公开(公告)号：US20160111270A1

公开(公告)日：2016-04-21

申请号：US14895119

申请日：2014-06-17

Applicant: HORIBA JOBIN YVON SAS

Inventor： Patrick CHAPON ,  Sebastien LEGENDRE

IPC: H01J49/12 ,  H01J49/00 ,  H01J49/40

CPC classification number: H01J49/12 ,  H01J37/32018 ,  H01J37/32862 ,  H01J49/0031 ,  H01J49/40

Abstract: A glow discharge mass spectrometry device and method, the device including a glow discharge lamp (1), gas flow-injection elements, the glow discharge lamp being suitable for forming an ablation plasma in the presence of a plasma gas, and a mass spectrometer. The device further includes heating elements (30, 31) suitable for heating a gas flow (38) upstream of a cell (2), the gas flow-injection elements being suitable for injecting into the glow discharge cell a gas flow (38) heated to a temperature T for a duration D, and pumping elements (7, 27) being designed to pump a flow of gaseous species (17, 37) out of the cell for the duration D, so as to decontaminate the surface of the sample (4) and/or the inner walls of the glow discharge cell (2) before an ablation plasma (5) is ignited.

Abstract translation: 一种辉光放电质谱装置和方法，所述装置包括辉光放电灯（1），气体流注入元件，所述辉光放电灯适合于在等离子体气体存在下形成消融等离子体，以及质谱仪。 该装置还包括适于加热电池（2）上游的气流（38）的加热元件（30,31），气流注入元件适用于向辉光放电室注入加热的气流（38） 温度T持续持续时间D，并且泵送元件（7,27）被设计成将气态物质（17,37）的流从泵送出持续时间D，以便去除样品表面（ 4）和/或辉光放电单元（2）的内壁在消融等离子体（5）被点燃之前。

公开(公告)号：US20170018417A1

公开(公告)日：2017-01-19

申请号：US15301218

申请日：2015-03-27

Applicant: HORIBA JOBIN YVON SAS

Inventor： Patrick CHAPON ,  Agnes TEMPEZ ,  Sebastien LEGENDRE

IPC: H01J49/10 ,  H01J49/00 ,  H01J49/40 ,  H01J49/24

CPC classification number: H01J49/105 ,  H01J49/0031 ,  H01J49/24 ,  H01J49/40

Abstract: A system and a process for measuring, by glow discharge spectrometry, the elemental and/or molecular chemical composition of an organic solid sample (10). The sample (10) is positioned so as to seal a glow discharge plasma reactor (2), a gaseous mixture including at least one inert gas and gaseous oxygen is injected into the reactor (2), the concentration of gaseous oxygen being between 0.1% and 15% by weight of the gaseous mixture, an electric discharge of radiofrequency type is applied to the electrodes of the plasma reactor (2) in order to generate a glow discharge plasma, and the solid sample (10) is exposed to the plasma so as to etch an erosion crater in the solid sample (10); at least one signal representative of an ionized species of negative charge is selected and measured using a mass spectrometer (4).

Abstract translation: 通过辉光放电光谱测定有机固体样品（10）的元素和/或分子化学组成的系统和方法。 定位样品（10）以密封辉光放电等离子体反应器（2），将包含至少一种惰性气体和气态氧的气体混合物注入反应器（2）中，气态氧浓度在0.1％ 和15重量％的气体混合物，为了产生辉光放电等离子体，将等离子体反应器（2）的电极施加射频型放电，并将固体样品（10）暴露于等离子体 蚀刻固体样品（10）中的侵蚀坑; 使用质谱仪（4）选择和测量代表负电荷的离子化物质的至少一个信号。

公开(公告)号：US20170045457A1

公开(公告)日：2017-02-16

申请号：US15305367

申请日：2015-04-28

Applicant: HORIBA JOBIN YVON SAS

Inventor： Simon RICHARD ,  Jean-Paul GASTON ,  Olivier ACHER ,  Patrick CHAPON

IPC: G01N21/67 ,  G01N21/68 ,  G01B11/22

CPC classification number: G01N21/67 ,  G01B11/22 ,  G01J3/443 ,  G01N21/68 ,  G01N2201/06113 ,  G01N2201/0612 ,  H01J37/32018 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/334

Abstract: A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample (10) and forming a glow discharge etching plasma (19). The system (100) for measuring in situ the depth of the erosion crater generated by etching of the sample (10) includes an optical separator (3), optical elements (4) suitable for directing a first incident beam (21) toward a first zone (11) of the sample, the first zone being exposed to the etching plasma, and a second incident beam (22) toward a second zone (12) of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device (3) suitable for forming an interferometric beam (30) so as to determine the depth (d) of the erosion crater.

Abstract translation: 辉光放电光谱测定系统包括适于接收固体样品（10）并形成辉光放电蚀刻等离子体（19）的辉光放电灯。 用于原位测量通过蚀刻样品（10）产生的侵蚀坑的深度的系统（100）包括光学分离器（3），适于将第一入射光束（21）引向第一入射光束（21）的光学元件（4） 区域（11），第一区域暴露于蚀刻等离子体，以及朝向样品相同侧的第二区域（12）的第二入射光束（22），第二区域被保护免受蚀刻等离子体 以及适于形成干涉光束（30）以便确定侵蚀坑的深度（d）的光学重组装置（3）。