Methods for imaging and processing negative-working imageable elements
    2.
    发明授权
    Methods for imaging and processing negative-working imageable elements 失效
    用于成像和处理负性可成像元件的方法

    公开(公告)号:US07763413B2

    公开(公告)日:2010-07-27

    申请号:US11872772

    申请日:2007-10-16

    IPC分类号: G03C1/805 G03F7/00 G03F7/26

    摘要: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imagable element having an outermost imagable layer that includes a free radically polymerizable component, a free radical initiator composition comprising a diaryliodonium borate, and an infrared radiation absorbing compound. The imagable layer also includes a polymeric binder that is represented by the following Structure (I): -(A)w-(A′)w′-  (I) wherein A represents recurring units comprising a pendant reactive vinyl group, A′ represents recurring units other than those represented by A, w is from about 1 to about 70 mol %, and w′ is from about 30 to about 99 mol %. The imagewise exposed element is developed with a gum to remove only the non-exposed regions. The gum has a pH greater than 7 and up to about 11 and at least 1 weight % of an anionic surfactant.

    摘要翻译: 成像和显影元件,例如平版印刷版,通过具有最外层成像层的负作用可成像元件的红外辐射成像提供,该最外可成像层包括可自由基聚合的组分,包含二芳基碘鎓硼酸盐的自由基引发剂组合物和 红外辐射吸收化合物。 可成像层还包括由以下结构(I)表示的聚合物粘合剂: - (A)w-(A')w'-(I)其中A表示包含侧链的反应性乙烯基的重复单元,A'表示 除了由A代表的重复单元,w为约1至约70mol%,w'为约30至约99mol%。 成像曝光元件用树胶显影,仅去除非曝光区域。 口香糖具有大于7且高至约11和至少1重量%阴离子表面活性剂的pH。

    METHODS FOR IMAGING AND PROCESSING NEGATIVE-WORKING IMAGEABLE ELEMENTS
    4.
    发明申请
    METHODS FOR IMAGING AND PROCESSING NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
    用于成像和处理负压工作图像元素的方法

    公开(公告)号:US20090246698A1

    公开(公告)日:2009-10-01

    申请号:US12057673

    申请日:2008-03-28

    IPC分类号: G03F7/12

    摘要: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imageable element having an outermost imageable layer that includes an acid generating compound that generates acid upon exposure to imaging infrared radiation, an infrared radiation absorbing compound, an acid activatable crosslinking agent that has acid activatable reactive groups, and a polymeric binder that is capable of undergoing an acid-catalyzed condensation reaction with the crosslinking agent. The imaged element is heated at from about 120 to about 150° C. for up to two minutes, and then developed with a single processing solution to remove only the non-exposed regions and to provide a protective layer prior to lithographic printing.

    摘要翻译: 通过对具有最外可成像层的负性可成像元件的红外辐射成像提供成像和显影元件,例如平版印刷版,其包括在暴露于成像红外辐射时产生酸的产酸化合物,红外辐射 具有酸可活化反应性基团的酸可活化交联剂和能够与交联剂进行酸催化缩合反应的聚合物粘合剂。 将成像的元件在约120至约150℃加热长达两分钟,然后用单一处理溶液显影以仅去除非曝光区域,并在平版印刷之前提供保护层。

    METHODS OF USING VIOLET-SENSITIVE IMAGEABLE ELEMENTS
    6.
    发明申请
    METHODS OF USING VIOLET-SENSITIVE IMAGEABLE ELEMENTS 审中-公开
    使用感应敏感元件的方法

    公开(公告)号:US20090142702A1

    公开(公告)日:2009-06-04

    申请号:US11949817

    申请日:2007-12-04

    IPC分类号: G03F7/028 G03C5/29

    摘要: An imaged and developed element, such as a lithographic printing plate, is provided by violet radiation imaging of a negative-working imageable element having an outermost imageable layer that includes a free radically polymerizable component, an initiator composition that provides free radicals upon violet irradiation, a sensitizer, and a polymeric binder having pendant reactive vinyl groups. The element also includes an additive that is represented by the following Structure (II): wherein R1, R2, R3, and R4 are independently hydrogen, or alkyl, alkenyl, cycloalkyl, or aryl groups. The imaged element can be developed using a gum having a pH greater than 6 and up to about 11 and comprising at least 1 weight % of one or more anionic surfactants.

    摘要翻译: 通过对具有最外可成像层的负性可成像元件的紫外线成像提供成像和显影元件,例如平版印刷版,其包括可自由基聚合的组分,在紫外线照射时提供自由基的引发剂组合物, 敏化剂和具有侧链反应性乙烯基的聚合物粘合剂。 元素还包括由以下结构(II)表示的添加剂:其中R 1,R 2,R 3和R 4独立地为氢或烷基,烯基,环烷基或芳基。 成像元件可以使用pH大于6且高达约11并且包含至少1重量%的一种或多种阴离子表面活性剂的胶体显影。

    NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE
    8.
    发明申请
    NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE 有权
    负责任的可图像元素和使用方法

    公开(公告)号:US20080299488A1

    公开(公告)日:2008-12-04

    申请号:US11756036

    申请日:2007-05-31

    IPC分类号: G03C1/00 G03C5/16

    摘要: Negative-working imageable elements that can be imaged using infrared radiation comprise an imageable layer and a protective overcoat on a hydrophilic substrate. The imageable layer includes an IR-sensitive cyanine dye. The protective overcoat predominantly comprises one or more poly(vinyl alcohol) resins, each of which has a hydrolysis level of 85% or less. The use of this particular overcoat composition used in combination with the IR-sensitive cyanine dye provides improved tolerance to fogging by white light while maintaining desired imaging speed.

    摘要翻译: 可以使用红外辐射成像的负性可成像元件包括亲水基底上的可成像层和保护性外涂层。 可成像层包括IR敏感花青染料。 保护性外涂层主要包含一种或多种聚乙烯醇树脂,其各自的水解度为85%以下。 与IR敏感花青染料组合使用的特定外涂层组合物的使用提供了通过白光提高了对灰雾的耐受性,同时保持了所需的成像速度。

    Multilayer imageable element with improved chemical resistance
    9.
    发明授权
    Multilayer imageable element with improved chemical resistance 失效
    具有改善耐化学性的多层可成像元件

    公开(公告)号:US07338745B2

    公开(公告)日:2008-03-04

    申请号:US11337776

    申请日:2006-01-23

    IPC分类号: G03F7/095 G03F7/11 G03F7/30

    摘要: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone and attached groups represented by the following Structure Q: wherein L1, L2, and L3 independently represent linking groups, T1, T2, and T3 independently represent terminal groups, and a, b, and c are independently 0 or 1. The imageable elements have improved resistance to development and printing chemicals and solvents.

    摘要翻译: 正性可成像元件包括辐射吸收化合物和在具有亲水表面的基底上的内层和外层。 内层包含可使用碱性显影剂除去的聚合物材料,其包含由以下结构Q表示的骨架和连接基团:其中L 1,L 2,和 L 3独立地表示连接基团,T 1,T 2和T 3独立地表示连接基团,和 a,b和c独立地为0或1.可成像元件具有改善的耐显影和印刷化学品和溶剂的能力。