公开(公告)号：US11177112B2

公开(公告)日：2021-11-16

申请号：US16959616

申请日：2018-03-19

Applicant: Hitachi High-Tech Corporation

Inventor： Satoru Yamaguchi ,  Kei Sakai ,  Makoto Suzuki ,  Ryota Watanabe

IPC: H01J37/28 ,  H01J37/147

Abstract: The present invention proposes a pattern measurement tool characterized by being provided with: a charged-particle beam sub-system having a tilt deflector; and a computer sub-system which is connected to the charged-particle beam sub-system and which is for executing measurement of a pattern on the basis of a signal obtained by said charged-particle beam sub-system, wherein the charged-particle beam sub-system acquires at least two signal profiles by scanning beams having at least two incidence angles, the computer sub-system measures the dimension between one end and the other end of the pattern on the basis of the at least two signal profiles, calculates the difference between the two measurements, and calculates the height of the pattern by inputting the difference value determined by said calculation into a relational formula indicating the relation between the height of the pattern and said difference value.

公开(公告)号：US12085581B2

公开(公告)日：2024-09-10

申请号：US17274797

申请日：2019-11-12

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Masayuki Ito ,  Osamu Matsumoto ,  Ryota Watanabe

IPC: G01N35/00 ,  G01N35/10

CPC classification number: G01N35/00871 ,  G01N35/00732 ,  G01N35/1002

Abstract: The automatic analyzer includes a first storage device that stores sample information including a measurement result of a reaction solution for each sample and a second storage device that stores the sample information on at least a part of the samples among the sample information stored in the first storage device, in which when the automatic analyzer reaches a predetermined operation state, the control device performs a backup process of backing up the sample information on the samples satisfying a predetermined backup condition from the first storage device to the second storage device, and deleting the sample information on the backed up samples from the first storage device.

公开(公告)号：US11610756B2

公开(公告)日：2023-03-21

申请号：US17497384

申请日：2021-10-08

Applicant: Hitachi High-Tech Corporation

Inventor： Kaori Bizen ,  Ryota Watanabe ,  Yuzuru Mizuhara ,  Daisuke Bizen

IPC: H01J37/24 ,  H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.