Invention Grant
US09176069B2 System and method for apodization in a semiconductor device inspection system
有权
半导体器件检测系统中的变迹的系统和方法
- Patent Title: System and method for apodization in a semiconductor device inspection system
- Patent Title (中): 半导体器件检测系统中的变迹的系统和方法
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Application No.: US13760829Application Date: 2013-02-06
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Publication No.: US09176069B2Publication Date: 2015-11-03
- Inventor: Jamie M. Sullivan , Gary Janik , Steve Cui , Rex Runyon , Dieter Wilk , Steve Short , Mikhail Haurylau , Qiang Q. Zhang , Grace Hsiu-Ling Chen , Robert M. Danen , Suwipin Martono , Shobhit Verma , Wenjian Cai , Meier Brender
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88 ; G01N21/95 ; G01N21/956 ; G02B27/58

Abstract:
An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.
Public/Granted literature
- US20140016125A1 System and Method for Apodization in a Semiconductor Device Inspection System Public/Granted day:2014-01-16
Information query