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    Multilayer imageable element with improved chemical resistance
    4.
    发明授权
    Multilayer imageable element with improved chemical resistance 失效
    具有改善耐化学性的多层可成像元件

    公开(公告)号：US07338745B2

    公开(公告)日：2008-03-04

    申请号：US11337776

    申请日：2006-01-23

    申请人： Kevin B. Ray ,  Ting Tao ,  Scott A. Beckley

    发明人： Kevin B. Ray ,  Ting Tao ,  Scott A. Beckley

    IPC分类号： G03F7/095 ,  G03F7/11 ,  G03F7/30

    CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/165

    摘要： Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone and attached groups represented by the following Structure Q: wherein L1, L2, and L3 independently represent linking groups, T1, T2, and T3 independently represent terminal groups, and a, b, and c are independently 0 or 1. The imageable elements have improved resistance to development and printing chemicals and solvents.

    摘要翻译： 正性可成像元件包括辐射吸收化合物和在具有亲水表面的基底上的内层和外层。 内层包含可使用碱性显影剂除去的聚合物材料，其包含由以下结构Q表示的骨架和连接基团：其中L 1，L 2，和 L 3独立地表示连接基团，T 1，T 2和T 3独立地表示连接基团，和 a，b和c独立地为0或1.可成像元件具有改善的耐显影和印刷化学品和溶剂的能力。

    STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS
    6.
    发明申请
    STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
    负责任的可图像元素的堆叠

    公开(公告)号：US20100151385A1

    公开(公告)日：2010-06-17

    申请号：US12336635

    申请日：2008-12-17

    申请人： Kevin B. Ray ,  James L. Mulligan ,  Scott A. Beckley

    发明人： Kevin B. Ray ,  James L. Mulligan ,  Scott A. Beckley

    IPC分类号： G03F7/004

    CPC分类号： B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24

    摘要： A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and an outermost topcoat that has a dry coating weight equal to or less than 1 g/m2. The non-imaging backside of the substrate is free of polymer coatings and has an average surface roughness (Ra) in both longitudinal and width directions greater than 0.15 μm. In addition, the imageable side of each underlying precursor is arranged in direct contact with the aluminum-containing substrate of the precursor above it without the use of an interleaf paper between the precursors.

    摘要翻译： 在堆叠中提供多个负性平版印刷版前体。 每个前体包括其上具有单一可成像层的铝含基材和具有等于或小于1g / m 2的干涂层重量的最外面漆。 衬底的非成像背面没有聚合物涂层，并且在纵向和宽度方向上的平均表面粗糙度（Ra）大于0.15μm。 此外，每个下面的前体的可成像侧布置成与其上方的前体的含铝基底直接接触，而不使用前体之间的中间纸。

    ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS
    8.
    发明申请
    ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
    新闻发展的负面工作成像元素

    公开(公告)号：US20100015549A1

    公开(公告)日：2010-01-21

    申请号：US12500637

    申请日：2009-07-10

    申请人： Jianbing Huang ,  Kevin B. Ray ,  Scott A. Beckley

    发明人： Jianbing Huang ,  Kevin B. Ray ,  Scott A. Beckley

    IPC分类号： G03F7/004

    CPC分类号： B41C1/1008 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  G03C1/04 ,  G03C1/49863 ,  G03F7/0212 ,  G03F7/033 ,  Y10S430/106 ,  Y10S430/117 ,  Y10S430/126 ,  Y10S430/145

    摘要： The present invention relates to negative-working imageable elements that can be used for the manufacture of printing plates. These imageable elements can be developed on on-press by the action of a lithographic printing ink used in combination with either water or a fountain solution. The imageable elements comprise an imageable layer that is not removable in water or fountain solution alone. The imageable layer includes a free radically polymerizable compound, a free radical initiator composition, an infrared radiation absorbing compound, and a polymeric binder comprising poly(alkylene oxide) pendant groups, and preferably additionally pendant cyano groups.

    摘要翻译： 本发明涉及可用于制造印版的负性可成像元件。 这些可成像元件可以通过与水或润版液组合使用的平版印刷油墨的作用在印刷机上显影。 可成像元件包括不可在水或喷泉溶液中单独移除的可成像层。 可成像层包括可自由基聚合的化合物，自由基引发剂组合物，红外辐射吸收化合物和包含聚（环氧烷）侧基的聚合物粘合剂，优选另外悬挂氰基。

    Negative-working radiation-sensitive compositions and imageable materials
    10.
    发明授权
    Negative-working radiation-sensitive compositions and imageable materials 有权
    负性辐射敏感组合物和可成像材料

    公开(公告)号：US07279255B2

    公开(公告)日：2007-10-09

    申请号：US11349376

    申请日：2006-02-07

    申请人： Ting Tao ,  Scott A. Beckley

    发明人： Ting Tao ,  Scott A. Beckley

    IPC分类号： G03F7/30 ,  G03F7/029 ,  G03F7/033 ,  G03F7/038

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/0048 ,  G03F7/033 ,  Y10S430/115

    摘要： A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound (such as an IR-sensitive dye), a polymeric binder comprising a polymer backbone to which is directly or indirectly linked a pendant group comprising a reactive vinyl group, and a primary additive that is a poly(alkylene glycol) or an ether or ester thereof that has a number average molecular weight of from about 200 and up to 4000 and comprises from about 2 to about 50 weight % based on the total composition solids content. This composition can be used to prepare a negative-working imageable element that can be imaged at relatively low energy and developed without a preheat step.

    摘要翻译： 辐射敏感组合物包括可自由基聚合的组分和硼酸盐引发剂组合物，其能够产生足以在暴露于成像辐射时引发可自由基聚合的组分的聚合的自由基。 该组合物还包括辐射吸收化合物（例如IR敏感染料），包含聚合物骨架的聚合物粘合剂，其直接或间接连接包含反应性乙烯基的侧基和作为聚 亚烷基二醇）或其醚或酯，其数均分子量为约200至高达4000，并且包含基于总组合物固含量的约2至约50重量％。 该组合物可用于制备可在相对较低能量下成像并在没有预热步骤的情况下显影的负性可成像元件。