-
公开(公告)号：US20070000772A1
公开(公告)日：2007-01-04
申请号：US11102337
申请日：2005-04-08
申请人： Jurgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
发明人： Jurgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18′ and an additional power supply 13′, 18″, or a power supply 21, 21′, 22 designed with switchable combinatorial circuitry.
摘要翻译： 本发明涉及一种用于沉积绝缘层的基于弧的方法和用于低温涂覆工艺的基于弧的方法，其中点火并施加在电弧源中的靶的表面上的电弧放电， 同时馈送直流电和脉冲或交流电流。 本发明还涉及一种电弧源，其中目标物连接到电源单元，该电源单元包含至少一个脉冲大电流电源18,18'和附加电源13'，18“或 电源21,21'，22设计具有可切换的组合电路。
-
公开(公告)号：US09997338B2
公开(公告)日：2018-06-12
申请号：US11102337
申请日：2005-04-08
申请人： Jürgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
发明人： Jürgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
IPC分类号： C23C14/00 , H01J37/34 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/32 , F01D5/28 , H01J37/32
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current.The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18′ and an additional power supply 13′, 18″, or a power supply 21, 21′, 22 designed with switchable combinatorial circuitry.
-
公开(公告)号：US20090260977A1
公开(公告)日：2009-10-22
申请号：US12427021
申请日：2009-04-21
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
摘要翻译： 安装在转盘（19）上的工件的行星架（22）设置在真空室内。 提供了用于包含离子（CL）的云的源（24），使得云的中心轴（ACL）拦截转盘（19）的旋转轴线（A20）。 云（CL）在行星轴（A22）的移动路径（T）处具有离离约定中心轴（ACL）一定距离处的最大离子密度的50％的离子密度分布， 行星架（22）的直径。 当行星齿轮架（22）上的工件被包含离子的云所蚀刻时，被蚀刻掉的物质基本上不会重新沉积在相邻的行星架上，而是朝向真空室的壁喷射。
-
公开(公告)号：US08864959B2
公开(公告)日：2014-10-21
申请号：US12427021
申请日：2009-04-21
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C23C16/00 , H01J37/32
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
摘要翻译： 安装在转盘（19）上的工件的行星架（22）设置在真空室内。 提供了用于包含离子（CL）的云的源（24），使得云的中心轴（ACL）拦截转盘（19）的旋转轴线（A20）。 云（CL）在行星轴（A22）的移动路径（T）处具有离离约定中心轴（ACL）一定距离处的最大离子密度的50％的离子密度分布， 行星架（22）的直径。 当行星齿轮架（22）上的工件被包含离子的云所蚀刻时，被蚀刻掉的物质基本上不会重新沉积在相邻的行星架上，而是朝向真空室的壁喷射。
-
公开(公告)号：US06869509B2
公开(公告)日：2005-03-22
申请号：US10293643
申请日：2002-11-13
申请人： Oliver Gstoehl , Mauro Pedrazzini
发明人： Oliver Gstoehl , Mauro Pedrazzini
CPC分类号： H01J37/32055 , H01J37/3266
摘要： The invention relates to an arc source or a source for vaporizing or sputtering of materials and a method for operating a source. The source comprises an insulated counter-electrode and/or an AC magnet system. Thereby, dependent on the requirement, any desired potential can be applied to the counter-electrode and/or the source can be operated with different magnet systems, in particular as arc or sputter source.
摘要翻译： 本发明涉及一种用于气化或溅射材料的电弧源或源，以及用于操作源的方法。 源极包括绝缘的对电极和/或AC磁体系统。 因此，取决于要求，可以将任何期望的电位施加到对电极和/或源可以用不同的磁体系统操作，特别是电弧或溅射源。
-
公开(公告)号：US11264216B2
公开(公告)日：2022-03-01
申请号：US13148384
申请日：2009-12-30
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.
-
公开(公告)号：US20110308941A1
公开(公告)日：2011-12-22
申请号：US13148384
申请日：2009-12-30
IPC分类号： C23C14/24
CPC分类号： H01J37/3266 , C23C14/325 , H01J37/32055 , H01J37/3455 , H01J37/3458
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.
摘要翻译： 本发明涉及一种用于在工具上产生硬表面涂层的电弧蒸发源。 本发明包括电弧蒸发源，其包括至少一个电螺线管和相对于目标表面可移位的永磁体装置。 蒸发源可以根据氧化物，氮化物或金属涂层的不同要求进行调整。 可以通过适当地调节永久磁铁与目标的前侧的距离，使待蒸发的目标的寿命期间的速率下降保持不变或调节。 可以设置涂层粗糙度和速率之间的折衷。
-
公开(公告)号：US20110220495A1
公开(公告)日：2011-09-15
申请号：US13127489
申请日：2009-10-08
CPC分类号： H01J37/32 , C23F1/08 , H01J37/32009 , H01J37/32055
摘要： The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.
摘要翻译： 点火装置技术领域本发明涉及一种用于点燃真空镀膜系统中电弧蒸发器的高电流放电的点火装置。 通过机械地闭合和打开阴极和阳极之间的接触来进行点火。 通过可在强制路径上移动的点火指示器建立接触。 由于强制路径，点火指可以通过简单的机械驱动移动到停止位置，防止被涂覆，并且所述点火指也可用于点燃第二目标。
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.023 秒)
