Abstract:
A method of manufacturing a capacitor in a semiconductor device uses a metal as an upper electrode and a lower electrode, and forms a dielectric film in a double structure of a titanium-containing tantalum oxide film and an amorphous tantalum oxide film. Therefore, the invention can secure a sufficient capacitance while improving an electrical characteristic of the capacitor.
Abstract:
The present invention discloses a method for forming a capacitor of a semiconductor device which can increase a capacitance and prevent a leakage current at the same time. The method includes the steps of depositing a cap oxide film on a semiconductor substrate, patterning the cap oxide film to expose a capacitor region of the semiconductor substrate, consecutively depositing an Ru film for a lower electrode on the patterned cap oxide film and the semiconductor substrate in in-situ according to a low pressure chemical vapor deposition(LPCVD) and a plasma enhanced chemical vapor deposition(PECVD), forming a cylindrical lower electrode, by performing a chemical mechanical polishing process on the Ru film and removing the cap oxide film, forming an amorphous TaON film having a high dielectric constant on the lower electrode, crystallizing the amorphous TaON film according to a thermal treatment, and forming a metal film for an upper electrode on the crystallized TaON film.
Abstract:
A method of manufacturing a capacitor in a semiconductor device wherein a first a Ru film used as a lower electrode is deposited by an LPCVD method, a mixed plasma process of Ar and H2 is performed, and a second Ru film is deposited by an LPCVD method, thus improving the surface roughness of the Ru film. The method can obtain a high capacitance and a low leakage current in a capacitor using a Ta2O5 film as a dielectric film.
Abstract translation:一种在半导体器件中制造电容器的方法,其中通过LPCVD方法沉积用作下电极的第一Ru膜,进行Ar和H2的混合等离子体处理,并通过LPCVD法沉积第二Ru膜 ,从而提高Ru膜的表面粗糙度。 该方法可以在使用Ta 2 O 5膜作为电介质膜的电容器中获得高电容和低漏电流。
Abstract:
Disclosed herein is a method for the fabrication of a capacitor of semiconductor device, which is capable of increasing a charge storage capacitance of the capacitor while preventing generation of leakage current in the capacitor. The disclosed method comprises comprising the steps of: forming a ruthenium film as a lower electrode on a semiconductor substrate; depositing an amorphous TaON film having an excellent dielectric constant on the ruthenium film; subjecting the resulting substrate to a first thermal treatment to prevent oxidation of the lower electrode and to remove carbons present in the amorphous TaON thin film; subjecting the resulting substrate to a second thermal treatment to crystallize the amorphous TaON thin film; and forming a metal film as a metal film on the crystalline TaON film.
Abstract:
The present invention relates to a novel method of preparing a taxane derivative having an anti-tumor and anti-leukemia activity, and intermediates used therein.
Abstract:
A laparoscopic surgical instrument includes a shaft and a head having a distal end to which a variety of surgical instruments are attached. The laparoscopic surgical instrument also includes a flexible joint installed between the shaft and the head; a longitudinal-driving unit including a longitudinal-driving wire connected with both longitudinal ends of the head and a longitudinal-driving roller turning the longitudinal-driving wire and a transverse-driving unit including a transverse-driving wire connected with both transverse ends of the head and a transverse-driving roller turning the transverse-driving wire. The longitudinal-driving unit turns the flexible joint in the longitudinal direction, the transverse-driving unit turns the flexible joint in the transverse direction, and the shaft has a small diameter.
Abstract:
A method and structure are provided with reduced gate wrap around to advantageously control for threshold voltage and increase stability in semiconductor devices. A spacer is provided aligned to field dielectric layers to protect the dielectric layers during subsequent etch processes. The spacer is then removed prior to subsequently forming a part of a gate oxide layer and a gate conductor layer. Advantageously, the spacer protects the corner area o the field dielectric and also allows for enhanced thickness of the gate oxide near the corners.
Abstract:
A jig device usable with a flat display panel which includes a frame including a base frame having an opening and a vertical frame which extends vertically along a perimeter of the base frame and a supporting frame coupled to the base frame within the frame, on which the flat display panel is disposed, wherein the supporting frame includes fixing portions provided at corners thereof to support respective corners of the flat display panel.
Abstract:
The present invention relates to a paste composition for a solar cell electrode and an electrode produced therefrom. The present invention relates to a paste composition for a solar cell electrode, and an electrode produced therefrom, the paste composition comprising conductive powders, a glass frit, and an organic vehicle, the glass frit including PbO, SiO2, and TeO2, wherein an amount of said TeO2 included in the glass frit is about 1-20% by weight.
Abstract:
Disclosed are a novel, simple and low-cost method for preparing sitagliptin, as DPP-IV (dipeptidyl peptidase IV) inhibitor, which is useful in treating type 2 diabetes mellitus and key intermediates used in said preparation of sitagliptin.