of the second transistor and the one terminal are short-circuited. In addition, an electric charge based on the difference between the gray-scale voltage and the gate voltage of the second transistor is accumulated in the capacitor element, and a sweep voltage is applied during the third period, so that the ON time of the second transistor is controlled.
摘要:
Provided are a coplanar structure thin film transistor that allows a threshold voltage to change only a little under electric stress, and a method of manufacturing the same. The thin film transistor includes on a substrate at least: a gate electrode; a gate insulating layer; an oxide semiconductor layer including a source electrode, a drain electrode, and a channel region; a channel protection layer; and an interlayer insulating layer. The channel protection layer includes one or more layers, the layer in contact with the oxide semiconductor layer among the one or more layers being made of an insulating material containing oxygen, ends of the channel protection layer are thinner than a central part of the channel protection layer, the interlayer insulating layer contains hydrogen, and regions of the oxide semiconductor layer that are in direct contact with the interlayer insulating layer form the source electrode and the drain electrode.
摘要:
In a method of treating a semiconductor element which at least includes a semiconductor, a threshold voltage of the semiconductor element is changed by irradiating the semiconductor with light with a wavelength longer than an absorption edge wavelength of the semiconductor. The areal density of in-gap states in the semiconductor is 1013 cm−2eV−1 or less. The band gap may be 2 eV or greater. The semiconductor may include at least one selected from the group consisting of In, Ga, Zn and Sn. The semiconductor may be one selected from the group consisting of amorphous In—Ga—Zn—O (IGZO), amorphous In—Zn—O (IZO) and amorphous Zn—Sn—O (ZTO). The light irradiation may induce the threshold voltage shift in the semiconductor element, the shift being of the opposite sign to the threshold voltage shift caused by manufacturing process history, time-dependent change, electrical stress or thermal stress.
摘要:
Provided are a coplanar structure thin film transistor that allows a threshold voltage to change only a little under electric stress, and a method of manufacturing the same. The thin film transistor includes on a substrate at least: a gate electrode; a gate insulating layer; an oxide semiconductor layer including a source electrode, a drain electrode, and a channel region; a channel protection layer; and an interlayer insulating layer. The channel protection layer includes one or more layers, the layer in contact with the oxide semiconductor layer among the one or more layers being made of an insulating material containing oxygen, ends of the channel protection layer are thinner than a central part of the channel protection layer, the interlayer insulating layer contains hydrogen, and regions of the oxide semiconductor layer that are in direct contact with the interlayer insulating layer form the source electrode and the drain electrode.
摘要:
In an electron device in which plural thin film transistors each having at least a source electrode, a drain electrode, a semiconductor region including a channel, a gate insulation film and a gate electrode are provided on a substrate, a device separation region provided between the plural thin film transistors and the semiconductor region are constituted by a same metal oxide layer, and resistance of the semiconductor region is formed to be lower than resistance of the device separation region.