NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS
    1.
    发明申请
    NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS 有权
    负面工作辐射敏感组合物和成像材料

    公开(公告)号:US20080070152A1

    公开(公告)日:2008-03-20

    申请号:US11532647

    申请日:2006-09-18

    IPC分类号: G03C1/00

    摘要: A radiation-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

    摘要翻译: 辐射敏感组合物和负性可成像元件包括可自由基聚合的组分,能够产生足以在暴露于成像辐射时引发可自由基聚合的组分聚合的自由基的引发剂组合物,辐射吸收化合物和 分布在整个组合物中的聚(氨基甲酸酯 - 丙烯酸)混合物,形成元件中的可成像层。 可以在约150至约1500nm的宽波长范围内实现成像,并且可以使用基于有机溶剂的显影剂,温水,板清洁剂或印刷机,使用平版印刷油墨和 一个喷泉的解决方案。

    Negative-working radiation-sensitive compositions and imageable materials
    3.
    发明授权
    Negative-working radiation-sensitive compositions and imageable materials 有权
    负性辐射敏感组合物和可成像材料

    公开(公告)号:US07452638B2

    公开(公告)日:2008-11-18

    申请号:US11532647

    申请日:2006-09-18

    IPC分类号: G03F7/035

    摘要: A radiating-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.

    摘要翻译: 辐射敏感组合物和负性可成像元件包括可自由基聚合的组分,能够产生足以在暴露于成像辐射时引发可自由基聚合的组分聚合的自由基的引发剂组合物,辐射吸收化合物和 分布在整个组合物中的聚(氨基甲酸酯 - 丙烯酸)混合物,形成元件中的可成像层。 可以在约150至约1500nm的宽波长范围内实现成像,并且可以使用基于有机溶剂的显影剂,温水,板清洁剂或印刷机,使用平版印刷油墨和 一个喷泉的解决方案。

    Preparation of solvent-resistant binder for an imageable element
    5.
    发明授权
    Preparation of solvent-resistant binder for an imageable element 有权
    制备用于可成像元件的耐溶剂粘合剂

    公开(公告)号:US07172850B2

    公开(公告)日:2007-02-06

    申请号:US10891727

    申请日:2004-07-15

    摘要: The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including both constitutional units having a pendant cyano group attached directly to the hydrophobic backbone, and constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. The invention also provides a method for preparing a suitable polymeric binder. The method comprises contacting a combination of co-monomers in a solvent mixture consisting essentially of a (C1–C6) alkanol and water.

    摘要翻译: 本发明提供一种可成像元件,包括平版印刷基板和设置在基板上的可成像层。 可成像层包括可自由基聚合的组分,能够产生足以在暴露于成像辐射时引发聚合反应的自由基的引发剂体系,以及具有疏水骨架的聚合物粘合剂,并且包括具有氰基侧基的两个结构单元直接连接到 疏水骨架和具有包括亲水性聚(环氧烷)链段)侧基的结构单元。 本发明还提供了制备合适的聚合物粘合剂的方法。 该方法包括将基本上由(C 1 -C 12 -C 6)烷醇组成的溶剂混合物中的共聚单体的组合与水接触。