Invention Grant
US08021824B2 Polymer compound, resist composition and method of forming resist pattern
有权
高分子化合物,抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Polymer compound, resist composition and method of forming resist pattern
- Patent Title (中): 高分子化合物,抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US12449547Application Date: 2008-02-06
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Publication No.: US08021824B2Publication Date: 2011-09-20
- Inventor: Jun Iwashita , Sho Abe , Makiko Irie , Takeshi Iwai
- Applicant: Jun Iwashita , Sho Abe , Makiko Irie , Takeshi Iwai
- Applicant Address: JP Kanagawa
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPP2007-034588 20070215; JPP2007-302250 20071121
- International Application: PCT/JP2008/051907 WO 20080206
- International Announcement: WO2008/099725 WO 20080821
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; C08F28/02

Abstract:
A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.
Public/Granted literature
- US20100081080A1 POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2010-04-01
Information query
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