公开(公告)号：US20180275523A1

公开(公告)日：2018-09-27

申请号：US15612279

申请日：2017-06-02

Applicant: KLA-Tencor Corporation

Inventor： John J. Biafore ,  Moshe E. Preil

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/88

CPC classification number: G03F7/7065 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8883 ,  G01N2021/95676 ,  G05B23/0254 ,  G05B23/0294

Abstract: A system for stochastically-aware metrology includes a controller to be communicatively coupled to a fabrication tool. The controller receives a production recipe including at least a pattern of elements to be fabricated on a sample and one or more exposure parameters for exposing the pattern of elements, identifies candidate care areas of the pattern of elements susceptible to stochastic repeaters including fabrication defects predicted to occur stochastically when fabricated according to the production recipe, selects one or more care areas from the candidate care areas by comparing one or more predicted likelihoods of the one or more stochastic repeaters to a defect likelihood threshold, modifies the production recipe to mitigate the stochastic repeaters within the one or more care areas within a selected tolerance, and directs the fabrication tool to fabricate at least one sample according to the modified production recipe.

公开(公告)号：US20180233318A1

公开(公告)日：2018-08-16

申请号：US15879120

申请日：2018-01-24

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Frank Chilese ,  Moshe E. Preil

IPC: H01J37/06 ,  H01L21/66 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  G03F1/86

Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.

公开(公告)号：US10777377B2

公开(公告)日：2020-09-15

申请号：US15879120

申请日：2018-01-24

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Frank Chilese ,  Moshe E. Preil

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/20 ,  G03F1/86 ,  H01J37/244 ,  H01L21/66

Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.

公开(公告)号：US10474042B2

公开(公告)日：2019-11-12

申请号：US15612279

申请日：2017-06-02

Applicant: KLA-Tencor Corporation

Inventor： John J. Biafore ,  Moshe E. Preil

IPC: G03F7/20 ,  G01N21/88 ,  G05B23/02 ,  G01N21/956

Abstract: A system for stochastically-aware metrology includes a controller to be communicatively coupled to a fabrication tool. The controller receives a production recipe including at least a pattern of elements to be fabricated on a sample and one or more exposure parameters for exposing the pattern of elements, identifies candidate care areas of the pattern of elements susceptible to stochastic repeaters including fabrication defects predicted to occur stochastically when fabricated according to the production recipe, selects one or more care areas from the candidate care areas by comparing one or more predicted likelihoods of the one or more stochastic repeaters to a defect likelihood threshold, modifies the production recipe to mitigate the stochastic repeaters within the one or more care areas within a selected tolerance, and directs the fabrication tool to fabricate at least one sample according to the modified production recipe.