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    Composite focused ion beam device, and processing observation method and processing method using the same
    3.
    发明授权
    Composite focused ion beam device, and processing observation method and processing method using the same 有权
    复合聚焦离子束装置及其加工方法及处理方法

    公开(公告)号：US08269194B2

    公开(公告)日：2012-09-18

    申请号：US12733089

    申请日：2008-08-06

    申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    IPC分类号： H01J49/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

    摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

    摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

    Observing/forming method with focused ion beam and apparatus therefor
    4.
    发明授权
    Observing/forming method with focused ion beam and apparatus therefor 有权
    聚焦离子束的观察/形成方法及其设备

    公开(公告)号：US06281496B1

    公开(公告)日：2001-08-28

    申请号：US09360775

    申请日：1999-07-26

    申请人： Kazuo Aita ,  Yasuhiko Sugiyama

    发明人： Kazuo Aita ,  Yasuhiko Sugiyama

    IPC分类号： H01J37317

    CPC分类号： H01J37/3005 ,  H01J2237/31744

    摘要： A method for obtaining an image of a sample surface using a charged particle beam apparatus without damaging the sample surface is performed by scanning a focused ion beam onto an observation region of the sample surface, detecting secondary charged particles emanating from the sample surface, and producing an image in response thereto. The sample is placed in a water vapor atmosphere while being scanned by the focused ion beam so that a water vapor absorption layer is formed in the observation region of the sample surface. A SIM image is obtained by placing the periphery of the portion to be processed into a water vapor atmosphere and then irradiating and scanning across the sample surface with the focused ion beam in order to prevent damage to the sample surface. In one embodiment, a focused ion beam instrument is used to observe and repair a photomask without damaging the underlying substrate or to the photomask pattern during observation.

    摘要翻译： 通过将聚焦离子束扫描到样品表面的观察区域，检测从样品表面发出的二次带电粒子，并且产生样品表面的样品表面的图像，而不会损伤样品表面， 响应于此的图像。 在被聚焦离子束扫描的同时将样品置于水蒸汽气氛中，使得在样品表面的观察区域中形成水蒸气吸收层。 通过将待处理部分的周边放置在水蒸汽气氛中，然后用聚焦离子束照射和扫描样品表面，以防止对样品表面的损伤来获得SIM图像。 在一个实施例中，聚焦离子束仪器用于观察和修复光掩模，而不会在观察期间损坏下面的基底或光掩模图案。

    Photomask correction method using composite charged particle beam, and device used in the correction method
    7.
    发明授权
    Photomask correction method using composite charged particle beam, and device used in the correction method 有权
    使用复合带电粒子束的光掩模校正方法，以及在校正方法中使用的装置

    公开(公告)号：US07172839B2

    公开(公告)日：2007-02-06

    申请号：US10721522

    申请日：2003-11-24

    申请人： Yasuhiko Sugiyama ,  Junichi Tashiro ,  Anto Yasaka

    发明人： Yasuhiko Sugiyama ,  Junichi Tashiro ,  Anto Yasaka

    IPC分类号： G03F9/00 ,  C03C15/00 ,  G01L21/30

    CPC分类号： G03F1/74

    摘要： The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.

    摘要翻译： 本发明的目的是提供一种解决由于镓离子照射引起的表面损伤的问题的方法，当使用当前建立的FIB技术进行掩模修复时存在问题，并且存在残留镓的问题，并提供一种装置 实现这个方法。 本发明的装置具有能够进行处理的电子束透镜镜筒以及设置在同一样品室内的FIB镜筒，这意味着本发明的掩模修复方法在校正处理中去除 冗余部分如掩模不透明缺陷，相移膜凸起缺陷或玻璃衬底切割残余缺陷包括通过使用聚焦离子束的蚀刻进行粗略校正的步骤和使用电子束进行精加工的步骤以去除表面损伤 由于镓照射和残留的镓。

    Focused ion beam apparatus
    8.
    发明申请
    Focused ion beam apparatus 审中-公开
    聚焦离子束装置

    公开(公告)号：US20110215256A1

    公开(公告)日：2011-09-08

    申请号：US12931987

    申请日：2011-02-15

    申请人： Takashi Ogawa ,  Kenichi Nishinaka ,  Yasuhiko Sugiyama

    发明人： Takashi Ogawa ,  Kenichi Nishinaka ,  Yasuhiko Sugiyama

    IPC分类号： H01J3/14 ,  H01J3/26

    CPC分类号： H01J3/14 ,  H01J3/26

    摘要： A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit including an ion source gas nozzle configured to supply gas to the tip and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample, and a gun alignment electrode positioned on the side of the sample with respect to the ion gun unit and adjusts the direction of irradiation of the ion beam ejected from the ion gun unit. A lens system includes a focusing lens electrode and an objective lens electrode to focus the ion beam onto the sample.

    摘要翻译： 聚焦离子束装置包括具有发射极尖端的离子枪单元，气体供给单元，其包括被配置为向尖端供应气体的离子源气体喷嘴和离子源气体供给源。 提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。 阴极电极将离子朝向样品加速，并且枪对准电极相对于离子枪单元位于样品侧，并调节从离子枪单元喷射的离子束的照射方向。 透镜系统包括聚焦透镜电极和用于将离子束聚焦到样品上的物镜电极。

    Method and apparatus for adjusting a charged particle beam of a beam optical system
    10.
    发明授权
    Method and apparatus for adjusting a charged particle beam of a beam optical system 有权
    用于调整光束光学系统的带电粒子束的方法和装置

    公开(公告)号：US06437330B1

    公开(公告)日：2002-08-20

    申请号：US09360338

    申请日：1999-07-26

    申请人： Yasuhiko Sugiyama

    发明人： Yasuhiko Sugiyama

    IPC分类号： H01J3726

    CPC分类号： H01J37/28 ,  H01J37/21 ,  H01J2237/216

    摘要： A method and apparatus for obtaining an observational image of a sample surface by scanning a charged particle beam to detect secondary charged particles given off from the sample surface. Charged particle beam focusing and astigmatism correction are performed by comparing scanning images: one image obtained from an initial adjusting value, and other images obtained from a ±&Dgr; of the initial adjusting value, wherein &Dgr; is a known predetermined selected value. The clearest image of the images is selected, and the adjusting value of the clearest image is then set as the new initial adjusting value. The entire scanning, comparison, and adjusting process is repeated until an optimal satisfactory image is obtained.

    摘要翻译： 一种用于通过扫描带电粒子束来获得样品表面的观察图像以检测从样品表面排出的二次带电粒子的方法和装置。 通过比较扫描图像来执行带电粒子束聚焦和像散校正：从初始调整值获得的一个图像和从初始调整值的±DELTA获得的其他图像，其中DELTA是已知的预定选择值。 选择图像的最清晰的图像，然后将最清晰的图像的调整值设置为新的初始调整值。 重复整个扫描，比较和调整过程，直到获得最佳令人满意的图像。