METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING SYSTEM

    公开(公告)号:US20240021408A1

    公开(公告)日:2024-01-18

    申请号:US18475006

    申请日:2023-09-26

    IPC分类号: H01J37/32 B44C1/22 H03L5/00

    摘要: Methods and apparatus for processing a substrate in a multi-frequency plasma processing chamber are disclosed. The base RF signal pulses between a high power level and a low power level. Each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined power level and a second predefined power level as the base RF signal pulses. Alternatively or additionally, each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined RF frequency and a second predefined RF frequency as the base RF signal pulses. Techniques are disclosed for ascertaining in advance of production time the first and second predefined power levels and/or the first and second predefined RF frequencies for the non-base RF signals.

    ADJUSTMENT OF POWER AND FREQUENCY BASED ON THREE OR MORE STATES

    公开(公告)号:US20200243304A1

    公开(公告)日:2020-07-30

    申请号:US16847492

    申请日:2020-04-13

    摘要: Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.

    MULTIPLE CONTROL MODES
    8.
    发明申请

    公开(公告)号:US20170084432A1

    公开(公告)日:2017-03-23

    申请号:US15369110

    申请日:2016-12-05

    IPC分类号: H01J37/32

    摘要: Systems and methods for using variables based on multiple states associated with a plasma system are described. A method includes determining whether the state associated with the plasma system is a first, second, or third state and determining a first variable upon determining that the state is the first state. The method further includes determining a second variable upon determining that the state is the second state and determining a third variable upon determining that the state is the third state. The method includes determining whether each of the first variable, the second variable, and the third variable is within a corresponding range from a corresponding threshold. The method includes providing an instruction to change power supplied to a plasma chamber upon determining that the first, second, or third variable is outside the corresponding range from the corresponding threshold.

    SYSTEMS AND METHODS FOR USING ONE OR MORE FIXTURES AND EFFICIENCY TO DETERMINE PARAMETERS OF A MATCH NETWORK MODEL
    9.
    发明申请
    SYSTEMS AND METHODS FOR USING ONE OR MORE FIXTURES AND EFFICIENCY TO DETERMINE PARAMETERS OF A MATCH NETWORK MODEL 有权
    使用一个或多个配置和效率来确定匹配网络模型参数的系统和方法

    公开(公告)号:US20160322207A1

    公开(公告)日:2016-11-03

    申请号:US15145601

    申请日:2016-05-03

    IPC分类号: H01J37/32 G01R27/28

    CPC分类号: H01J37/32926 H01J37/32183

    摘要: Systems and methods for using multiple one or more fixtures and efficiency to determine fixed parameters of a match network model are described. A value of efficiency that is measured using a network analyzer and a value of predicted efficiency that is determined using the match network model are compared. The comparison is made to determine whether the fixed parameters are to be assigned to the match network model.

    摘要翻译: 描述了使用多个一个或多个固定装置和效率来确定匹配网络模型的固定参数的系统和方法。 比较使用网络分析仪测量的效率值和使用匹配网络模型确定的预测效率值。 进行比较以确定是否将固定参数分配给匹配网络模型。