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    Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate
    3.
    发明授权
    Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate 失效
    去除平版印刷版中不需要的，未曝光的辐射敏感层的方法

    公开(公告)号：US06843176B2

    公开(公告)日：2005-01-18

    申请号：US10661236

    申请日：2003-09-12

    Applicant: Kevin B. Ray ,  Jianbing Huang ,  Joanne Ray

    Inventor： Kevin B. Ray ,  Jianbing Huang ,  Joanne Ray

    IPC: B41C1/10 ,  B41N3/00 ,  B41N3/08

    CPC classification number: B41N3/08 ,  B41C1/10 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/262 ,  B41N3/006

    Abstract: A method for forming a printing plate from a printing plate precursor having a radiation-sensitive layer, sensitive to radiation in a first frequency spectrum such as the far or near infrared, and to radiation in a second frequency spectrum other than the first frequency spectrum such as visible or ultraviolet. The plate is exposed twice. Once to imaging radiation in the first frequency spectrum and again to radiation in the second frequency spectrum. The second frequency spectrum exposure is done only to the areas of the plate undesirably shaded during the imagewise exposure.

    Abstract translation: 一种从具有对第一频谱如远红外或近红外线的辐射敏感的辐射敏感层的印版前体形成印版的方法，以及除了第一频谱以外的第二频谱中的辐射， 如可见或紫外线。 板暴露两次。 一次对第一频谱中的辐射进行成像，并再次对第二频谱中的辐射进行成像。 第二频谱曝光仅在图像曝光期间对板的区域进行不期望的遮蔽。

    NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS
    4.
    发明申请
    NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS 有权
    负面工作辐射敏感组合物和成像材料

    公开(公告)号：US20080070152A1

    公开(公告)日：2008-03-20

    申请号：US11532647

    申请日：2006-09-18

    Applicant: Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    Inventor： Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    IPC: G03C1/00

    CPC classification number: G03F7/035 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  B41M5/368 ,  G03F7/0388 ,  G03F7/40 ,  Y10S430/107 ,  Y10S430/111

    Abstract: A radiation-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

    Abstract translation: 辐射敏感组合物和负性可成像元件包括可自由基聚合的组分，能够产生足以在暴露于成像辐射时引发可自由基聚合的组分聚合的自由基的引发剂组合物，辐射吸收化合物和 分布在整个组合物中的聚（氨基甲酸酯 - 丙烯酸）混合物，形成元件中的可成像层。 可以在约150至约1500nm的宽波长范围内实现成像，并且可以使用基于有机溶剂的显影剂，温水，板清洁剂或印刷机，使用平版印刷油墨和 一个喷泉的解决方案。

    ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE
    5.
    发明申请
    ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE 审中-公开
    可压缩可开发的负责任的成像元件和使用方法

    公开(公告)号：US20080311520A1

    公开(公告)日：2008-12-18

    申请号：US11762288

    申请日：2007-06-13

    Applicant: Jianfei Yu ,  Kevin B. Ray

    Inventor： Jianfei Yu ,  Kevin B. Ray

    IPC: G03C1/053 ,  G03F7/26

    CPC classification number: G03F7/027 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/10 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/085 ,  G03F7/3035

    Abstract: A negative-working imageable element has an imageable layer that includes an initiator composition including an iodonium cation and a borate anion, an infrared radiation absorbing compound, a particulate primary polymeric binder, and a phosphate (meth)acrylate adhesion promoter. The element also includes a polymeric overcoat disposed over the imageable layer and can be developed on-press to provide a lithographic printing plate with high run length. The element also has improved shelf-life.

    Abstract translation: 负性可成像元件具有可成像层，其包含包含碘鎓阳离子和硼酸根阴离子的引发剂组合物，红外线辐射吸收化合物，颗粒状初级聚合物粘合剂和磷酸酯（甲基）丙烯酸酯粘合促进剂。 元件还包括设置在可成像层上的聚合物外涂层，并且可以在印刷机上显影以提供具有高游程长度的平版印刷版。 该元素还具有改善的保存期限。

    Negative-working radiation-sensitive compositions and imageable materials
    7.
    发明授权
    Negative-working radiation-sensitive compositions and imageable materials 有权
    负性辐射敏感组合物和可成像材料

    公开(公告)号：US07452638B2

    公开(公告)日：2008-11-18

    申请号：US11532647

    申请日：2006-09-18

    Applicant: Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    Inventor： Jianfei Yu ,  Kevin B. Ray ,  Shashikant Saraiya ,  Thomas R. Jordan ,  Paul R. West

    IPC: G03F7/035

    CPC classification number: G03F7/035 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  B41M5/368 ,  G03F7/0388 ,  G03F7/40 ,  Y10S430/107 ,  Y10S430/111

    Abstract: A radiating-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

    Abstract translation: 辐射敏感组合物和负性可成像元件包括可自由基聚合的组分，能够产生足以在暴露于成像辐射时引发可自由基聚合的组分聚合的自由基的引发剂组合物，辐射吸收化合物和 分布在整个组合物中的聚（氨基甲酸酯 - 丙烯酸）混合物，形成元件中的可成像层。 可以在约150至约1500nm的宽波长范围内实现成像，并且可以使用基于有机溶剂的显影剂，温水，板清洁剂或印刷机，使用平版印刷油墨和 一个喷泉的解决方案。

    Nanopastes for use as patterning compositions
    9.
    发明授权
    Nanopastes for use as patterning compositions 失效
    用作图案化组合物的纳米磷

    公开(公告)号：US07217502B2

    公开(公告)日：2007-05-15

    申请号：US11444740

    申请日：2006-06-01

    Applicant: Kevin B. Ray ,  Jianbing Huang ,  Heidi M. Munnelly

    Inventor： Kevin B. Ray ,  Jianbing Huang ,  Heidi M. Munnelly

    IPC: G03C5/00

    CPC classification number: B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  G03F1/68 ,  G03F7/0047 ,  G03G13/28 ,  G03G13/283 ,  G03G13/286

    Abstract: The present invention provides methods of imagewise exposing a thermally sensitive composition formed from a nanopaste comprising inorganic nanoparticles, a carrier, and preferably certain polymeric binders. The composition has been applied to a substrate and treated to improve adhesion. Exposure affects the solubility of exposed portions of the applied and treated layer relative to unexposed portions of the applied layer. The imaged layer is then developed on-press with a fountain solution, lithographic ink, or both, to remove the exposed portions or unexposed portions of the layer to form an image in a printing plate.

    Abstract translation: 本发明提供了成像曝光由包含无机纳米颗粒，载体和优选某些聚合物粘合剂的纳米糊料形成的热敏组合物的方法。 将该组合物施用于基材并进行处理以提高粘合性。 暴露影响施加和处理的层相对于施加层的未曝光部分的暴露部分的溶解度。 然后，利用润版液，平版印刷油墨或两者在印刷机上显影成像层，以去除该层的曝光部分或未曝光部分，以在印版中形成图像。

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