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    STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS
    4.
    发明申请
    STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
    负责任的可图像元素的堆叠

    公开(公告)号：US20100151385A1

    公开(公告)日：2010-06-17

    申请号：US12336635

    申请日：2008-12-17

    申请人： Kevin B. Ray ,  James L. Mulligan ,  Scott A. Beckley

    发明人： Kevin B. Ray ,  James L. Mulligan ,  Scott A. Beckley

    IPC分类号： G03F7/004

    CPC分类号： B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24

    摘要： A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and an outermost topcoat that has a dry coating weight equal to or less than 1 g/m2. The non-imaging backside of the substrate is free of polymer coatings and has an average surface roughness (Ra) in both longitudinal and width directions greater than 0.15 μm. In addition, the imageable side of each underlying precursor is arranged in direct contact with the aluminum-containing substrate of the precursor above it without the use of an interleaf paper between the precursors.

    摘要翻译： 在堆叠中提供多个负性平版印刷版前体。 每个前体包括其上具有单一可成像层的铝含基材和具有等于或小于1g / m 2的干涂层重量的最外面漆。 衬底的非成像背面没有聚合物涂层，并且在纵向和宽度方向上的平均表面粗糙度（Ra）大于0.15μm。 此外，每个下面的前体的可成像侧布置成与其上方的前体的含铝基底直接接触，而不使用前体之间的中间纸。

    NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS
    6.
    发明申请
    NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS 有权
    负面工作辐射敏感组合物和成像材料

    公开(公告)号：US20080070152A1

    公开(公告)日：2008-03-20

    申请号：US11532647

    申请日：2006-09-18

    申请人： Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    发明人： Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    IPC分类号： G03C1/00

    CPC分类号： G03F7/035 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  B41M5/368 ,  G03F7/0388 ,  G03F7/40 ,  Y10S430/107 ,  Y10S430/111

    摘要： A radiation-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

    摘要翻译： 辐射敏感组合物和负性可成像元件包括可自由基聚合的组分，能够产生足以在暴露于成像辐射时引发可自由基聚合的组分聚合的自由基的引发剂组合物，辐射吸收化合物和 分布在整个组合物中的聚（氨基甲酸酯 - 丙烯酸）混合物，形成元件中的可成像层。 可以在约150至约1500nm的宽波长范围内实现成像，并且可以使用基于有机溶剂的显影剂，温水，板清洁剂或印刷机，使用平版印刷油墨和 一个喷泉的解决方案。

    Bakeable multi-layer imageable element
    7.
    发明授权
    Bakeable multi-layer imageable element 失效
    可烘烤多层可成像元件

    公开(公告)号：US07291440B2

    公开(公告)日：2007-11-06

    申请号：US11129844

    申请日：2005-05-16

    申请人： Kevin B. Ray ,  Anthony P. Kitson

    发明人： Kevin B. Ray ,  Anthony P. Kitson

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： B41C1/1016 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146

    摘要： Thermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH2═CH(R1)-Z-X—NH—CO—NH—C6H3—(R2)(CO2H); in which: R1 is H or CH3; R2 is H or OH; Z is —C6H4— or —C(O) —Y—; Y is —O— or —NH—; and X is selected from —C(CH3)2—, —CH(CH3)— and —(CH2)n—, in which n is an integer from 1 to 12.

    摘要翻译： 公开了可用于具有良好耐溶剂性的平版印刷版前体的可热成像的多层可成像元件。 可成像元件的底层包含酸性共聚物，其以聚合形式包含约10mol％至约75mol％的一种或多种下式的单体：<β在线配方描述=“在线配方” 末端=“铅”→CH 2 -CH（R 1） - ZX-NH-CO-NH-C 6 H

    Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate
    8.
    发明授权
    Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate 失效
    去除平版印刷版中不需要的，未曝光的辐射敏感层的方法

    公开(公告)号：US06843176B2

    公开(公告)日：2005-01-18

    申请号：US10661236

    申请日：2003-09-12

    申请人： Kevin B. Ray ,  Jianbing Huang ,  Joanne Ray

    发明人： Kevin B. Ray ,  Jianbing Huang ,  Joanne Ray

    IPC分类号： B41C1/10 ,  B41N3/00 ,  B41N3/08

    CPC分类号： B41N3/08 ,  B41C1/10 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/262 ,  B41N3/006

    摘要： A method for forming a printing plate from a printing plate precursor having a radiation-sensitive layer, sensitive to radiation in a first frequency spectrum such as the far or near infrared, and to radiation in a second frequency spectrum other than the first frequency spectrum such as visible or ultraviolet. The plate is exposed twice. Once to imaging radiation in the first frequency spectrum and again to radiation in the second frequency spectrum. The second frequency spectrum exposure is done only to the areas of the plate undesirably shaded during the imagewise exposure.

    摘要翻译： 一种从具有对第一频谱如远红外或近红外线的辐射敏感的辐射敏感层的印版前体形成印版的方法，以及除了第一频谱以外的第二频谱中的辐射， 如可见或紫外线。 板暴露两次。 一次对第一频谱中的辐射进行成像，并再次对第二频谱中的辐射进行成像。 第二频谱曝光仅在图像曝光期间对板的区域进行不期望的遮蔽。