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公开(公告)号：US09817306B2
公开(公告)日：2017-11-14
申请号：US14862334
申请日：2015-09-23
Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.
Inventor： Wei-Yen Chen , Cheng-Ju Lee , Long-Ming Lu , Cheng-Hsin Chen , Tien-Jui Lin
Abstract: The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
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Patent Agency Ranking
公开(公告)号：US10670976B2
公开(公告)日：2020-06-02
申请号：US15880243
申请日：2018-01-25
Applicant: Gudeng Precision Industrial Co., LTD
Inventor： Hsin-Min Hsueh , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC: G03F1/66 , G03F7/20 , H01L21/673
Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.
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公开(公告)号：US09958772B1
公开(公告)日：2018-05-01
申请号：US15651312
申请日：2017-07-17
Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD
Inventor： Hsin-Min Hsueh , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC: B65D81/00 , G03F1/66 , H01L21/673 , B65D25/10 , B65D85/38
CPC classification number: G03F1/66 , B65D25/10 , B65D85/38 , H01L21/67359 , H01L21/67366 , H01L21/67376
Abstract: A reticle pod is provided for receiving a reticle, the reticle pod comprises: a plurality of positioning modules, which are disposed on at least one vertex portions of a substrate of the reticle pod. The positioning module includes an elastic member, and an abutting member which disposed above the positioning module, wherein when the reticle is received in the reticle pod and the cover of the reticle pod is engaged to the substrate, the cover contacts and provides a downward pressure to the abutting member, and forcing the abutting member to compress the elastic member. The compressed elastic member deforms extensively along a transverse direction and contacts with the reticle.
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公开(公告)号：US11249392B2
公开(公告)日：2022-02-15
申请号：US16857197
申请日：2020-04-24
Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD
Inventor： Hsin-Min Hsueh , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC: G03F1/66 , G03F7/20 , H01L21/673
Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.
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公开(公告)号：US10281815B2
公开(公告)日：2019-05-07
申请号：US15651399
申请日：2017-07-17
Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD
Inventor： Hsin-Min Hsueh , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC: G03F1/66 , B65D25/10 , B65D85/38 , H01L21/673
Abstract: A reticle pod for accommodating a reticle is provided. The reticle pod comprises a base; a cover; and at least one supporting member. When the reticle is accommodated on the reticle pod, the supporting member abuts against the reticle through a protrusion part; wherein the maximum static friction is constantly greater than a horizontal force applied to the support module from the reticle.
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公开(公告)号：US20180210349A1
公开(公告)日：2018-07-26
申请号：US15880243
申请日：2018-01-25
Applicant: Gudeng Precision Industrial Co, Ltd
Inventor： HSIN-MIN HSUEH , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC: G03F7/20 , H01L21/673 , G03F1/66
Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.
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