公开(公告)号：US20220082950A1

公开(公告)日：2022-03-17

申请号：US17161604

申请日：2021-01-28

Applicant: KLA Corporation

Inventor： Alon Yagil ,  Yuval Lamhot ,  Ohad Bachar ,  Martin Mayo ,  Tal Yaziv ,  Roie Volkovich

IPC: G03F7/20 ,  H01L21/66 ,  G01B11/06

Abstract: A method and system for measuring misregistration between different layers of a semiconductor device, the method including providing a set of pupil inaccuracy scalable basis elements (PISBEs) relating to a plurality of patterned semiconductor device wafers (PSDWs), generating a single pupil image of a site on a PSDW, the PSDW being one of the plurality of PSDWs, by taking a single measurement of the site, the single pupil image including a plurality of site-specific pixels, calculating a set of site-specific pupil inaccuracy scalable basis element scaling factors (PISBESFs) for the single pupil image using the set of PISBEs and the plurality of site-specific pixels and calculating a site-specific misregistration value (SSMV) using the set of PISBEs and the set of site-specific PISBESFs.

公开(公告)号：US20210223274A1

公开(公告)日：2021-07-22

申请号：US16747734

申请日：2020-01-21

Applicant: KLA Corporation

Inventor： Renan Milo ,  Roie Volkovich ,  Anna Golotsvan ,  Tal Yaziv ,  Nir BenDavid

IPC: G01N35/00 ,  G06N20/00

Abstract: A system for analyzing one or more samples includes a sample analysis sub-system configured to perform one or more measurements on the one or more samples. The system further includes a controller configured to: receive design of experiment (DoE) data for performing the one or more measurements on the one or more samples; determine rankings for a set of target parameters; generate a recipe for performing the one or more measurements on the one or more samples based on the DoE data and the rankings of the set of target parameters; determine run parameters based on the recipe; perform the one or more measurements on the one or more samples, via the sample analysis sub-system, according to the recipe; and adjust the run parameters based on output data associated with performing the one or more measurements on the one or more samples.

公开(公告)号：US11454894B2

公开(公告)日：2022-09-27

申请号：US17161604

申请日：2021-01-28

Applicant: KLA Corporation

Inventor： Alon Yagil ,  Yuval Lamhot ,  Ohad Bachar ,  Martin Mayo ,  Tal Yaziv ,  Roie Volkovich

IPC: G03F7/20 ,  G01B11/06 ,  H01L21/66

Abstract: A method and system for measuring misregistration between different layers of a semiconductor device, the method including providing a set of pupil inaccuracy scalable basis elements (PISBEs) relating to a plurality of patterned semiconductor device wafers (PSDWs), generating a single pupil image of a site on a PSDW, the PSDW being one of the plurality of PSDWs, by taking a single measurement of the site, the single pupil image including a plurality of site-specific pixels, calculating a set of site-specific pupil inaccuracy scalable basis element scaling factors (PISBESFs) for the single pupil image using the set of PISBEs and the plurality of site-specific pixels and calculating a site-specific misregistration value (SSMV) using the set of PISBEs and the set of site-specific PISBESFs.

公开(公告)号：US10831108B2

公开(公告)日：2020-11-10

申请号：US15198902

申请日：2016-06-30

Applicant: KLA CORPORATION

Inventor： Tal Marciano ,  Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Ze'ev Lindenfeld ,  Zeng Zhao ,  Yoel Feler ,  Daniel Kandel ,  Nadav Carmel ,  Amnon Manassen ,  Nuriel Amir ,  Oded Kaminsky ,  Tal Yaziv ,  Ofer Zaharan ,  Moshe Cooper ,  Roee Sulimarski ,  Tom Leviant ,  Noga Sella ,  Boris Efraty ,  Lilach Saltoun ,  Amir Handelman ,  Eltsafon Ashwal ,  Ohad Bachar

IPC: G03F7/20 ,  H01L21/66 ,  G03F9/00

Abstract: Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

公开(公告)号：US11761969B2

公开(公告)日：2023-09-19

申请号：US16747734

申请日：2020-01-21

Applicant: KLA Corporation

Inventor： Renan Milo ,  Roie Volkovich ,  Anna Golotsvan ,  Tal Yaziv ,  Nir BenDavid

IPC: G01N35/00 ,  G06N20/00

CPC classification number: G01N35/00623 ,  G01N35/00693 ,  G06N20/00

Abstract: A system for analyzing one or more samples includes a sample analysis sub-system configured to perform one or more measurements on the one or more samples. The system further includes a controller configured to: receive design of experiment (DoE) data for performing the one or more measurements on the one or more samples; determine rankings for a set of target parameters; generate a recipe for performing the one or more measurements on the one or more samples based on the DoE data and the rankings of the set of target parameters; determine run parameters based on the recipe; perform the one or more measurements on the one or more samples, via the sample analysis sub-system, according to the recipe; and adjust the run parameters based on output data associated with performing the one or more measurements on the one or more samples.