公开(公告)号：US08902429B1

公开(公告)日：2014-12-02

申请号：US13705873

申请日：2012-12-05

Applicant: KLA-Tencor Corporation

Inventor： Jie-Fei Zheng ,  Steve Cui

IPC: G01B9/02

CPC classification number: G01B9/02035 ,  G01B2210/44

Abstract: The disclosure is directed to focusing one or more detectors of an interferometry system. An initial focus position may be determined by focusing a detector on an edge of a sample by comparing image contrast of intensity frames collected by the detector. Data associated with an inner edge of a ring formed by the image of the sample reflected on a reference flat may be collected from one or more positions near the initial focus position. The detector can be focused to a selected position by comparing edge data collected at the various detector positions near the initial focus position.

Abstract translation: 本公开涉及聚焦干涉测量系统的一个或多个检测器。 可以通过比较由检测器收集的强度帧的图像对比度来将检测器聚焦在样本的边缘上来确定初始聚焦位置。 与由参考平面反射的样品的图像形成的环的内边缘相关联的数据可以从初始聚焦位置附近的一个或多个位置收集。 通过比较在初始聚焦位置附近的各种检测器位置收集的边缘数据，可以将检测器聚焦到选定位置。

公开(公告)号：US20140016125A1

公开(公告)日：2014-01-16

申请号：US13760829

申请日：2013-02-06

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Gary Janik ,  Steve Cui ,  Rex Runyon ,  Dieter Wilk ,  Steve Short ,  Mikhail Haurylau ,  Qiang Q. Zhang ,  Grace Hsiu-Ling Chen ,  Robert M. Danen ,  Suwipin Martono ,  Shobhit Verma ,  Wenjian Cai ,  Meier Brender

IPC: G01N21/88 ,  G02B27/58

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8825 ,  G02B27/58

Abstract: An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.

Abstract translation: 具有可选择变迹的检查系统包括被配置为照亮样品表面的照明源，被配置为检测从样品表面发出的至少一部分光的检测器，所述照明源和检测器通过光学 光学系统的可选择地配置的变迹装置，其中所述变迹装置包括可操作地耦合到一个或多个致动级的一个或多个变迹元件，所述一个或多个致动级被配置成沿着一个或多个方向可选地致动所述一个或多个变迹元件 以及控制系统，其通信地耦合到所述一个或多个致动并被配置为通过控制所述一个或多个变迹元件的致动状态来选择性地控制沿着所述光学路径传输的照明的变迹。

公开(公告)号：US20160054232A1

公开(公告)日：2016-02-25

申请号：US14930254

申请日：2015-11-02

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Gary Janik ,  Steve Cui ,  Rex Runyon ,  Dieter Wilk ,  Steve Short ,  Mikhail Haurylau ,  Qiang Q. Zhang ,  Grace Hsiu-Ling Chen ,  Robert M. Danen ,  Suwipin Martono ,  Shobhit Verma ,  Wenjian Cai ,  Meier Brender

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8825 ,  G02B27/58

Abstract: An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.

Abstract translation: 具有可选择变迹的检查系统包括沿着光学系统的光学路径设置的可选择地配置的变迹装置。 变迹装置包括一个或多个操作性地耦合到一个或多个致动级的变迹元件。 所述一个或多个致动台被配置成沿着一个或多个方向可选地致动所述一个或多个变迹元件。 检查系统包括通信地耦合到一个或多个致动级的控制系统。 控制系统被配置为可选择地控制在一个或多个变迹元件处的致动状态，以便施加与所述一个或多个变迹元件形成的选择的变迹轮廓。

公开(公告)号：US09176069B2

公开(公告)日：2015-11-03

申请号：US13760829

申请日：2013-02-06

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Gary Janik ,  Steve Cui ,  Rex Runyon ,  Dieter Wilk ,  Steve Short ,  Mikhail Haurylau ,  Qiang Q. Zhang ,  Grace Hsiu-Ling Chen ,  Robert M. Danen ,  Suwipin Martono ,  Shobhit Verma ,  Wenjian Cai ,  Meier Brender

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G02B27/58

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8825 ,  G02B27/58

Abstract: An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.

Abstract translation: 具有可选择变迹的检查系统包括被配置为照亮样品表面的照明源，被配置为检测从样品表面发出的至少一部分光的检测器，所述照明源和检测器通过光学 光学系统的可选择地配置的变迹装置，其中所述变迹装置包括可操作地耦合到一个或多个致动级的一个或多个变迹元件，所述一个或多个致动级被配置成沿着一个或多个方向可选地致动所述一个或多个变迹元件 以及控制系统，其通信地耦合到所述一个或多个致动并被配置为通过控制所述一个或多个变迹元件的致动状态来选择性地控制沿着所述光学路径传输的照明的变迹。

公开(公告)号：US09645093B2

公开(公告)日：2017-05-09

申请号：US14930254

申请日：2015-11-02

Applicant: KLA-Tencor Corporation

Inventor： Jamie M. Sullivan ,  Gary Janik ,  Steve Cui ,  Rex Runyon ,  Dieter Wilk ,  Steve Short ,  Mikhail Haurylau ,  Qiang Q. Zhang ,  Grace Hsiu-Ling Chen ,  Robert M. Danen ,  Suwipin Martono ,  Shobhit Verma ,  Wenjian Cai ,  Meier Brender

IPC: G01N21/00 ,  G02B27/58 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8825 ,  G02B27/58

Abstract: An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.