Light detection device
    1.
    发明授权

    公开(公告)号:US12253413B2

    公开(公告)日:2025-03-18

    申请号:US17288593

    申请日:2019-08-23

    Abstract: A spectroscopic sensor includes a wiring substrate having a main surface, a light detector disposed on the main surface of the wiring substrate, a Fabry-Perot interference filter, a spacer which is provided on the main surface of the wiring substrate and supports the Fabry-Perot interference filter so that the Fabry-Perot interference filter and the light detector are separated from each other, and a stem connected to a ground potential. A second current path which has a smaller electric resistance than that of an arbitrary first current path which extends from the Fabry-Perot interference filter to the light detector via the spacer and the wiring substrate is formed between the Fabry-Perot interference filter and the stem.

    Wafer inspection method and wafer

    公开(公告)号:US11624902B2

    公开(公告)日:2023-04-11

    申请号:US16765529

    申请日:2018-11-09

    Abstract: A wafer includes a substrate layer, a first mirror layer having a plurality of two-dimensionally arranged first mirror portions, and a second mirror layer having a plurality of two-dimensionally arranged second mirror portions. In the wafer, a gap is formed between the first mirror portion and the second mirror portion so as to form a plurality of Fabry-Perot interference filter portions. A wafer inspection method according to an embodiment includes a step of performing faulty/non-faulty determination of each of the plurality of Fabry-Perot interference filter portions, and a step of applying ink to at least part of a portion overlapping the gap when viewed in a facing direction on the second mirror layer of the Fabry-Perot interference filter portion determined as faulty.

    Optical inspection device and optical inspection method

    公开(公告)号:US11422059B2

    公开(公告)日:2022-08-23

    申请号:US16765626

    申请日:2018-11-09

    Abstract: An optical inspection device includes: a wafer support unit configured to support a wafer in which a plurality of Fabry-Perot interference filter portions are formed, each of the plurality of filter portions in which a distance between the first mirror portion and the second mirror portion facing each other varies by an electrostatic force, the wafer support unit configured to support the wafer such that a direction in which the first mirror portion and the second mirror portion face each other follows along a reference line; a light emission unit configured to emit light to be incident on each of the plurality of filter portions along the reference line; and a light detection unit configured to detect light transmitted through each of the plurality of filter portions along the reference line. The wafer support unit has a light passage region that allows light to pass along the reference line.

    Production method for Fabry-Perot interference filter

    公开(公告)号:US11041755B2

    公开(公告)日:2021-06-22

    申请号:US16303688

    申请日:2017-05-26

    Abstract: A method of manufacturing a Fabry-Perot interference filter includes a forming step of forming a first mirror layer having a plurality of first mirror portions, a sacrificial layer having a plurality of portions expected to be removed, and a second mirror layer having a plurality of second mirror portions on a first main surface of a wafer which includes parts corresponding to a plurality of two-dimensionally arranged substrates and is expected to be cut into the plurality of substrates along each of a plurality of lines; a removing step of simultaneously removing the plurality of two-dimensionally arranged portions expected to be removed from the sacrificial layer through etching after the Ruining step; and a cutting step of cutting the wafer into the plurality of substrates along each of the plurality of lines after the removing step.

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