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    INTERPOSER LAYER FOR ENHANCING ADHESIVE ATTRACTION OF POLY(P-XYLYLENE) FILM TO SUBSTRATE
    1.
    发明申请
    INTERPOSER LAYER FOR ENHANCING ADHESIVE ATTRACTION OF POLY(P-XYLYLENE) FILM TO SUBSTRATE 审中-公开
    用于增强胶粘剂（P-XYLYLENE）胶片粘合到基板上的插入层

    公开(公告)号：US20160226023A1

    公开(公告)日：2016-08-04

    申请号：US15099538

    申请日：2016-04-14

    申请人： Industrial Technology Research Institute

    发明人： Tai-Hung Chen ,  Chun-Hao Chang ,  Li-Wen Lai ,  Kun-Wei Lin

    IPC分类号： H01L51/52 ,  H01L51/00 ,  C09D165/04

    CPC分类号： H01L51/5253 ,  B32B7/12 ,  B32B17/1055 ,  C08K5/5419 ,  C09D165/04 ,  C09D183/04 ,  H01L51/0035 ,  H01L51/5237 ,  H01L2251/558 ,  Y10T428/265

    摘要： A laminate device is provided. The laminate device includes a substrate having a surface; a luminescent component over the surface of the substrate; a poly(p-xylylene) film over the surface of the substrate and covering the luminescent component; an interposer layer between the luminescent component and the substrate, wherein the interposer layer is bonded to both the substrate and the poly(p-xylylene) film in a covalent manner, wherein a ratio of Si—C bonds and Si—X bonds in the interposer layer is in a range from about 0.3 to about 0.8, wherein X is O or N; and a first barrier layer covering the poly(p-xylylene) film.

    摘要翻译： 提供层压装置。 层压装置包括具有表面的基板; 在衬底的表面上的发光组分; 在所述衬底的表面上的聚（对二甲苯）膜，并覆盖所述发光组分; 在所述发光部件和所述基板之间的中介层，其中所述插入层以共价方式与所述基板和所述聚对苯二甲酰亚胺膜结合，其中所述中间层中的Si-C键和Si-X键的比例为 中间层在约0.3至约0.8的范围内，其中X为O或N; 和覆盖聚（对二甲苯）膜的第一阻挡层。

    EVAPORATION APPARATUS
    2.
    发明申请
    EVAPORATION APPARATUS 审中-公开
    蒸发装置

    公开(公告)号：US20130298833A1

    公开(公告)日：2013-11-14

    申请号：US13940239

    申请日：2013-07-11

    申请人： Industrial Technology Research Institute

    发明人： Li-Wen Lai ,  Yi-Long Wang ,  Chun-Hao Chang ,  Tai-Hung Chen

    IPC分类号： C23C16/448

    CPC分类号： C23C16/4488 ,  B05D1/34 ,  B05D1/60 ,  C23C16/452 ,  C23C16/45557

    摘要： An evaporation apparatus proposed includes a gas storage chamber, a first evaporator, a pressure gauge, a pyrolysis chamber and a deposition chamber. The first evaporator is connected with the gas storage chamber through a first pipe and the first pipe has a first valve. The pressure gauge is connected with the gas storage chamber through a second pipe. The pyrolysis chamber is connected with the gas storage chamber through a third pipe and the third pipe has a second valve, wherein the first evaporator is connected with the pyrolysis chamber through the gas storage chamber, and the gas storage chamber is disposed between the first evaporator and the pyrolysis chamber. The deposition chamber is connected with the pyrolysis chamber through a fourth pipe.

    摘要翻译： 提出的蒸发装置包括气体储存室，第一蒸发器，压力计，热解室和沉积室。 第一蒸发器通过第一管与气体储存室连接，第一管具有第一阀。 压力计通过第二管与气体储存室连接。 热解室通过第三管与气体储存室连接，第三管具有第二阀，其中第一蒸发器通过气体储存室与热解室连接，气体储存室设置在第一蒸发器 和热解室。 沉积室通过第四管与热解室连接。

    CHEMICAL VAPOR DEPOSITION APPARATUS
    3.
    发明申请
    CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
    化学蒸气沉积装置

    公开(公告)号：US20150034011A1

    公开(公告)日：2015-02-05

    申请号：US14515535

    申请日：2014-10-16

    申请人： Industrial Technology Research Institute

    发明人： Chun-Hao Chang ,  Chuan-Sheng Chuang

    IPC分类号： C23C16/54 ,  C23C16/455 ,  C23C16/448 ,  B05D1/00 ,  C23C16/452

    CPC分类号： C23C16/54 ,  B05D1/60 ,  C23C16/4485 ,  C23C16/452 ,  C23C16/45561

    摘要： A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber, an evaporator, and a sorter. The buffer chamber has a first valve, a second valve, and a carrying apparatus. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber. The sorter is connected with the buffer chamber through the first valve.

    摘要翻译： 提供化学气相沉积设备和形成聚对二甲苯膜的方法。 化学气相沉积装置包括缓冲室，沉积室，热解室，蒸发器和分选机。 缓冲室具有第一阀，第二阀和输送装置。 蒸发器与第二阀连接。 热解室通过第一管与蒸发器连接，其中第一管具有第三阀。 沉积室与热解室连接。 分拣机通过第一阀与缓冲室连接。

    PLASMA APPARATUS
    4.
    发明申请
    PLASMA APPARATUS 审中-公开
    等离子体设备

    公开(公告)号：US20140144382A1

    公开(公告)日：2014-05-29

    申请号：US13726658

    申请日：2012-12-26

    申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

    发明人： Ming-Hsien Ko ,  Li-Wen Lai ,  Kun-Wei Lin ,  Chun-Hao Chang ,  Tai-Hung Chen

    IPC分类号： C23C16/455

    CPC分类号： C23C16/4401 ,  C23C16/45578 ,  C23C16/50 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449

    摘要： A plasma apparatus including a chamber, an electrode set and a gas supplying tube set is provided. The chamber has a supporting table. The gas supplying tube set is disposed in the chamber and located between the supporting table and the electrode set. The gas supplying tube set includes at least one outer gas supplying tube and at least one first inner gas supplying tube. The first inner gas supplying tube is telescoped within the outer gas supplying tube. The outer gas supplying tube and the first inner gas supplying tube both have a plurality of gas apertures, and an amount of the gas apertures of the outer gas supplying tube is greater than an amount of the gas apertures of the first inner gas supplying tube.

    摘要翻译： 提供了包括室，电极组和供气管组的等离子体装置。 房间有一个支撑台。 气体供给管组设置在室内并且位于支撑台和电极组之间。 气体供给管组包括至少一个外部气体供给管和至少一个第一内部气体供给管。 第一内部气体供给管可伸缩在外部气体供给管内。 外部气体供给管和第一内部气体供给管都具有多个气体孔，外部气体供给管的气体孔的量大于第一内部气体供给管的气体孔的量。