Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof

    公开(公告)号:US11454894B2

    公开(公告)日:2022-09-27

    申请号:US17161604

    申请日:2021-01-28

    Abstract: A method and system for measuring misregistration between different layers of a semiconductor device, the method including providing a set of pupil inaccuracy scalable basis elements (PISBEs) relating to a plurality of patterned semiconductor device wafers (PSDWs), generating a single pupil image of a site on a PSDW, the PSDW being one of the plurality of PSDWs, by taking a single measurement of the site, the single pupil image including a plurality of site-specific pixels, calculating a set of site-specific pupil inaccuracy scalable basis element scaling factors (PISBESFs) for the single pupil image using the set of PISBEs and the plurality of site-specific pixels and calculating a site-specific misregistration value (SSMV) using the set of PISBEs and the set of site-specific PISBESFs.

    SYSTEMS AND METHODS FOR SCATTEROMETRIC SINGLE-WAVELENGTH MEASUREMENT OF MISREGISTRATION AND AMELIORATION THEREOF

    公开(公告)号:US20220082950A1

    公开(公告)日:2022-03-17

    申请号:US17161604

    申请日:2021-01-28

    Abstract: A method and system for measuring misregistration between different layers of a semiconductor device, the method including providing a set of pupil inaccuracy scalable basis elements (PISBEs) relating to a plurality of patterned semiconductor device wafers (PSDWs), generating a single pupil image of a site on a PSDW, the PSDW being one of the plurality of PSDWs, by taking a single measurement of the site, the single pupil image including a plurality of site-specific pixels, calculating a set of site-specific pupil inaccuracy scalable basis element scaling factors (PISBESFs) for the single pupil image using the set of PISBEs and the plurality of site-specific pixels and calculating a site-specific misregistration value (SSMV) using the set of PISBEs and the set of site-specific PISBESFs.

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