Abstract:
A signal sensor is provided that includes a substrate, an input port formed on the substrate as a substantially linear conductive element, and a sensing port formed on the substrate adjacent to the input port. The sensing port is influenced by magnetic flux emanating from the input port such that a sense signal is generated in the sensing port. The sensing port can have as little as one sensing loop disposed on one side of the input port, but preferably includes at least one sensing loop on each side of the input port. The sensing loops on each side of the input port have an opposite sense of turn so that the sense signals in each loop are additive. A cross-over connector provides an electrical connection between the loops of the sensing port on opposite sides of the input port. The cross-over connector can be an underpass crossing below the input port or an overpass crossing above the input port. If desired, multiple sensing loops can be formed on each side of the input port. These sensing loops may be formed at the same fabrication level or may be formed on multiple fabrication levels. In the latter case, multi-level interconnects provide electrical connections between the sensing loops on each level.
Abstract:
High quality factor (Q) spiral and toroidal inductor and transformer are disclosed that are compatible with silicon very large scale integration (VLSI) processing, consume a small IC area, and operate at high frequencies. The spiral inductor has a spiral metal coil deposited in a trench formed in a dielectric layer over a substrate. The metal coil is enclosed in ferromagnetic liner and cap layers, and is connected to an underpass contact through a metal filled via in the dielectric layer. The spiral inductor also includes ferromagnetic cores lines surrounded by the metal spiral coil. A spiral transformer is formed by vertically stacking two spiral inductors, or placing them side-by-side over a ferromagnetic bridge formed below the metal coils and cores lines. The toroidal inductor includes a toroidal metal coil with a core having ferromagnetic strips. The toroidal metal coil is segmented into two coils each having a pair of ports to form a toroidal transformer.
Abstract:
High quality factor (Q) spiral and toroidal inductor and transformer are disclosed that are compatible with silicon very large scale integration (VLSI) processing, consume a small IC area, and operate at high frequencies. The spiral inductor has a spiral metal coil deposited in a trench formed in a dielectric layer over a substrate. The metal coil is enclosed in ferromagnetic liner and cap layers, and is connected to an underpass contact through a metal filled via in the dielectric layer. The spiral inductor also includes ferromagnetic cores lines surrounded by the metal spiral coil. A spiral transformer is formed by vertically stacking two spiral inductors, or placing them side-by-side over a ferromagnetic bridge formed below the metal coils and cores lines. The toroidal inductor includes a toroidal metal coil with a core having ferromagnetic strips. The toroidal metal coil is segmented into two coils each having a pair of ports to form a toroidal transformer.
Abstract:
An RF switch comprises a switching FET having gate and back gate terminals, an input port for receiving an RF signal, and an output port for providing substantially the RF signal during an ON state of the FET. Switching circuitry connects the back gate terminal of the FET to the input port during the ON state to reduce insertion loss during the ON state, and connects the back gate terminal to a point of reference potential during an OFF state of the FET to increase isolation during the OFF state. Preferably, the switching FET is a depletion mode silicon MOSFET capable of operating with low supply voltages. The switching circuitry preferably comprises a second FET for electrically connecting the back gate terminal and the input terminal (e.g., source) of the switching FET during the ON state, and a third FET for electrically connecting the back gate terminal of the switching FET to the point of reference potential during the OFF state.
Abstract:
High quality factor (Q) spiral and toroidal inductor and transformer are disclosed that are compatible with silicon very large scale integration (VLSI) processing, consume a small IC area, and operate at high frequencies. The spiral inductor has a spiral metal coil deposited in a trench formed in at dielectric layer over a substrate. The metal coil is enclosed in ferromagnetic liner and cap layers, and is connected to an underpass contact through a metal filled via in the dielectric layer. The spiral inductor also includes ferromagnetic cores lines surrounded by the metal spiral coil. A spiral transformer is formed by vertically stacking two spiral inductors, or placing them side-by-side over a ferromagnetic bridge formed below the metal coils and cores lines. The toroidal inductor includes a toroidal metal coil with a core having ferromagnetic strips. The toroidal metal coil is segmented into two coils each having a pair of ports to form a toroidal transformer.
Abstract:
High quality factor (Q) spiral and toroidal inductor and transformer are disclosed that are compatible with silicon very large scale integration (VLSI) processing, consume a small IC area, and operate at high frequencies. The spiral inductor has a spiral metal coil deposited in a trench formed in a dielectric layer over a substrate. The metal coil is enclosed in ferromagnetic liner and cap layers, and is connected to an underpass contact through a metal filled via in the dielectric layer. The spiral inductor also includes ferromagnetic cores lines surrounded by the metal spiral coil. A spiral transformer is formed by vertically stacking two spiral inductors, or placing them side-by-side over a ferromagnetic bridge formed below the metal coils and cores lines. The toroidal inductor includes a toroidal metal coil with a core having ferromagnetic strips. The toroidal metal coil is segmented into two coils each having a pair of ports to form a toroidal transformer.
Abstract:
An integrated circuit-compatible photo detector is disclosed which is particularly compatible with BiCMOS fabrication processes. In a first aspect, the photo detector is formed as a lateral phototransistor having a semiconductor substrate, a base structure formed as a first impurity region in the substrate, an emitter structure formed as a second impurity region in the first impurity region, and a collector structure formed by the substrate and by a pair of third and fourth impurity regions in the substrate on opposite sides of the first and second impurity regions. An emitter contact is electrically connected to the second impurity region, while a pair of collector contacts are electrically connected to the third and fourth impurity regions and to each other. An anti-reflective coating is applied to at least the base structure. Advantageously, if a photodiode is required instead of a phototransistor, the second impurity region can be formed with the same polarity as the first impurity region, in which case the first and second impurity regions form a cathode (or anode) and the third and fourth impurity regions form an anode (or cathode). In a second aspect, the photo detector is formed as a lateral phototransistor having a semiconductor substrate, a base structure formed by the substrate, an emitter structure formed as a first impurity region in the substrate, and a collector structure formed as a pair of second and third impurity regions in the substrate on opposite sides of the first impurity region. An emitter contact is electrically connected to the first impurity region, while a pair of collector contacts are electrically connected to the second and third impurity regions and to each other. An anti-reflective coating is applied to at least the base structure. Advantageously, if a photodiode is required instead of a phototransistor, the first impurity region can be formed with the same polarity as the substrate, in which case the substrate and the first impurity region form an anode (or cathode) and the second and third impurity regions form a cathode (or anode).
Abstract:
A signal sensor is provided that includes a substrate, an input port formed on the substrate as a substantially linear conductive element, and a sensing port formed on the substrate adjacent to the input port. The sensing port is influenced by magnetic flux emanating from the input port such that a sense signal is generated in the sensing port. The sensing port can have as little as one sensing loop disposed on one side of the input port, but preferably includes at least one sensing loop on each side of the input port. The sensing loops on each side of the input port have an opposite sense of turn so that the sense signals in each loop are additive. A cross-over connector provides an electrical connection between the loops of the sensing port on opposite sides of the input port. The cross-over connector can be an underpass crossing below the input port or an overpass crossing above the input port. If desired, multiple sensing loops can be formed on each side of the input port. These sensing loops may be formed at the same fabrication level or may be formed on multiple fabrication levels. In the latter case, multi-level interconnects provide electrical connections between the sensing loops on each level.
Abstract:
The present invention relates to a method for interconnecting, through high-density micro-post wiring, multiple semiconductor wafers with lengths of about a millimeter or below. Specifically, the method of the present invention comprises etching at least one hole, defined by walls, at least partly through a semiconducting material; forming a layer of electrically insulating material to cover said walls; and forming an electrically conductive material on said walls within the channel of the hole. Microelectronic devices containing the micro-post wiring of the present invention are also disclosed herein.
Abstract:
An inductor structure includes an inductor spiral coil formed on a substrate; and a substrate contact connected to the substrate and disposed within a predetermined distance to the inductor spiral coil to increase the quality-factor (Q) characteristics associated with the inductor structure, and also does not increase eddy currents in the substrate. The substrate contact provides for implementation of the inductor structure as a spiral inductor which is integrated on a silicon substrate. The substrate contact determines the energy potential substantially adjacent to the inductor for reducing the noise level. In an implementation of an inductor in an RF circuit, the substrate contact contributes to providing an increased Q.