Invention Grant
- Patent Title: Negative resist composition and method of forming resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案形成方法
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Application No.: US12258081Application Date: 2008-10-24
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Publication No.: US07598017B2Publication Date: 2009-10-06
- Inventor: Jun Iwashita , Kazuhito Sasaki , Sho Abe
- Applicant: Jun Iwashita , Kazuhito Sasaki , Sho Abe
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2007-282085 20071030
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30
Abstract:
A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]
Public/Granted literature
- US20090111054A1 NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2009-04-30
Information query
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