公开(公告)号：US10533954B2

公开(公告)日：2020-01-14

申请号：US15692863

申请日：2017-08-31

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Mohan Mahadevan ,  Alex Salnik ,  Scott A. Young

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/17 ,  G01N21/88

Abstract: Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.

公开(公告)号：US09772297B2

公开(公告)日：2017-09-26

申请号：US14618586

申请日：2015-02-10

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Mohan Mahadevan ,  Alex Salnik ,  Scott A. Young

IPC: G01N21/00 ,  G01B11/30 ,  G01N21/95 ,  G01N21/17 ,  G01N21/88

CPC classification number: G01N21/9505 ,  G01N21/1717 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2201/06113

Abstract: Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.

公开(公告)号：US09232622B2

公开(公告)日：2016-01-05

申请号：US14476149

申请日：2014-09-03

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Alex Salnik ,  Anant Chimmalgi

IPC: F21V5/00 ,  F21V7/00 ,  F21V13/00 ,  F21V13/04 ,  H01J61/02 ,  H05G2/00 ,  G03F7/20 ,  H01J61/30 ,  H01J61/33 ,  H01J61/04

CPC classification number: H05G2/008 ,  G03F7/70016 ,  H01J61/02 ,  H01J61/025 ,  H01J61/04 ,  H01J61/302 ,  H01J61/33 ,  H01J65/04

Abstract: A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with at least one property that is varied to compensate for optical aberrations in the system.

Abstract translation: 激光持续等离子体照明器系统包括至少一个激光源以提供光。 至少一个反射器将来自激光光源的光聚焦在反射器的焦点处。 基本上充满气体的外壳位于反射器的焦点处或附近。 来自激光光源的光至少部分维持包含在外壳中的等离子体。 外壳具有至少一个具有至少一个属性的壁，该特性被改变以补偿系统中的光学像差。

公开(公告)号：US08962351B1

公开(公告)日：2015-02-24

申请号：US14021593

申请日：2013-09-09

Applicant: KLA-Tencor Corporation

Inventor： Alex Salnik ,  Bin-Ming Benjamin Tsai ,  Lena Nicolaides

IPC: H01L21/66 ,  G01R31/26 ,  G01N21/95 ,  H01L21/265

CPC classification number: H01L22/10 ,  G01N21/9501 ,  G01R31/2601 ,  H01L21/265 ,  H01L22/12 ,  H01L22/20

Abstract: The present invention may include a first dopant metrology system configured to measure a first plurality of values of at least one parameter of a wafer, an ion implanter configured to implant a plurality of ions into the wafer, a second dopant metrology system configured to measure a second plurality of values of at least one parameter of the wafer following ion implantation of the wafer by the implanter, wherein the first dopant metrology system and the second dopant metrology system are communicatively coupled, an annealer configured to anneal the wafer following ion implantation, and a third dopant metrology system configured to measure a third plurality of values of at least one parameter of the wafer following annealing of the wafer by the annealer, wherein the second dopant metrology system and the third dopant metrology system are communicatively coupled.

Abstract translation: 本发明可以包括配置成测量晶片的至少一个参数的第一多个值的第一掺杂剂计量系统，被配置成将多个离子注入到晶片中的离子注入机;配置成测量晶片的第二掺杂剂计量系统 其中所述第一掺杂剂计量系统和所述第二掺杂剂测量系统通信耦合，所述退火器被配置为在离子注入之后退火所述晶片，以及 第三掺杂剂测量系统，被配置为在由所述退火炉退火所述晶片之后测量所述晶片的至少一个参数的第三多个值，其中所述第二掺杂剂测量系统和所述第三掺杂剂计量系统通信地耦合。

公开(公告)号：US20180003648A1

公开(公告)日：2018-01-04

申请号：US15692863

申请日：2017-08-31

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Mohan Mahadevan ,  Alex Salnik ,  Scott A. Young

IPC: G01N21/95 ,  G01N21/17 ,  G01N21/88

Abstract: Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.

公开(公告)号：US20140367592A1

公开(公告)日：2014-12-18

申请号：US14476149

申请日：2014-09-03

Applicant: KLA-Tencor Corporation, a Delaware Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Alex Salnik ,  Anant Chimmalgi

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70016 ,  H01J61/02 ,  H01J61/025 ,  H01J61/04 ,  H01J61/302 ,  H01J61/33 ,  H01J65/04

Abstract: A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with at least one property that is varied to compensate for optical aberrations in the system.

Abstract translation: 激光持续等离子体照明器系统包括至少一个激光源以提供光。 至少一个反射器将来自激光光源的光聚焦在反射器的焦点处。 基本上充满气体的外壳位于反射器的焦点处或附近。 来自激光光源的光至少部分维持包含在外壳中的等离子体。 外壳具有至少一个具有至少一个属性的壁，该特性被改变以补偿系统中的光学像差。

公开(公告)号：US20150226676A1

公开(公告)日：2015-08-13

申请号：US14618586

申请日：2015-02-10

Applicant: KLA-Tencor Corporation

Inventor： Lena Nicolaides ,  Mohan Mahadevan ,  Alex Salnik ,  Scott A. Young

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/9505 ,  G01N21/1717 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2201/06113

Abstract: Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.

Abstract translation: 公开了用于检测半导体样品中的缺陷或检​​查缺陷的方法和装置。 该系统具有用于将BF照明光束引导到样品上并且响应于BF照明光束检测从样品反射的输出光束的亮场（BF）模块。 该系统具有调制的光反射（MOR）模块，用于将泵和探针光束引导到样品，并响应于泵浦光束和探针光束检测来自探针光点的MOR输出光束。 该系统包括用于分析来自多个BF点的BF输出光束的处理器，以检测样品表面或表面附近的缺陷，并分析来自多个探针点的MOR输出光束以检测低于表面的缺陷 的样品。