公开(公告)号：US20220199356A1

公开(公告)日：2022-06-23

申请号：US17603255

申请日：2019-04-19

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Tomonori NAKANO ,  Yu YAMAZAWA ,  Hideo KASHIMA

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/141 ,  H01J37/06 ,  H01J37/09

Abstract: A charged particle beam apparatus including a winding aberration corrector capable of correcting a chromatic aberration is provided. A multi-pole lens includes a magnetic core 150, a plurality of current lines 101 to 112, a plurality of wire-shaped electrodes 301 to 312, insulating electrode fixing portions 313 to 342 for fixing the plurality of electrodes to a structure in a vacuum container, and conductive shields 320, 321 set to a reference potential, which are provided between the electrode fixing portion and a central axis of the magnetic core, main line portions of the plurality of current lines are arranged axisymmetrically with respect to the central axis of the magnetic core along an inner wall of the magnetic core, and portions of the plurality of electrodes parallel to the central axis of the magnetic core are arranged axisymmetrically with respect to the central axis of the magnetic core.

公开(公告)号：US20210233737A1

公开(公告)日：2021-07-29

申请号：US15734845

申请日：2018-06-04

Applicant: Hitachi High-Tech Corporation

Inventor： Yu YAMAZAWA

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/141 ,  H01J37/153

Abstract: In an electron beam apparatus performing angular scanning that changes an incident angle of an electron beam incident at a predetermined incident position on a sample, when a correction coil is provided in a gap portion of a yoke (magnetic path) of an objective lens, spherical aberration can be corrected by following a deflection signal even if a deflection frequency increases. Therefore, a main control unit that controls an electron optical system sets predetermined phase change amounts a, b with respect to control of a scanning coil in control of the correction coil, and the predetermined phase change amounts a, b are made different depending on a plurality of scanning modes having different scanning speeds.

公开(公告)号：US20250062096A1

公开(公告)日：2025-02-20

申请号：US18720952

申请日：2022-01-18

Applicant: Hitachi High-Tech Corporation

Inventor： Naoto ITO ,  Yu YAMAZAWA ,  Tsunenori NOMAGUCHI

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: A degree of freedom in an arrangement position of an electric field deflector is improved and a chromatic aberration is prevented from occurring. A charged particle beam apparatus includes electric field deflectors 130a and 130b and magnetic field deflectors 140a and 140b. Each of the electric field deflectors 130a and 130b is disposed on a plane different from a plane orthogonal to an optical axis of the beam 107 on which the magnetic field deflectors 140a and 140b are disposed. An integrated computer 124 moves a deflection fulcrum, which is an intersection of a beam 107 before deflection and the beam 107 deflected by the electric field deflectors 130a and 130b, by controlling deflection of the beam 107 caused by the electric field deflectors 130a and 130b and a deflection fulcrum, which is an intersection of the beam 107 before deflection and the beam 107 deflected by the magnetic field deflectors 140a and 140b, by controlling deflection of the beam 107 caused by the magnetic field deflectors 140a and 140b, the deflection fulcrums being moved independently.

公开(公告)号：US20250046565A1

公开(公告)日：2025-02-06

申请号：US18719916

申请日：2022-02-14

Applicant: Hitachi High-Tech Corporation

Inventor： Tomonori NAKANO ,  Yu YAMAZAWA

IPC: H01J37/147 ,  H01J37/26 ,  H01J37/28

Abstract: In a charged particle beam device provided with an aberration corrector, a decrease in resolution that may occur when a scanning region is widened is prevented. A charged particle source (ES) generates a charged particle beam (EB). An aberration corrector 20 is provided on a path through which the charged particle beam passes, and corrects an aberration using multi-stage multipole lenses HEX1 and HEX2. A first deflector (SC) is provided between the aberration corrector and a sample stage that allows a sample SPL to be loaded thereon, and controls an irradiation position IP of the charged particle beam on the sample. A second deflector DEF1 is provided between the charged particle source and the aberration corrector, and controls a trajectory within the aberration corrector along which the charged particle beam passes. The controller 17 controls a deflection amount of the second deflector based on the irradiation position IP controlled by the first deflector.

公开(公告)号：US20210249218A1

公开(公告)日：2021-08-12

申请号：US17049364

申请日：2018-05-10

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Tomonori NAKANO ,  Yu YAMAZAWA

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/28

Abstract: Provided is a winding type aberration corrector that generates a multipole field, in which mechanical positional accuracy required to dispose the current wires can be mitigated. For this purpose, a multipole lens constituting the aberration corrector includes a magnetic core, and a plurality of current wires, in which a plurality of grooves are provided in an inner wall of the magnetic core, centers of the plurality of grooves being disposed axisymmetrically relative to a central axis of the magnetic core, and main wire portions of the plurality of current wires are respectively disposed in the plurality of grooves of the magnetic core.