公开(公告)号：US08021824B2

公开(公告)日：2011-09-20

申请号：US12449547

申请日：2008-02-06

Applicant: Jun Iwashita ,  Sho Abe ,  Makiko Irie ,  Takeshi Iwai

Inventor： Jun Iwashita ,  Sho Abe ,  Makiko Irie ,  Takeshi Iwai

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F28/02

CPC classification number: C08F220/28 ,  C08F220/34 ,  C08F220/38 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/111

Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.

Abstract translation: 包含如下所示的由通式（a0-1）表示的结构单元（a0）的高分子化合物：其中R1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的氟化烷基; R 2和R 3各自独立地表示氢原子，烷基或烷氧基，或者R 2和R 3可以键合在一起形成在任意位置可以包含氧原子或硫原子的亚烷基，-O-或 - S- R 4和R 5各自独立地表示氢原子，可以包含任意位置的氧原子的烷基，可以包含任意位置的氧原子的环烷基或烷氧基羰基。

公开(公告)号：US20100081080A1

公开(公告)日：2010-04-01

申请号：US12449547

申请日：2008-02-06

Applicant: Jun Iwashita ,  Sho Abe ,  Makiko Irie ,  Takeshi Iwai

Inventor： Jun Iwashita ,  Sho Abe ,  Makiko Irie ,  Takeshi Iwai

IPC: G03F7/20 ,  C08F32/08 ,  C08F24/00 ,  G03F7/004

CPC classification number: C08F220/28 ,  C08F220/34 ,  C08F220/38 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/111

Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.

Abstract translation: 包含如下所示的由通式（a0-1）表示的结构单元（a0）的高分子化合物：其中R1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的氟化烷基; R 2和R 3各自独立地表示氢原子，烷基或烷氧基，或者R 2和R 3可以键合在一起形成任意位置上可以包含氧原子或硫原子的亚烷基，-O-或 - S- R 4和R 5各自独立地表示氢原子，可以包含任意位置的氧原子的烷基，可以包含任意位置的氧原子的环烷基或烷氧基羰基。

公开(公告)号：US20090297980A1

公开(公告)日：2009-12-03

申请号：US12453857

申请日：2009-05-26

Applicant: Jun Iwashita ,  Shogo Matsumaru ,  Sho Abe

Inventor： Jun Iwashita ,  Shogo Matsumaru ,  Sho Abe

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  Y10S430/111

Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.

Abstract translation: 形成可用于光刻应用的抗蚀剂图案的新型抗蚀剂组合物和方法。 抗蚀剂组合物包括在酸的作用下在碱性显影液中显示改变的溶解性的基础组分（A）和暴露时产生酸的酸产生剂组分（B），其中所述碱性组分（A）含有高分子化合物 A1）具有下述通式（a0-1）表示的结构单元（a0），其中R1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的氟化烷基，R2 和R 3各自独立地表示氢原子或可以在任意位置含有氧原子的烷基，或者R 2和R 3结合在一起形成亚烷基，W表示可以包含氧原子的环状亚烷基 任意的位置

公开(公告)号：US08034536B2

公开(公告)日：2011-10-11

申请号：US12453857

申请日：2009-05-26

Applicant: Jun Iwashita ,  Shogo Matsumaru ,  Sho Abe

Inventor： Jun Iwashita ,  Shogo Matsumaru ,  Sho Abe

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  Y10S430/111

Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.

Abstract translation: 形成可用于光刻应用的抗蚀剂图案的新型抗蚀剂组合物和方法。 抗蚀剂组合物包括在酸的作用下在碱性显影液中显示改变的溶解性的基础组分（A）和暴露时产生酸的酸产生剂组分（B），其中所述碱性组分（A）含有高分子化合物 A1）具有下述通式（a0-1）表示的结构单元（a0），其中R1表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的氟化烷基，R2 和R 3各自独立地表示氢原子或可以在任意位置含有氧原子的烷基，或者R 2和R 3结合在一起形成亚烷基，W表示可以包含氧原子的环状亚烷基 任意的位置

公开(公告)号：US07598017B2

公开(公告)日：2009-10-06

申请号：US12258081

申请日：2008-10-24

Applicant: Jun Iwashita ,  Kazuhito Sasaki ,  Sho Abe

Inventor： Jun Iwashita ,  Kazuhito Sasaki ,  Sho Abe

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]

Abstract translation: 一种负型抗蚀剂组合物，其包含：含有下述通式（f1-0）表示的结构单元（f1）的含氟树脂组分（F）和具有碱溶性基团的结构单元（f2）， 不含氟树脂成分（F）的碱溶性树脂成分（A），暴露时产生酸的酸产生剂成分（B）和交联成分（C）。 [其中，R7表示氟化烷基，a表示0或1.]

公开(公告)号：US20090111054A1

公开(公告)日：2009-04-30

申请号：US12258081

申请日：2008-10-24

Applicant: Jun Iwashita ,  Kazuhito Sasaki ,  Sho Abe

Inventor： Jun Iwashita ,  Kazuhito Sasaki ,  Sho Abe

IPC: G03F7/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]

Abstract translation: 一种负型抗蚀剂组合物，其包含：含有下述通式（f1-0）表示的结构单元（f1）的含氟树脂组分（F）和具有碱溶性基团的结构单元（f2）， 不含氟树脂成分（F）的碱溶性树脂成分（A），暴露时产生酸的酸产生剂成分（B）和交联成分（C）。 [其中，R7表示氟化烷基，a表示0或1.]

公开(公告)号：US08632960B2

公开(公告)日：2014-01-21

申请号：US13028689

申请日：2011-02-16

Applicant: Tomoyuki Hirano ,  Takahiro Dazai ,  Daiju Shiono ,  Sho Abe

Inventor： Tomoyuki Hirano ,  Takahiro Dazai ,  Daiju Shiono ,  Sho Abe

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  G03F7/26

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  G03F7/325

Abstract: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) derived from an acrylate ester containing an acid decomposable group which generates an alcoholic hydroxy group by the action of acid to thereby exhibit increased hydrophilicity.

Abstract translation: 一种形成抗蚀剂图案的方法，包括：使用含有在酸和酸发生剂组分（B）的作用下在有机溶剂中表现出降低的溶解度的碱成分（A）的抗蚀剂组合物在基材上形成抗蚀剂膜， 其在曝光时产生酸，曝光抗蚀剂膜，并使用含有有机溶剂的显影液通过负色调显影对抗蚀剂膜进行图案化，其中所述基础组分（A）包括含有结构 单元（a0）衍生自含有通过酸作用产生醇羟基的可酸分解基团的丙烯酸酯，从而表现出增加的亲水性。

公开(公告)号：US08541157B2

公开(公告)日：2013-09-24

申请号：US12567643

申请日：2009-09-25

Applicant: Akiya Kawaue ,  Yoshiyuki Utsumi ,  Sho Abe

Inventor： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Sho Abe

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC classification number: C07C309/10 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C309/67 ,  C07C311/48 ,  C07C311/51 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2041

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.

Abstract translation: 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，酸发生剂成分（B）含有 酸性发生剂（B1），其由在阳离子部分内具有碱解离基团的化合物组成。

公开(公告)号：US20120214101A1

公开(公告)日：2012-08-23

申请号：US13398555

申请日：2012-02-16

Applicant: Hiroaki Shimizu ,  Sho Abe ,  Hideto Nito

Inventor： Hiroaki Shimizu ,  Sho Abe ,  Hideto Nito

IPC: G03F7/20 ,  G03F7/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/123

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).

Abstract translation: 一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解度变化的碱成分（A），暴露时产生酸的碱性化合物成分（C）和酸发生剂成分（B），成分（B ）和包含式（c1）〜（c3）所示的至少一种化合物的组分（C）（其中Z1表示含环骨架的烃基，Q1表示二价连接基团 含有氧的基团，Y 1表示氟化亚烷基，M +表示有机阳离子，R1表示氟代烷基或烃基，L1 +，L2 +表示锍或碘，Z2表示氢原子或烃基，Y2表示 单键或不含氟的二价连接基团，R 2表示有机基团，Y 3表示亚烷基或亚芳基，Rf表示含氟烃基）。

公开(公告)号：US20100035192A1

公开(公告)日：2010-02-11

申请号：US12533685

申请日：2009-07-31

Applicant: Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

Inventor： Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

IPC: G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/095

Abstract: A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.

Abstract translation: 一种形成抗蚀剂图案的方法，包括：使用化学放大型负性抗蚀剂组合物在基板上形成抗蚀剂膜; 通过使抗蚀剂膜首先通过光掩模曝光来形成第一线和空间图案的潜像; 通过使光刻胶膜通过光掩模进行第二曝光，形成与第一线和空间图案的潜像相交的第二线和空间图案的潜像; 并且使抗蚀剂膜显影以在抗蚀剂膜中形成孔图案。