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公开(公告)号:US20180086869A1
公开(公告)日:2018-03-29
申请号:US15712698
申请日:2017-09-22
Inventor: Jin Su Ham , Yeon Sik Jung , Sun Young Kim , Yoon Hyung Hur , Kwang Kuk Lee , Seung Won Song
IPC: C08F220/18 , C08F212/08 , C08F114/18 , C08F293/00
CPC classification number: C08F220/18 , C08F12/20 , C08F114/185 , C08F212/08 , C08F293/005 , C08F2438/03 , C09D153/00 , H01L21/31138
Abstract: Provided is a method of forming fine patterns capable of minimizing LER and LWR to form high quality nanopatterns, by using a block copolymer having excellent etching selectivity. Provided is a block copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:
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公开(公告)号:US11043647B2
公开(公告)日:2021-06-22
申请号:US16212798
申请日:2018-12-07
Inventor: Yeon Sik Jung , Duk Young Jeon , Geon Yeong Kim , Jin Young Choi , Chul Hee Lee , Hun Hee Lim
Abstract: The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.
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公开(公告)号:US20240357915A1
公开(公告)日:2024-10-24
申请号:US18243982
申请日:2023-09-08
Inventor: Yeon Sik Jung , Geon Yeong Kim , Moohyun Kim , Kyeongmin Song , Hongjoo Shin
IPC: H10K71/20
CPC classification number: H10K71/211 , B82Y30/00 , B82Y40/00
Abstract: There is provided a method for preparing a three-dimensional nanostructure using nanoparticles, which includes: a step of surface-treating a patterned pattern substrate with a polymer; a step of coating colloidal nanoparticles on the polymer; a step of removing an unwanted nanoparticle coating layer; a step of bonding a carrier substrate having adhevisity to the nanoparticle coating layer; a step of separating the nanoparticle coating layer from the pattern substrate by separating the carrier substrate from the pattern substrate; and a step of forming a nanoparticle layer on a target substrate by contacting the carrier polymer with the target substrate and then removing the carrier polymer by immersing the carrier polymer in a solution.
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公开(公告)号:US10507604B2
公开(公告)日:2019-12-17
申请号:US14884529
申请日:2015-10-15
Inventor: Yeon Sik Jung , Jae Won Jeong , Kwang Min Baek , Jong Min Kim , Tae Won Nam
Abstract: A nanotransfer printing method, including the steps of coating a polymer thin film on a template substrate where a surface pattern is formed, fabricating the polymer thin film into a thin-film replica mold by using the polymer thin film and an adhesive film, forming nanostructures on the thin-film replica mold, selectively weakening an adhesive force between the adhesive film and the thin-film replica mold, and transferring the nanostructures into a target object, is provided.
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公开(公告)号:US10476095B2
公开(公告)日:2019-11-12
申请号:US15798261
申请日:2017-10-30
Applicant: Hyundai Motor Company , Kia Motors Corporation , Korea Advanced Institute of Science and Technology
Inventor: Youjung Song , Won Jung Kim , Ki Ung Jeon , Yeon Sik Jung
IPC: H01M4/86 , H01M4/88 , H01M8/1018 , H01M8/1007 , H01M8/0297
Abstract: A fuel cell may include a fuel supply unit for supplying hydrogen to a fuel cell stack; an air supply unit for supplying air to the fuel cell stack; and the fuel cell stack that generates energy using hydrogen and air supplied from the fuel supply unit and the air supply unit, wherein the fuel cell stack has a mesh structure and comprises a conductive polymer electrode containing about 0.1 to 1 wt % of polyethylene oxide (PEO) having a molecular weight of about 1,000 to 6,000 kg/mol.
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公开(公告)号:US10087270B2
公开(公告)日:2018-10-02
申请号:US15711086
申请日:2017-09-21
Inventor: Jin Su Ham , Yeon Sik Jung , Sun Young Kim , Yoon Hyung Hur , Kwang Kuk Lee , Seung Won Song
IPC: C08F214/18 , C08F212/08 , C08F220/14 , C08F220/18 , C08F293/00 , C08F4/04 , C08F212/14 , G01Q60/24 , H01J37/28
Abstract: Provided is a diblock copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:
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公开(公告)号:US11719664B2
公开(公告)日:2023-08-08
申请号:US16552120
申请日:2019-08-27
Inventor: Yeon Sik Jung , Hyeuk Jin Han , Seunghee Cho , Gyurac Lee
CPC classification number: G01N27/27 , G01N21/658 , H01L29/413 , H01J37/26
Abstract: A multimodal sensor of high sensitivity and high selectivity using multifunctional three-dimensional nanostructure having electric and optical sensing ability and a method thereof are provided. The method includes forming multi-layered nanowires including a multifunctional material, transferring the nanowires to a plurality of layers onto a target substrate to form the three-dimensional nanostructure, heat-treating the three-dimensional nanostructure, and forming electrode layers at the three-dimensional nanostructure.
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公开(公告)号:US10263281B2
公开(公告)日:2019-04-16
申请号:US15540351
申请日:2015-09-23
Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION , KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Ki Suk Kang , In Sang Hwang , Yeon Sik Jung , Jung Keun Yoo , Jae Beom Jeon , Ki Ung Jeon
IPC: H01M10/0565 , H01M10/0562 , H01M10/0525 , H01M10/0585
Abstract: The present invention provides an all-solid ion battery having improved stability and power characteristics and comprising: a powder-form solid electrolyte; a powder-form electrode active material; a first conductive polymer coating film coated on at least a portion of the solid electrolyte and capable of transporting ions; and a second conductive polymer coating film coated on at least a portion of the electrode active material and capable of transporting ions and electrons.
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公开(公告)号:US10047182B2
公开(公告)日:2018-08-14
申请号:US15712698
申请日:2017-09-22
Inventor: Jin Su Ham , Yeon Sik Jung , Sun Young Kim , Yoon Hyung Hur , Kwang Kuk Lee , Seung Won Song
IPC: C08F220/18 , C08F212/08 , C08F114/18 , C08F293/00 , H01L21/311 , C08F212/14
Abstract: Provided is a method of forming fine patterns capable of minimizing LER and LWR to form high quality nanopatterns, by using a block copolymer having excellent etching selectivity. Provided is a block copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:
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公开(公告)号:US20180086866A1
公开(公告)日:2018-03-29
申请号:US15711086
申请日:2017-09-21
Inventor: Jin Su Ham , Yeon Sik Jung , Sun Young Kim , Yoon Hyung Hur , Kwang Kuk Lee , Seung Won Song
IPC: C08F214/18 , C08F212/08 , C08F220/18 , C08F220/14 , C08F293/00
CPC classification number: C08F214/18 , C08F2/38 , C08F4/04 , C08F12/20 , C08F212/08 , C08F220/14 , C08F220/18 , C08F293/005 , C08F2438/03 , C09D153/00 , G01Q60/24 , H01J37/28
Abstract: Provided is a diblock copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:
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