Abstract:
A method of preparing negative-working, single-layer imageable elements improves their storage stability in a humid environment. The method includes enclosing the coated imageable elements in a water-impermeable sheet material that substantially inhibits the transfer of moisture to and from the imageable element. Such imageable elements include a radiation-sensitive composition that includes a radically polymerizable component, an initiator composition to provide radicals upon exposure to imaging radiation, a radiation absorbing compound, and a polymeric binder having poly(alkylene glycol) side chains.
Abstract:
Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R1 is a moiety containing an ethylenically unsaturated polymerizable group, R2 is a C1-C3 alkylene group, and R3 is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.
Abstract translation:具有由结构I的单体聚合形成的单体单元的聚合物和共聚物,其中R 1是含有烯属不饱和可聚合基团的部分,R 2是C C 1 -C 3亚烷基,R 3是C 1-10烷基直链或环状的烷基, C 6-10芳族或取代的芳族基团,C 1-8烷氧基甲基或C 1-8烷氧基乙基, 可用作光敏组合物的粘合剂树脂,以及用于半导体器件和材料的制造中的光刻工艺。